66003-78-9

Basic information

• Product Name: TRIPHENYLSULFONIUM TRIFLUOROMETHANESULFONATE
• Synonyms: Sulfonium,triphenyl-,saltwithtrifluoro-methanesulfonicacid(1:1);TRIPHENYLSULPHONIUM TRIFLATE;TRIPHENYLSULFONIUM TRIFLATE;TRIPHENYLSULFONIUM TRIFLUOROMETHANESULFONATE;Triphenylsulfonium triflate,Triphenylsulfonium trifluoromethanesulfonate
• CAS NO: 66003-78-9
• Molecular Formula: CF₃O₃S*C₁₈H₁₅S
• Molecular Weight: 412.45
• Mol File: 66003-78-9.mol
• Article Data: 23

Chemical Properties

• Melting Point: 133-137 °C(lit.)
• Appearance: /
• CAS DataBase Reference: TRIPHENYLSULFONIUM TRIFLUOROMETHANESULFONATE(CAS DataBase Reference)
• NIST Chemistry Reference: TRIPHENYLSULFONIUM TRIFLUOROMETHANESULFONATE(66003-78-9)
• EPA Substance Registry System: TRIPHENYLSULFONIUM TRIFLUOROMETHANESULFONATE(66003-78-9)

Safety Data

• Hazard Codes: Xi
• Statements: 36/37/38
• Safety Statements: 26
• WGK Germany: 3
• Hazardous Substances Data: 66003-78-9(Hazardous Substances Data)

Usage

Uses

TPS-tfs can be used as photoacid generators for the preparation of a bilayer system based nanoporous template which can be potentially used in sensor applications. It can also be used to form a blend with polyfluorene-co-benzothiadiazole for the fabrication of organic light emitting diodes (OLEDs).

General Description

Triphenylsulfonium triflate (TPS-tf) is a photo-acid generator which can be incorporated in conjugated polymers to enhance the luminescence and reduce the operating voltage. The performance efficiency of the fabricated device is increased by improving the mobility of charge carriers.

InChI:InChI=1/C18H15S.CHF3O3S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;2-1(3,4)8(5,6)7/h1-15H;(H,5,6,7)/q+1;/p-1

Upstream product

• 27607-77-8 trimethylsilyl trifluoromethanesulfonate 
• 945-51-7 1,1'-sulfinylbisbenzene 
• 1493-13-6 trifluorormethanesulfonic acid 
• 71-43-2 benzene 
• 139-66-2 diphenyl sulfide 
• 1864-94-4 phenyl formate 
• 66003-76-7 Diphenyliodonium triflate 
• 533-01-7 Copper(I); benzoate 
• 88284-48-4 2-(trimethylsilyl)phenyl trifluoromethanesulfonate 
• 935471-16-2 triphenylsulfonium (2-hydroxyethoxycarbonyl)difluoromethanesulfonate 
• 2926-27-4 potassium trifluoromethansulfonate 
• 358-23-6 trifluoromethylsulfonic anhydride 
• 4270-70-6 triphenylsulfonium chloride 
• 2206-26-0 [D₃]acetonitrile 

Downstream Products

• 17113-33-6 2-phenylfuran 
• 139-66-2 diphenyl sulfide 
• 3438-48-0 4-phenylpyrimidine 
• 108-95-2 phenol 
• 825-55-8 2-phenylthiophene 
• 1008-89-5 2-phenylpyridine 
• 612-96-4 2-Phenylquinoline 
• 92-52-4 biphenyl 
• 544-40-1 Dibutyl sulfide 
• 1126-80-3 (n-butylthio)benzene 
• 733024-52-7 triphenylsulfonium manganesetris(dicyanamide) 
• 92-94-4 [1,1';4',1'']terphenyl 
• 215438-84-9 methyl diphenylsulfonium triflate 
• 105229-70-7 methyldiphenylsulfonium trifluoromethanesulfonate 

Relevant articles and documents

Oxidative C-H Homocoupling of Push-Pull Benzothiazoles: An Atom-Economical Route to Highly Emissive Quadrupolar Arylamine-Functionalized 2,2′-Bibenzothiazoles with Enhanced Two-Photon Absorption

Copper(II)-catalyzed C-H/C-H coupling of dipolar 2-H-benzothiazoles end-capped with triphenylamine moieties affords highly fluorescent 2,2′-bibenzothiazoles with quadrupolar (D-π-A-π-D) architecture displaying large two-photon absorption (TPA) cross sections (543-1252 GM) in the near-infrared region. The notably higher TPA performance as compared to quadrupolar π-systems with a widely used 2,2′-bipyridine core, along with the ease of the synthesis and chelating N^N ability, makes the title biheteroaryl platform an attractive building block for a large scope of functional dyes exploiting nonlinear optical phenomena.

Switchable Synthesis of Aryl Sulfones and Sulfoxides through Solvent-Promoted Oxidation of Sulfides with O2/Air

A practical and switchable method for the synthesis of aryl sulfones and sulfoxides via sulfide oxidation was developed. The chemoselectivities of products were simply controlled by reaction temperature using O2/air as the terminal oxidant and oxygen source. The broad substrate scope, easy realization of gram-scale production, and the simplification of a sulfide oxidation system render the strategy attractive and valuable.

Salt, the composition and production of resist pattern

PROBLEM TO BE SOLVED: To provide a salt to be used for a resist composition that allows production of a resist pattern with good line edge roughness.SOLUTION: The salt is expressed by the formula (I). In the formula, Qand Qrepresent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms; Lrepresents a divalent saturated hydrocarbon group having 1 to 20 carbon atoms; Yrepresents a group expressed by the formula (Iy); R' represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms which may have a fluorine atom, or a hydroxyl group; X' represents a single bond, -O-, *-CO-O-, or the like; Ar represents a phenylene group; Rand Rrepresent an aliphatic hydrocarbon group having 1 to 10 carbon atoms which may have a substituent, an alicyclic hydrocarbon group having 4 to 36 carbon atoms which may have a substituent, an aromatic hydrocarbon group having 6 to 36 carbon atoms which may have a substituent, or a heterocyclic group having 6 to 36 carbon atoms which may have a substituent; and Lrepresents a divalent hydrocarbon group having 1 to 36 carbon atoms which may have a substituent.