994-07-0

Basic information

• Product Name: chlorodimethoxymethylsilane
• Synonyms: chlorodimethoxymethylsilane;Dimethoxy(methyl)chlorosilane;Methylchlorodimethoxysilane
• CAS NO: 994-07-0
• Molecular Formula: C₃H₉ClO₂Si
• Molecular Weight: 140.64086
• EINECS: 213-613-5
• Mol File: 994-07-0.mol

Chemical Properties

• Boiling Point: 75.4°Cat760mmHg
• Flash Point: 2.1°C
• Appearance: /
• Density: 1.019g/cm³
• Vapor Pressure: 116mmHg at 25°C
• Refractive Index: 1.394
• CAS DataBase Reference: chlorodimethoxymethylsilane(CAS DataBase Reference)
• NIST Chemistry Reference: chlorodimethoxymethylsilane(994-07-0)
• EPA Substance Registry System: chlorodimethoxymethylsilane(994-07-0)

Safety Data

• Hazardous Substances Data: 994-07-0(Hazardous Substances Data)

Usage

Uses

Used in Organic Synthesis:
Chlorodimethoxymethylsilane is used as a reagent in organic synthesis for its ability to participate in various chemical reactions, contributing to the formation of new compounds and materials.
Used in Silicone Polymer Manufacturing:
In the silicone industry, chlorodimethoxymethylsilane is utilized as a crosslinking agent, which helps in creating a network structure within silicone polymers, enhancing their properties such as strength and elasticity.
Used in Surface Modification:
Chlorodimethoxymethylsilane is employed as a silylating agent in surface modification applications across different industries. It aids in altering the surface properties of materials, improving adhesion, wettability, and other surface-related characteristics for specific uses.
Used in Coatings and Adhesives Industry:
Chlorodimethoxymethylsilane is used as a coupling agent in the coatings and adhesives industry to improve the bonding strength between different materials, such as inorganic surfaces and organic polymers, leading to enhanced durability and performance of the final product.
Used in Electronic Industry:
In the electronic industry, chlorodimethoxymethylsilane is utilized in the fabrication of semiconductor devices and electronic components, where its reactivity and surface-modifying properties contribute to the creation of stable and efficient devices.
Used in Textile Industry:
Chlorodimethoxymethylsilane is used in the textile industry for the treatment of fibers, enhancing their properties such as water repellency, stain resistance, and durability through surface modification techniques.
Used in Cosmetics and Personal Care Industry:
In the cosmetics and personal care industry, chlorodimethoxymethylsilane is employed for its film-forming and conditioning properties, improving the texture and feel of products while providing protective and moisturizing benefits to the skin and hair.

InChI:InChI=1/C3H9ClO2Si/c1-5-7(3,4)6-2/h1-3H3

Upstream product

• 67-56-1 methanol 
• 75-79-6 Methyltrichlorosilane 
• 18292-07-4 (dimethoxy)phenylsilane 
• 1634-04-4 tert-butyl methyl ether 
• 1185-55-3 Methyltrimethoxysilan 

Downstream Products

• 475094-86-1 1,4-bis-[(dimethoxy-methyl-silanyl)-ethynyl]-benzene 
• 1251196-91-4 o-bromo[dimethoxy(methyl)silyl]benzene 
• 151037-24-0 WI(N₂Si(CH₃)(OCH₃)2){P(CH₃)2C₆H₅}4 
• 58666-74-3 Methyldimethoxy-(benzylthio)-silan 
• 58666-73-2 Methyldimethoxy-(phenylthio)-silan 

Relevant articles and documents

Protecting and Leaving Functions of Trimethylsilyl Groups in Trimethylsilylated Silicates for the Synthesis of Alkoxysiloxane Oligomers

The concept of protecting groups and leaving groups in organic synthesis was applied to the synthesis of siloxane-based molecules. Alkoxy-functionalized siloxane oligomers composed of SiO4, RSiO3, or R2SiO2 units were chosen as targets (R: functional groups, such as Me and Ph). Herein we describe a novel synthesis of alkoxysiloxane oligomers based on the substitution reaction of trimethylsilyl (TMS) groups with alkoxysilyl groups. Oligosiloxanes possessing TMS groups were reacted with alkoxychlorosilane in the presence of BiCl3 as a catalyst. TMS groups were substituted with alkoxysilyl groups, leading to the synthesis of alkoxysiloxane oligomers. Siloxane oligomers composed of RSiO3 and R2SiO2 units were synthesized more efficiently than those composed of SiO4 units, suggesting that the steric hindrance around the TMS groups of the oligosiloxanes makes a difference in the degree of substitution. This reaction uses TMS groups as both protecting and leaving groups for SiOH/SiO? groups.

Enantioselective CuH-Catalyzed Hydroacylation Employing Unsaturated Carboxylic Acids as Aldehyde Surrogates

The direct asymmetric copper hydride (CuH)-catalyzed coupling of α,β-unsaturated carboxylic acids to aryl alkenes to access chiral α-aryl dialkyl ketones is reported. A variety of substrate substitution patterns, sensitive functional groups, and heterocycles are tolerated in this reaction, which significantly expands the range of accessible products compared with existing hydroacylation methodology. Although mechanistic studies are ongoing, we propose that CuH-catalyzed silylation of unsaturated acids occurs to access a uniquely effective acyl electrophilic coupling partner.

ALTERNATIVE METHODS FOR THE SYNTHESIS OF ORGANOSILICON COMPOUND

A method of forming chloro-substituted silanes from the reaction of an alkoxysilane with a chlorinating agent in the optional presence of a catalyst is provided. More specifically, chloro-substituted silanes, including but not limited to silicon tetrachloride, are formed by reacting a chlorinating agent, such as thionyl chloride, with an alkylalkoxysilane having the formula (R'0)4-xSiRx, where R and R' are independently selected alkyl groups comprising one or more carbon atoms and x is 0, 1, 2, or 3. The catalyst may be dimethylformamide, (chloromethylene)dimethyliminium chloride, or triethylamine, among others. The chloro- substituted silane formed in the reaction along with several by-products has the formula (RO)4-x-ySiRxCly; where x is 0, 1, 2, or 3 and y is 1, 2, 3, or 4. One of the by-products of the reaction is an alkyl chloride.

Direct alkoxysilylation of alkoxysilanes for the synthesis of explicit alkoxysiloxane oligomers

Direct alkoxysilylation, which is a powerful tool to provide explicit alkoxysiloxanes, is developed and its versatility is investigated. Siloxane pentamers Si[OSiR1(OMe)2]4 having various functional groups (R1 = methyl, vinyl, phenyl, chloropropyl and n-butyl groups) were successfully obtained by direct alkoxysilylation of Si(OR)4 (R = t-Bu, CHPh2). Thus, the versatility of the reaction is confirmed on organic functional groups R1. Functional group tolerance of the reaction is discussed on the basis of electronegativity of the R1 groups. Alkoxysilylation of Si(Ot-Bu)2(OMe) 2 and Si(Ot-Bu)(OMe)3 selectively gives trimer (MeO) 2Si[OSiMe(OMe)2]2 and dimer (MeO) 3SiOSiMe(OMe)2, respectively. Thus, the feasibility on siloxane structure is also confirmed. Various siloxane compounds are synthesized by this newly developed reaction for the first time.

Synthesis and structures of o-(dihydrosilyl)(dimesitylboryl)benzenes

O-(Dihydrosilyl)(dimesitylboryl)benzenes 1 were prepared in 6 steps. o-Dibromobenzene was mono-lithiated with n-BuLi and reacted with chloro(dimethoxy)silanes to afford o-C6H4(Br)[SiR(OMe) 2] (2) (R = Ph, Me). Bromine-lith