Reference

Resist pattern

Resist pattern. (Toshiba Corp., Japan). Jpn. Kokai Tokkyo Koho JP 58052824 A2 29 Mar 1983 Showa, 3 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: IC: H01L021-30. APPLICATION: JP 81-151284 24 Sep 1981. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Section cross-reference(s): 76 A resist pattern with improved precision can be obtained by controlling the oxidn. rate of the resist during O plasma treatment. The ratio of oxidn. rates of exposed and unexposed part of the resist can be increased by treating the exposed resist with a plasma contg. 2551-62-4 and 7783-60-0 are just another two chemicals used in this study. S fluoride such as SF4 or SF6, or by a S fluoride-O gas mixt. .

Gas-phase NMR investigation of structural exchange in sulfur tetrafluoride

Gas-phase NMR investigation of structural exchange in sulfur tetrafluoride. Evidence for nonstatistical intramolecular vibrational redistribution. Spring, Cheryl A.; True, Nancy S. (Dep. Chem., Univ. California, Davis, CA 95616, USA). J. Am. Chem. Soc., 105(25), 7231-6 (English) 1983. CODEN: JACSAT.Several reagents such as 7783-60-0 is used here. ISSN: 0002-7863. DOCUMENT TYPE: Journal CA Section: 67 (Catalysis, Reaction Kinetics, and Inorganic Reaction Mechanisms) Section cross-reference(s): 65 The pressure dependence of axial-equatorial F exchange rates of SF4, obtained from exchange-broadened gas-phase 19F NMR spectra, are compatible with intramol. vibrational relaxation rates approx. an order of magnitude slower than RRKM theory predicts, indicating that this mol. is not ergodic at ~12 kcal-mol. At energies near the pseudorotation barrier, SF4 has only ~15 vibrational states per 100 cm-1. The temp. dependence of the axial J equatorial F exchange rates is consistent with an activation energy for axial-equatorial F exchange of 12.1 (7) kcal/mol. The corresponding previously detd. liq.-phase value is 11.2 (1.0) kcal/mol. The slower gas-phase exchange rates and higher gas-phase activation energy are compatible with a process occurring via a transition state which is smaller than the equil. configuration. .