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1-bromo-2-(4-((4-cyanophenyl)diazenyl)phenoxy)ethane is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

960010-58-6

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960010-58-6 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 960010-58-6 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 9,6,0,0,1 and 0 respectively; the second part has 2 digits, 5 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 960010-58:
(8*9)+(7*6)+(6*0)+(5*0)+(4*1)+(3*0)+(2*5)+(1*8)=136
136 % 10 = 6
So 960010-58-6 is a valid CAS Registry Number.

960010-58-6Downstream Products

960010-58-6Relevant academic research and scientific papers

Synthesis, characterization, and photoresponsive behavior of a series of azobenzene-containing side-chain poly(ether sulfone)s with various lengths of flexible spacers

Zhang, Yuxuan,Pei, Songhao,Wang, Yongpeng,Cui, Zengduo,Li, Na,Zhu, Ye,Zhang, Haibo,Jiang, Zhenhua

, p. 1117 - 1123 (2013)

A series of azobenzene-containing side-chain poly(ether sulfone)s (azo-PES) with various spacer lengths (2, 6 or 12 methylene units) were successfully synthesized via a nucleophilic substitution grafting reaction between poly(ether sulfone)s with hydroxylphenyl side groups and azobenzene monomers. Their chemical structures and properties were characterized by means of IR, UV-vis and 1H NMR. These azo-polymers show good thermal stability with glass transition temperatures and 5% weight-loss temperatures above 119 C and 347 C, respectively. The results of photoisomerization experiments indicated that azo-PES polymer with longer spacers correspond to higher photoisomerization rates. Upon irradiation with a 532 nm neodymium doped yttrium aluminum garnet (Nd:YAG) laser beam, they presented remnant values of birefringence larger than 82% of the saturation value of birefringence, indicating the good stability of the photoinduced orientation. No fatigue phenomena have been observed after several cycles of inscription-erasure-inscription sequences.

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