10544-72-6Relevant articles and documents
Thorpe, T. E.,Dysan, S.
, p. 297 - 300 (1882)
Capture of nitrogen dioxide and conversion to nitric acid in a porous metal–organic framework
Li, Jiangnan,Han, Xue,Zhang, Xinran,Sheveleva, Alena M.,Cheng, Yongqiang,Tuna, Floriana,McInnes, Eric J. L.,McCormick McPherson, Laura J.,Teat, Simon J.,Daemen, Luke L.,Ramirez-Cuesta, Anibal J.,Schr?der, Martin,Yang, Sihai
, p. 1085 - 1090 (2019)
Air pollution by nitrogen oxides, NOx, is a major problem, and new capture and abatement technologies are urgently required. Here, we report a metal–organic framework (Manchester Framework Material 520 (MFM-520)) that can efficiently confine dimers of NO2, which results in a high adsorption capacity of 4.2 mmol g–1 (298 K, 0.01 bar) with full reversibility and no loss of capacity over 125 cycles. Treatment of NO2?MFM-520 with water in air leads to a quantitative conversion of the captured NO2 into HNO3, an important feedstock for fertilizer production, and fully regenerates MFM-520. The confinement of N2O4 inside nanopores was established at a molecular level, and the dynamic breakthrough experiments using both dry and humid NO2 gas streams verify the excellent stability and selectivity of MFM-520 and confirm its potential for precious-metal-free deNOx technologies.
Ramsay, W.,Cundall, J. T.
, p. 187 (1885)
Explosive Thermal Decomposition Mechanism of RDX
Botcher, Tod R.,Wight, Charles A.
, p. 5441 - 5444 (1994)
Thin films of RDX (hexahydro-1,3,5-trinitro-1,3,5-triazine) have been subjected to transient pyrolysis using a pulsed CO2 laser in order to determine details of the thermal decomposition mechanism under conditions that simulate a thermal explosion.The first step, scission of an N-N bond, leads to formation of N2O4.The product is trapped in the solid film by rapid quenching to 77 K following the pyrolysis pulse and subsequently detected by transmission FTIR spectroscopy of the film.Product yield measurements show that 1.9 +/- 0.2 RDX molecules are destroyed for every N2O4 molecule detected in the films.Crossover experiments conducted on isotopically labeled samples containing both unlabeled and fully labeled RDX-(15)N6 show that the N2O4 product consists of a statistical mixture of (14,14)N2O4, (14,15)N2O4, and (15,15)N2O4 isotopomers.These results show that both halves of the dimer arise from separate RDX parent molecules and the explosive decomposition of RDX involves loss of only a single NO2 molecule.
Maschka,Mirna
, p. 84,89,91 (1951)
Low-Temperature Trapping of Intermediates in the Reaction of NO? with O2
Mahmoudi, Leila,Kissner, Reinhard,Koppenol, Willem H.
, p. 4846 - 4851 (2017)
The autoxidation of NO? was studied in glass-like matrices of 2-methylbutane at 110 K and in a 8:3 v/v mixture of 2,2-dimethylbutane and n-pentane (rigisolve) at 80-90 K, by letting gaseous NO? diffuse into these solvents that were saturated with O2. In 2-methyllbutane, we observed a red compound. However, in rigisolve at 85-90 K, a bright yellow color appears that turns red when the sample is warmed by 10-20 K. The new yellow compound is a precursor of the red one and also diamagnetic. The UV-vis spectrum of the yellow compound contains a band which resembles that present in ONOO-. Because the red and yellow intermediates are not paramagnetic, we postulate that ON-O-O? is in close contact with NO?, or with another ON-O-O?. Diffusion of gaseous O2 into rigisolve saturated with NO? does not produce a color; however, a weak EPR signal (g = 2.010) is observed. This signal most likely indicates the presence of ONOO?. These findings complement our earlier observation of a red color at low temperatures and the presence of ONOO? in the gas phase (Galliker, B.; Kissner, R.; Nauser, T.; Koppenol, W. H. Chem. Eur. J. 2009, 15, 6161-6168), and they indicate that the termolecular autoxidation of nitrogen monoxide proceeds via the intermediate ONOO? and not via N2O2
Highly efficient reversible adsorption of NO2 in imidazole sulfonate room temperature ionic liquids
Yuan, Gang,Zhang, Feng,Geng, Jiao,Wu, You-Ting
, p. 39572 - 39575 (2014)
The highly efficient reversible adsorption of NO2 in room-temperature ionic liquids is reported for the first time, making a platform for promising applications.
Reactive species generated during wet chemical etching of silicon in HF/HNO3 mixtures
Steinert, Marco,Acker, Joerg,Krause, Matthias,Oswald, Steifen,Wetzig, Klaus
, p. 11377 - 11382 (2006)
The role of intermediate species generated during wet chemical etching of silicon in a HF-rich HF/HNO3 mixture was studied by spectroscopic and analytical methods at 1°C. The intermediate N2O3 was identified by its cobalt blue color and the characteristic features in its UV-vis and Raman spectra. Furthermore, a complex N(III) species (3NO +·NO3-) denoted as [N4O 62+] is observed in these solutions. The time-dependent decay of the N(III) intermediates, mainly by their oxidation at the liquid-air interface, serves as a precondition for the study of the etch rate as function of the intermediate concentration measured by Raman spectroscopy. From a linear relationship between etch rate and [N4O62+] concentration, NO+ is considered to be a reactive species in the rate-limiting step. This step is attributed to the oxidation of permanent existing Si-H bonds at the silicon surface by the reactive NO+ species. N2O3 serves as a reservoir for the generation of NO+ leading to a complete coverage of the silicon surface with reactive species at high intermediate concentrations. As long as this condition is valid (plateau region), the etch rate is constant and yields a smooth silicon surface upon completion of the etching. If the N2O3 concentration is insufficient to ensure a coverage of the Si surface by NO +, the etch rate decreases linearly with the N2O 3 concentration and results in a roughening of the etched silicon surface (slope region).
Addison, C. C.,Thompson, R.
, p. 369 - 370 (1948)
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Kuhn
, p. 1510 (1951)
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Schenck
, p. 47,52 (1939)
