Reference

Heat of solution of silicon tetrafluoride in 2N hydrochloric acid

Heat of solution of silicon tetrafluoride in 2N hydrochloric acid. Ennan, A. A.; Konunova, Ts. B.; Nikitin, V. I. (Odess. Gos. Univ. im. Mechnikova, Odessa, USSR). Zh. Fiz. Khim., 50(11), 2988 (Russian) 1976. CODEN: ZFKHA9. DOCUMENT TYPE: Journal CA Section: 69 (Thermodynamics, Thermochemistry, and Thermal Properties) The heat of soln. of SiF4 [7783-61-1] in 2N HCl was detd. as -22.78 .+-. 0.58 kcal/mol. Because of strong hydrolysis of SiF4 during soln., the heat of soln. was detd. indirectly from heats of soln. of NaF, NH4F, and Na- and NH4 fluorosilicates in 2N HCl.

Thermal oxidizing degradation of trichlorotrifluoroethane (F-113 solvent)

Thermal oxidizing degradation of trichlorotrifluoroethane (F-113 solvent). Margossian, N.; Limasset, J. C.; Richard, S. (Cent. Etude Rech., Inst. Natl. Rech. Secur., Paris, Fr.). Cah. Notes Doc., 80, 357-64 (French) 1975. CODEN: CNDIBJ. DOCUMENT TYPE: Journal CA Section: 59 (Air Pollution and Industrial Hygiene) Freon 113 [76-13-1] is chem. inert and has a low toxicity compared to other industrial solvents. Thermal oxidizing degrdn. of the vapor dild. with air started at 500-550°; the rate increased rapidly with temp. The decompn. was total at 800°. The principal products formed were Cl, SiF4 [7783-61-1], and CO2. Other products produced in small quantities were CO, COCl2 [75-44-5], COF2 [353-50-4], COFCl [353-49-1], CCl2F2 [75-71-8], C2F4 [116-14-3], CCl3F [75-69-4], and 1,2-dichloro-1,1,2,2-tetrafluoroethane [76-14-2]. The presence of air did not diminish the thermal stability. Oxidn. and thermal degrdn. occurred simultaneously at elevated temps.