- Oxidative C-H Homocoupling of Push-Pull Benzothiazoles: An Atom-Economical Route to Highly Emissive Quadrupolar Arylamine-Functionalized 2,2′-Bibenzothiazoles with Enhanced Two-Photon Absorption
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Copper(II)-catalyzed C-H/C-H coupling of dipolar 2-H-benzothiazoles end-capped with triphenylamine moieties affords highly fluorescent 2,2′-bibenzothiazoles with quadrupolar (D-π-A-π-D) architecture displaying large two-photon absorption (TPA) cross sections (543-1252 GM) in the near-infrared region. The notably higher TPA performance as compared to quadrupolar π-systems with a widely used 2,2′-bipyridine core, along with the ease of the synthesis and chelating N^N ability, makes the title biheteroaryl platform an attractive building block for a large scope of functional dyes exploiting nonlinear optical phenomena.
- Fakis, Mihalis,Georgiou, Dimitris,Gyepes, Róbert,Hrobárik, Peter,Nociarová, Jela,Osusky, Patrik,Polyzos, Ioannis,Smolí?ek, Maro?
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supporting information
p. 5512 - 5517
(2021/07/31)
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- Photoacid generator for 193 nm immersion lithography and intermediate thereof
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The invention discloses a photoacid generator for 193 nm immersed lithography and an intermediate thereof. The photoacid generator of the present invention is shown in Formula I. The photoresist containing the photoacid generator of the present invention has a high resolution. The method has the advantages of high sensitivity and low line width roughness, and has a good application prospect.
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Paragraph 0101; 0109; 0112-0113; 0132-0134
(2021/11/27)
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- Switchable Synthesis of Aryl Sulfones and Sulfoxides through Solvent-Promoted Oxidation of Sulfides with O2/Air
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A practical and switchable method for the synthesis of aryl sulfones and sulfoxides via sulfide oxidation was developed. The chemoselectivities of products were simply controlled by reaction temperature using O2/air as the terminal oxidant and oxygen source. The broad substrate scope, easy realization of gram-scale production, and the simplification of a sulfide oxidation system render the strategy attractive and valuable.
- Cheng, Zhen,Sun, Pengchao,Tang, Ailing,Jin, Weiwei,Liu, Chenjiang
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p. 8925 - 8929
(2019/11/14)
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- Method for preparing triaryl onium sulfate through arylation of diaryl thioether
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The invention discloses a method for preparing triaryl onium sulfate through arylation of diaryl thioether. The method specifically comprises the step that in the presence of a fluorine-containing accelerant, diaryl thioether reacts with an aryne precursor in a solvent to synthesize triaryl onium sulfate. Raw materials adopted by the method are cheap and easy to obtain, and the defects of a traditional method that alkalinity is too high, the requirement for the reaction condition is strict, and reaction substrates are limited are overcome. The method has the advantages that the reaction condition is mild, the applicable range of the substrates is wide, the selectivity is good, the yield is high, the product is easy to separate, and the operation is convenient.
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Paragraph 0025-0050
(2019/01/23)
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- Salt, the composition and production of resist pattern
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PROBLEM TO BE SOLVED: To provide a salt to be used for a resist composition that allows production of a resist pattern with good line edge roughness.SOLUTION: The salt is expressed by the formula (I). In the formula, Qand Qrepresent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms; Lrepresents a divalent saturated hydrocarbon group having 1 to 20 carbon atoms; Yrepresents a group expressed by the formula (Iy); R' represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms which may have a fluorine atom, or a hydroxyl group; X' represents a single bond, -O-, *-CO-O-, or the like; Ar represents a phenylene group; Rand Rrepresent an aliphatic hydrocarbon group having 1 to 10 carbon atoms which may have a substituent, an alicyclic hydrocarbon group having 4 to 36 carbon atoms which may have a substituent, an aromatic hydrocarbon group having 6 to 36 carbon atoms which may have a substituent, or a heterocyclic group having 6 to 36 carbon atoms which may have a substituent; and Lrepresents a divalent hydrocarbon group having 1 to 36 carbon atoms which may have a substituent.
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Paragraph 0198
(2018/03/23)
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- Sonogashira reaction using arylsulfonium salts as cross-coupling partners
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Triarylsulfonium, alkyl- and fluoroalkyl(diaryl)-sulfonium, and aryl(dialkyl)sulfonium triflates are successfully used as a new family of cross-coupling participants in the Sonogashira reaction as aryldiazonium, diaryliodonium, and tetraphenylphosphonium salts. It was found that terminal alkynes reacted mildly with triarylsulfonium or (2,2,2-trifluoroethyl)diphenylsulfonium triflate at room temperature under Pdand Cu-cocatalysis to give the corresponding arylalkynes in up to >99% yield. This protocol represents the first use of arylsulfonium salts as cross-coupling partners in the Pd/Cu-catalyzed Sonogashira reaction.
- Tian, Ze-Yu,Wang, Shi-Meng,Jia, Su-Jiao,Song, Hai-Xia,Zhang, Cheng-Pan
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supporting information
p. 5454 - 5457
(2017/11/06)
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- Mild synthesis of triarylsulfonium salts with arynes
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Reactions between arynes and alkyl sulfides have been extensively studied over the past few decades. These reactions commonly end with a dealkylation process and thus deliver thioethers as final products. In contrast, the transformation described furnishes valuable triarylsulfonium salts, in lieu of thioethers, from arynes and diarylsulfides. The reaction features mild conditions and a broad substrate scope. A suite of functional groups such as ketones, esters, nitriles, aryl ethers and aryl halides is tolerated, which can be issues faced by traditional synthetic methods. The practicality of the reaction and its extension to the synthesis of triphenyl selenonium salt are also exhibited herein.
- Zhang, Lei,Li, Xiaojin,Sun, Yan,Zhao, Weizhao,Luo, Fan,Huang, Xin,Lin, Lihui,Yang, Ying,Peng, Bo
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supporting information
p. 7181 - 7189
(2017/09/07)
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- Arylation of diorganochalcogen compounds with diaryliodonium triflates: Metal catalysts are unnecessary
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Diaryliodonium triflates transfer an aryl group to the chalcogen atom of organic sulfides, selenides, and tellurides (but not ethers), in the absence of transition-metal catalyst, simply upon heating in chloroform or dichloroethane solution.
- Racicot, Lanne,Kasahara, Takahito,Ciufolini, Marco A.
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supporting information
p. 6382 - 6385
(2015/02/19)
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- Radiation-sensitive resin composition and radiation-sensitive acid generating agent
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A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. A represents —CO— or —CH2—. R1 represents a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms, or a combination of a first group and a second group. The first group is —CO—, —COO—, —OCO—, —O—CO—O—, —NHCO—, —CONH—, —NH—CO—O—, —O—CO—NH—, —NH—, —S—, —SO—, —SO2—, —SO2—O— or a combination thereof, and the second group is a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms or a combination thereof. A part or all of hydrogen atoms included in the hydrocarbon group and the heterocyclic group are not substituted or substituted. M+ represents a monovalent cation.
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- A photo Lewis acid generator (PhLAG): Controlled photorelease of B(C 6F5)3
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A molecule that releases the strong organometallic Lewis acid B(C 6F5)3 upon irradiation with 254 nm light has been developed. This photo Lewis acid generator (PhLAG) now enables the photocontrolled initiation of several reactions catalyzed by this important Lewis acid. Herein is described the synthesis of the triphenylsulfonium salt of a carbamato borate based on a carbazole function, its establishment as a PhLAG, and the application of the photorelease of B(C6F5) 3 to the fabrication of thin films of a polysiloxane material.
- Khalimon, Andrey Y.,Piers, Warren E.,Blackwell, James M.,Michalak, David J.,Parvez, Masood
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p. 9601 - 9604
(2012/07/14)
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- Resist composition and patterning process
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The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser, ArF laser, F2 laser, ultra-short ultraviolet light, electron beam, X-rays, or the like; and a patterning process utilizing the resist composition. The present invention provides a chemically amplified resist composition comprising one or more kinds of amine compounds or amine oxide compounds (except for those having a nitrogen atom of amine or amine oxide included in a ring structure of an aromatic ring) at least having a carboxyl group and having no hydrogen atoms covalently bonded to a nitrogen atom as a basic center.
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- Sulfonates, polymers, resist compositions and patterning process
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A sulfonate compound having formula (1) is novel wherein R1 to R3 are H, F or C1-20 alkyl or fluoroalkyl, at least one of R1 to R3 contains F. A polymer comprising units derived from the sulfonate compound is used as a base resin to formulate a resist composition which is sensitive to high-energy radiation, maintains high transparency at a wavelength of up to 200 nm, and has improved alkali dissolution contrast and plasma etching resistance
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- Novel tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process
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Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.
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- Novel anthracene derivative and radiation-sensitive resin composition
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A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), wherein R1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.
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- Novel carbazole derivative and chemically amplified radiation-sensitive resin composition
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A carbazole derivative of the following formula (1), wherein R1 and R2 individually represent a hydrogen atom or a monovalent organic group, or R1 and R2 form, together with the carbon atom to which R1 and R2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.
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- Chemical amplification type positive resist compositions and sulfonium salts
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A chemical amplifying type positive resist composition having high transmittance, superior in sensitivity and resolution in a lithography utilizing a light having a wavelength of 220 nm or lower and confering a good profile is provided, Which comprisesan
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- Sulfonium salt and its manufacturing method
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This invention relates to a sulfonium salt, including its manufacturing method, which is effectively used as a photoacid initiator or radical photoinitiator during polymerization and a photoacid generator, leaving the protection groups of organic compound
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- Sulfonium salt and its manufacturing method
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This invention relates to a sulfonium salt, including its manufacturing method, which is effectively used as a photoacid initiator or radical photoinitiator during polymerization and a photoacid generator, leaving the protection groups of organic compound
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- Reaction of Triphenylsulfonium Salt with Organolithium Reagents
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The reaction of triphenylsulfonium trifluoromethanesulfonate with various nucleophilic, organolithium reagents gave ligand coupling products and the corresponding diaryl or di-heteroaryl sulfides. Moreover, ligand exchange reaction did not give any noticeable product in each reaction. Therefore, it was found that only the ligand coupling reaction proceeds in this reaction system.
- Oae,Ishihara,Yoshihara
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p. 265 - 269
(2007/10/03)
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- Preparation of iodonium and sulfonium triflates
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An iodonium or sulfonium triflate is prepared by dissolving or slurring a iodonium or sulfonium halide in an organic solvent and reacting it with a trimethylsilyl triflate.
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- REACTION OF BENZENE WITH DIPHENYL SULFOXIDES
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Diphenyl sulfoxide reacted with benzenes in the presence of trifluoroacetic anhydride and trifluoromethanesulfonic acid to yield triphenylsulfonium ions in good yields.A new electrophilic spacies was proposed. - Keywords: electrophilic aromatic substituti
- Endo, Yasuyuki,Shudo, Koichi,Okamoto, Toshihiko
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p. 3753 - 3755
(2007/10/02)
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