Reference

Insect-repellent composition

Inazuka, Shinichi; Tsuchiya, Shigekatsu (Ajinomoto Co., Inc., Japan). Ger. Offen. DE 2906469 23 Aug 1979, 29 pp. (German). (Germany). CODEN: GWXXBX. CLASS: IC: A01N009-00. PRIORITY: JP 78-18296 20 Feb 1978. DOCUMENT TYPE: Patent CA Section: 5 (Agrochemicals) The benzene derivs. I (R1 = a-branched lower alkyl or alkylene; R2, R4, and R6 = H, halo, OH, lower alkyl, etc; R3 and R5 = H, Me, Et, lower hydroxyalkyl or aldehyde) are insect repellents. Thus, in lab. expts., 10 ppm 6-tert-butyl-m-cresol [88-60-8] strongly repelled Blattella germanica, Musca domestica and other insects.

Photosensitive resin composition containing polyhydroxy compound quinonediazidesulfonate

Photosensitive resin composition containing polyhydroxy compound quinonediazidesulfonate. Ichikawa, Koji; Ozaki, Haruki; Kamya, Yasunori; Nanba, Katsuhiko ( Sumitomo Chemical Co, Japan). Jpn. Kokai Tokkyo Koho JP 09022116 A2 21 Jan 1997 Heisei, 7 pp. (Japanese). (Japan).Some commonly used reagents like 88-60-8 and 3770-97-6 are used in this experiment. CODEN: JKXXAF. CLASS: ICM: G03F007-022. ICS: G03F007-023; H01L021-027. APPLICATION: JP 1995-173410 10 Jul 1995. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) The compn. contains an alkali-sol. novolak resin, a compd. I (1 of R1 and R2 is o-quinonediazidesulfonyl and the other is H or the group; R3 = C33 alkyl or cycloalkyl which is at the position adjacent to the OH group; R4, R5 = H, C1-6 alkyl, cycloalkyl, alkenyl, aryl) as a photosensitive agent. The compn. shows good balance in the properties such as photosensitivity, resoln., g value, and pattern profile, etc. and is developable with less scum generation. .