Silicon tetrafluoride

Base Information

• Chemical Name: Silicon tetrafluoride
• CAS No.: 7783-61-1
• Deprecated CAS: 1519044-61-1
• Molecular Formula: F4Si
• Molecular Weight: 104.079
• European Community (EC) Number: 232-015-5
• ICSC Number: 0576
• UN Number: 1859
• UNII: K60VCI56YO
• DSSTox Substance ID: DTXSID0064830
• Nikkaji Number: J95.220F
• Wikipedia: Silicon tetrafluoride
• Wikidata: Q413140
• Mol file: 7783-61-1.mol

Synonyms:SiF4;silicon tetrafluoride

Chemical Property of Silicon tetrafluoride

Chemical Property:

• Appearance/Colour: COLOURLESS GAS , WITH PUNGENT ODOUR.
• Vapor Pressure: 26400mmHg at 25°C
• Melting Point: -90°C
• Refractive Index: 1.207
• Boiling Point: 86 °C
• PSA: 0.00000
• Density: 1.209 g/cm³
• LogP: 1.30000
• Hydrogen Bond Donor Count: 0
• Hydrogen Bond Acceptor Count: 4
• Rotatable Bond Count: 0
• Exact Mass: 103.97053918
• Heavy Atom Count: 5
• Complexity: 19.1
• Transport DOT Label: Poison Gas Corrosive

Purity/Quality:

99.9% ^*data from raw suppliers

Safty Information:

• Pictogram(s): C; T; T+
• Hazard Codes: C; T; T+

MSDS Files:

SDS file from LookChem

Useful:

• Chemical Classes: Toxic Gases & Vapors -> Corrosive Gases
• Canonical SMILES: F[Si](F)(F)F
• Inhalation Risk: A harmful concentration of this gas in the air will be reached very quickly on loss of containment.
• Effects of Short Term Exposure: The substance is corrosive to the eyes, skin and respiratory tract. Inhalation of this gas may cause lung oedema. The effects may be delayed. Medical observation is indicated.

Technology Process of Silicon tetrafluoride

There total 380 articles about Silicon tetrafluoride which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield: 49.0%

(1,2-dibromotrifluoroethyl)pentafluorosulfur(VI) (22687-88-3) → fluorosulfonyl fluoride (640723-20-2,2699-79-8,12769-73-2) + disulfur decafluoride (5714-22-7) + 1,2,2-tribromo-1,1,2-trifluoroethane (354-49-4) + silicon tetrafluoride (7783-61-1) + thionyl fluoride (7783-42-8)

Guidance literature:

Irradiation (UV/VIS); irradiated (Hanovia S 500 lamp) in silica ampule, 20 h, further products;

Reference yield:

aluminum(III) fluoride (7784-18-1) → aluminum oxide (1333-84-2,1344-28-1) + silicon tetrafluoride (7783-61-1)

Guidance literature:

With Al-silicat; heating to 900-1000°C;

Reference yield:

trichlorosilane (10025-78-2) + antimony(III) fluoride (7783-56-4) → antimony (7440-36-0) + fluoro dichlorosilane (19382-74-2) + antimony(III) chloride (10025-91-9) + trifluorosilane (13465-71-9) + silicon tetrafluoride (7783-61-1)

Guidance literature:

antimony(V) chloride; In neat (no solvent); byproducts: H2; conversion of 2.093g SiHCl3 with 0.5g SbF3 in presence of 0.2ml SbCl5 at 10-15 °C for a period of 3 hours;;

DOI:10.1039/JR9440000293

upstream raw materials:

2-methyl-but-2-ene

(1,1,2,2-tetrafluoroethyl)trifluorosilane

2,3-Dimethyl-2-butene

ethene

Downstream raw materials:

hydrogen fluoride

silica gel

boric acid

tetraethoxy orthosilicate

Refernces

• 1、 Johnson, G. K.. "". . p. 801 - 802. Retrieved 1986.
• 2、 Tso,Pask. "REACTION OF GLASSES WITH HYDROFLUORIC ACID SOLUTION.". . p. 360 - 362,360 - 362. Retrieved 1982.
• 3、 Bierschenk, Thomas R.,Juhlke, T. J.,Lagow, Richard J.. "". . p. 7340 - 7341. Retrieved 1981.
• 4、 Soltani,Pech-Canul, Martin I.,González,Bahrami. "Mechanism and Parameters Controlling the Decomposition Kinetics of Na2SiF6 Powder to SiF4". . p. 379 - 395. Retrieved 2016.
• 5、 Yonemura,Fukae,Ohira,Mitsui,Takaichi,Sekiya,Beppu. "Evaluation of FNO and F3NO as substitute gases for semiconductor CVD chamber cleaning". . p. G707-G710. Retrieved 2003.
• 6、 Krylov,Sorochkina,Bulanov,Lashkov. "C1-C4 hydrocarbon release in the preparation of SiF4 through Na2SiF6 pyrolysis". . p. 7 - 9. Retrieved 2012.
• 7、 Kamioka, Masatsugu,Ishikawa, Yo-ichi,Kaetsu, Hayato,Isomura, Shohei,Arai, Shigeyoshi. "Isotope-Selective Infrared Multiple Photon Decomposition of Hexafluorodisilane". . p. 5727 - 5730. Retrieved 1986.
• 8、 Mohr. "". . p. 291 - 294. Retrieved 1868.
• 9、 Hagen, A. P.,MacDiarmid, A. G.. "". . p. 345 - 347. Retrieved 1970.
• 10、 Driess, Matthias,Hermannsdorfer, André. "Silicon Tetrakis(trifluoromethanesulfonate): A Simple Neutral Silane Acting as a Soft and Hard Lewis Superacid". supporting information. p. 13656 - 13660. Retrieved 2021/05/03.