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75-78-5 Usage

Description

Dichlorodimethylsilane is a tetrahedral, organosilicon compound with the molecular formula Si(CH3)2Cl2. The compound is a colorless liquid at room temperature, has a pungent odor and readily reacts with water to form both cyclic and linear Si-O chains. On an industrial scale, dichlorodimethylsilane is manufactured as the main precursor to polysilane and dimethylsilicone compounds.

History

James Crafts and Charles Friedel are American chemists who first reported organosilicon compounds in 1863 by synthesizing tetraethylsilane from silicon tetrachloride and diethylzinc. Nevertheless, major progress in organosilicon chemistry occurred when Fredrick Kipping and his students reacted tetrachloride with Grignard reagents to produce diorganodichlorosilanes (R2SiCl2), which they used for their experiments. The dpemand for silicones increased in the 1930s as many aircraft companies needed better insulators for sealing materials and electric motors for aircraft engines; therefore, there was need for efficient synthesis of dichlorodimethylsilane.

Preparation

Dichlorodimethylsilane is prepared by passing methyl chloride through a heated tube packed with copper (I) chloride and ground silicon using Cu2O as the catalyst. Methyl chloride is the passed through a reactor to produce dichlorodimethylsilane. 2 CH3Cl + Si → (CH3)2SiCl2 The other products in this reaction apart from dichlorodimethylsilane include CH3)3SiCl, CH3SiHCl2, and CH3SiCl3, which can be separated fromone another by fractional distillation.

Applications

Dichlorodimethylsilane is majorly used in the production of silicones. Moreover, it is utilized in the synthesis of polysilanes, which are the main precursors to silicon carbide. Dichlorodimethylsilane can be used to coat glass to prevent the adsorption of micro-particles.

Physical properties

mp ?76°C; bp 70–71°C; d 1.064 g cm?3.

Uses

Different sources of media describe the Uses of 75-78-5 differently. You can refer to the following data:
1. Dichlorodimethylsilane is used to prepare a resin bound siloxane with tertiary alcohols and it is also used as a reagent for synthesis of optically active ansa-mettallocene polymerization catalysts. It acts as a precursor to silicone and polysilane compounds. It is also used in the glass coating to protect it from micro particles. It is involved in the preparation of resin bound siloxane with reactivity towards tertiary alcohols.
2. Dichlorodimethylsilane can be used as additive for pinacol cyclization; protecting group for diols and carbonyl compounds;precursor for a wide variety of siliconbased reagents.Dichlorodimethylsilane (1) allows clean pinacol cyclization of a keto aldehyde to occur without competition from an aldol reaction (eq 1).
3. Dichlorodimethylsilicon is a organosilicon compound and is the precursor to dimethylsilicone and polysilane compounds.

Production Methods

Produced by the action of silicon on methyl chloride in presence of copper catalyst, or by Grignard reaction from methyl chloride and silicon tetrachloride.

General Description

A colorless fuming liquid with a pungent odor. Flash point 16°F. Vapor and liquid may cause burns. Denser than water. Vapors heavier than air.

Reactivity Profile

Chlorosilanes, such as Dichlorodimethylsilane, are compounds in which silicon is bonded to from one to four chlorine atoms with other bonds to hydrogen and/or alkyl groups. Chlorosilanes react with water, moist air, or steam to produce heat and toxic, corrosive fumes of hydrogen chloride. They may also produce flammable gaseous H2. They can serve as chlorination agents. Chlorosilanes react vigorously with both organic and inorganic acids and with bases to generate toxic or flammable gases.

Health Hazard

Inhalation irritates mucous membranes. Severe gastrointestinal damage may occur. Vapors cause severe eye and lung injury. Upon short contact, second and third degree burns may occur.

Fire Hazard

Vapor may explode if ignited in an enclosed area. Reacts vigorously with water to generate hydrogen chloride. Hydrogen chloride and phosgene gases may be formed upon heating or in fire. Runoff to sewer may create fire or explosion hazard.

Safety Profile

Poison by ingestion and intraperitoneal routes. Moderately toxic by inhalation. A skin and severe eye irritant. Violent reaction on contact with water. When heated to decomposition it emits toxic fumes of Cl-. See also CHLOROSILANES.

Purification Methods

Other impurities are chlorinated silanes and methylsilanes. Fractionate it through a 3/8in diameter 7ft Stedman column (p 11) rated at 100 theoretical plates at almost total reflux. See purification of MeSiCl2. Solutions in heptane, 1,1,1-trichloroethane or 1-chloronaphthalene are used for the silanization of glassware and pipettes. [Sauer & Hadsell J Am Chem Soc 70 3590 1948, Beilstein 4 IV 4110.]

Check Digit Verification of cas no

The CAS Registry Mumber 75-78-5 includes 5 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 2 digits, 7 and 5 respectively; the second part has 2 digits, 7 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 75-78:
(4*7)+(3*5)+(2*7)+(1*8)=65
65 % 10 = 5
So 75-78-5 is a valid CAS Registry Number.
InChI:InChI=1/C2H6Cl2Si/c1-5(2,3)4/h1-2H3

75-78-5 Well-known Company Product Price

  • Brand
  • (Code)Product description
  • CAS number
  • Packaging
  • Price
  • Detail
  • TCI America

  • (D0358)  Dichlorodimethylsilane  >98.0%(GC)

  • 75-78-5

  • 25mL

  • 160.00CNY

  • Detail
  • TCI America

  • (D0358)  Dichlorodimethylsilane  >98.0%(GC)

  • 75-78-5

  • 100mL

  • 340.00CNY

  • Detail
  • TCI America

  • (D0358)  Dichlorodimethylsilane  >98.0%(GC)

  • 75-78-5

  • 500mL

  • 650.00CNY

  • Detail
  • Alfa Aesar

  • (L12133)  Dichlorodimethylsilane, 99%   

  • 75-78-5

  • 100g

  • 194.0CNY

  • Detail
  • Alfa Aesar

  • (L12133)  Dichlorodimethylsilane, 99%   

  • 75-78-5

  • 500g

  • 463.0CNY

  • Detail
  • Alfa Aesar

  • (L12133)  Dichlorodimethylsilane, 99%   

  • 75-78-5

  • 1000g

  • 866.0CNY

  • Detail
  • Sigma-Aldrich

  • (40136)  Dichlorodimethylsilane  Selectophore

  • 75-78-5

  • 40136-1ML-F

  • 375.57CNY

  • Detail
  • Sigma-Aldrich

  • (40136)  Dichlorodimethylsilane  Selectophore

  • 75-78-5

  • 40136-5ML-F

  • 796.77CNY

  • Detail
  • Aldrich

  • (440272)  Dichlorodimethylsilane  ≥99.5%

  • 75-78-5

  • 440272-100ML

  • 431.73CNY

  • Detail
  • Aldrich

  • (440272)  Dichlorodimethylsilane  ≥99.5%

  • 75-78-5

  • 440272-1L

  • 1,069.38CNY

  • Detail
  • Aldrich

  • (40140)  Dichlorodimethylsilane  ≥98.5% (GC)

  • 75-78-5

  • 40140-25ML

  • 150.70CNY

  • Detail
  • Aldrich

  • (40140)  Dichlorodimethylsilane  ≥98.5% (GC)

  • 75-78-5

  • 40140-100ML

  • 183.69CNY

  • Detail

75-78-5SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name Dichlorodimethylsilane

1.2 Other means of identification

Product number -
Other names Silane, dichlorodimethyl-

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only. Intermediates
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:75-78-5 SDS

75-78-5Synthetic route

tetramethylsilane
75-76-3

tetramethylsilane

germaniumtetrachloride
10038-98-9

germaniumtetrachloride

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

chlorotrimethylgermane
1529-47-1

chlorotrimethylgermane

C

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 2/1, at 200°C for 15 h, cooled; NMR, mass spectra, chromy.;A 50%
B 100%
C 50%
tetramethylsilane
75-76-3

tetramethylsilane

germaniumtetrachloride
10038-98-9

germaniumtetrachloride

A

methyltrichlorogermane
993-10-2

methyltrichlorogermane

B

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

C

dichlorodimethylgermanium
1529-48-2

dichlorodimethylgermanium

Conditions
ConditionsYield
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 0.5/1, at 200°C for 28 h, cooled; NMR, mass spectra, chromy.;A 64%
B 100%
C 36%
tetramethylsilane
75-76-3

tetramethylsilane

germaniumtetrachloride
10038-98-9

germaniumtetrachloride

A

chlorotrimethylgermane
1529-47-1

chlorotrimethylgermane

B

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

C

dichlorodimethylgermanium
1529-48-2

dichlorodimethylgermanium

Conditions
ConditionsYield
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 1/1, at 200°C for 56 h, cooled; NMR, mass spectra, chromy.;A 14%
B 100%
C 86%
methylphosphonic acid dichloroanhydride
676-97-1

methylphosphonic acid dichloroanhydride

methoxydimethylsilyl cyanide
23272-12-0

methoxydimethylsilyl cyanide

A

methyl (cyano)methylphosphonate
101153-04-2

methyl (cyano)methylphosphonate

B

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
at 40 - 45℃; for 0.0833333h;A 87.6%
B 97%
silicon
7440-21-3

silicon

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
With methylene chloride; copper In neat (no solvent) vibrating of the Si-Cu powder;;97%
With methylene chloride; copper In neat (no solvent) CH3Cl and Si-Cu/Cu-oxide at 300-375°C;;82.4%
With methylene chloride; copper In neat (no solvent) CH3Cl and Si purified by treatment with strong acids;;
With methylene chloride In neat (no solvent)
With CH3Cl In neat (no solvent)
(C4H9)3CBCl2

(C4H9)3CBCl2

2,2-dimethyl-1,3-diphenyl-[1,3,2]diazasilolidine
1027-80-1

2,2-dimethyl-1,3-diphenyl-[1,3,2]diazasilolidine

A

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

B

2-(1,1-dibutyl-pentyl)-1,3-diphenyl-[1,3,2]diazaborolidine
2179-98-8

2-(1,1-dibutyl-pentyl)-1,3-diphenyl-[1,3,2]diazaborolidine

Conditions
ConditionsYield
A n/a
B 95%
A n/a
B 95%
tetramethylsilane
75-76-3

tetramethylsilane

germaniumtetrachloride
10038-98-9

germaniumtetrachloride

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

chlorotrimethylgermane
1529-47-1

chlorotrimethylgermane

C

methyltrichlorogermane
993-10-2

methyltrichlorogermane

D

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

E

dichlorodimethylgermanium
1529-48-2

dichlorodimethylgermanium

Conditions
ConditionsYield
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 1/1, at 200°C for 22 h, cooled; NMR, mass spectra, chromy.;A 6%
B 30%
C 15%
D 94%
E 56%
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 0.5/1, at 200°C for 6 h, cooled; NMR, mass spectra, chromy.;A 26%
B 33%
C 30%
D 74%
E 37%
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 1/1, at 200°C for 6 h, cooled; NMR, mass spectra, chromy.;A 60%
B 54%
C 11%
D 40%
E 35%
1,2-dichlorotetramethylsilane
4342-61-4

1,2-dichlorotetramethylsilane

benzoyl chloride
98-88-4

benzoyl chloride

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
With triphenylphosphine91%
tetramethylsilane
75-76-3

tetramethylsilane

germaniumtetrachloride
10038-98-9

germaniumtetrachloride

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

chlorotrimethylgermane
1529-47-1

chlorotrimethylgermane

C

tetramethylgermane
865-52-1

tetramethylgermane

D

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 4/1, at 200°C for 8 h, cooled; NMR, mass spectra, chromy.;A 91%
B 60%
C 40%
D 9%
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 0.33/1, at 200°C for 5 h, cooled; NMR, mass spectra, chromy.;A 89%
B 74%
C 26%
D 11%
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 3/1, at 200°C for 21 h, cooled; NMR, mass spectra, chromy.;A 80%
B 80%
C 20%
D 20%
(CH2C6H5)3CBCl2

(CH2C6H5)3CBCl2

2,2-dimethyl-1,3-diphenyl-[1,3,2]diazasilolidine
1027-80-1

2,2-dimethyl-1,3-diphenyl-[1,3,2]diazasilolidine

A

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

B

2-(1,1-dibenzyl-2-phenyl-ethyl)-1,3-diphenyl-[1,3,2]diazaborolidine
2179-97-7

2-(1,1-dibenzyl-2-phenyl-ethyl)-1,3-diphenyl-[1,3,2]diazaborolidine

Conditions
ConditionsYield
A n/a
B 90%
A n/a
B 90%
allyl-trimethyl-silane
762-72-1

allyl-trimethyl-silane

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

Allylchlorodimethylsilane
4028-23-3

Allylchlorodimethylsilane

C

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
With tungsten(VI) oxychloride In benzene at 50℃; for 60h;A 87%
B 7%
C 4%
silicon
7440-21-3

silicon

A

Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

B

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

C

trichlorosilane
10025-78-2

trichlorosilane

D

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
With methylene chloride; copper In neat (no solvent) mixt. of CH3Cl/N2 (2:5) and Si-Cu (9:1) at 300°C;;A 4%
B n/a
C n/a
D 86.5%
With methylene chloride; copper In neat (no solvent) mixt. of CH3Cl/N2 (2:5) and Si-Cu (9:1) at 300°C;;A 4%
B n/a
C n/a
D 86.5%
With methylene chloride; copper In neat (no solvent) CH3Cl and Si-Cu mixt. (8:2) at 350°C;;
tert-butyldichloroborane
76873-78-4

tert-butyldichloroborane

2,2-dimethyl-1,3-diphenyl-[1,3,2]diazasilolidine
1027-80-1

2,2-dimethyl-1,3-diphenyl-[1,3,2]diazasilolidine

A

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

B

2-tert-butyl-1,3-diphenyl-[1,3,2]diazaborolidine
2179-90-0

2-tert-butyl-1,3-diphenyl-[1,3,2]diazaborolidine

Conditions
ConditionsYield
A n/a
B 86%
A n/a
B 86%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

(chloromethyl)trichlorosilane
1558-25-4

(chloromethyl)trichlorosilane

A

Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

B

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
at 500℃; for 0.00833333h;A 79.1%
B 85.6%
i-C5H11BCl2
98137-22-5

i-C5H11BCl2

2,2-Dimethyl-2-sila-imidazolidin
4134-81-0

2,2-Dimethyl-2-sila-imidazolidin

A

2-i-pentyl-1,3,2-diazaborolane
30827-09-9

2-i-pentyl-1,3,2-diazaborolane

B

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
A 85.5%
B n/a
tetramethylsilane
75-76-3

tetramethylsilane

germaniumtetrachloride
10038-98-9

germaniumtetrachloride

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

chlorotrimethylgermane
1529-47-1

chlorotrimethylgermane

C

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

D

dichlorodimethylgermanium
1529-48-2

dichlorodimethylgermanium

Conditions
ConditionsYield
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 2/1, at 200°C for 6 h, cooled; NMR, mass spectra, chromy.;A 85%
B 71%
C 15%
D 29%
methylene chloride
74-87-3

methylene chloride

silicon
7440-21-3

silicon

A

Dichloromethylsilane
75-54-7

Dichloromethylsilane

B

Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

C

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
tin; aluminum silicide; zinc(II) oxide; copper dichloride at 280 - 300℃; for 6h; Rochow reaction;A 1.7%
B n/a
C 83.8%
zinc(II) oxide; copper dichloride at 280 - 300℃; for 6h; Rochow reaction;A 4.5%
B n/a
C 83.7%
zinc(II) oxide; aluminium; copper dichloride at 280 - 300℃; for 6h; Rochow reaction;A 2.8%
B n/a
C 82.1%
With PdSi at 400℃; for 6h;
dichloro-propyl-borane
1739-52-2

dichloro-propyl-borane

2,2-Dimethyl-2-sila-imidazolidin
4134-81-0

2,2-Dimethyl-2-sila-imidazolidin

A

2-propyl-1,3,2-diazaborolane
30827-07-7

2-propyl-1,3,2-diazaborolane

B

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
A 83.6%
B n/a
methoxydimethylsilyl cyanide
23272-12-0

methoxydimethylsilyl cyanide

A

dimethylchlorosilyl cyanide

dimethylchlorosilyl cyanide

B

methyl cyanochlorophosphate

methyl cyanochlorophosphate

C

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

D

methyl dichlorophosphoridate
677-24-7

methyl dichlorophosphoridate

Conditions
ConditionsYield
With trichlorophosphate at 45 - 50℃; for 0.333333h;A 17.5%
B n/a
C 82.1%
D n/a
With trichlorophosphate at 45 - 50℃; for 0.333333h; Yield given. Title compound not separated from byproducts;A 17.5%
B n/a
C 82.1%
D n/a
Dichloromethylsilane
75-54-7

Dichloromethylsilane

acetylene
74-86-2

acetylene

A

Dichloromethylvinylsilane
124-70-9

Dichloromethylvinylsilane

B

(E)-1,2-bis[dichloro(methyl)silyl]ethene
65899-10-7

(E)-1,2-bis[dichloro(methyl)silyl]ethene

C

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
With bis(tributylphosphine)dichloropalladium(II) In xylene at 80℃; for 3h;A 10%
B 79%
C 7%
With triphenylphosphine In xylene at 80℃; for 3h;A 51%
B 32%
C 7%
With Pd(acac)2Py In xylene at 80℃; for 3h;A 37%
B 5%
C 48%
N,N,N,N,N,N-hexamethylphosphoric triamide
680-31-9

N,N,N,N,N,N-hexamethylphosphoric triamide

Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
In water76%
divinyldimethylsilane
10519-87-6

divinyldimethylsilane

A

Chlorodimethylvinylsilane
1719-58-0

Chlorodimethylvinylsilane

B

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
With hydrogenchloride; iron(III) chloride at 24 - 52℃; Product distribution;A 75%
B 5%
methylene chloride
74-87-3

methylene chloride

A

Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

B

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
With tetrachlorosilane; palladium silicide; hydrogen at 400 - 850℃; for 5h; Product distribution / selectivity;A 74%
B 24%
With copper; silicon at 300 - 390℃;
With nitrogen; copper; silicon at 300 - 390℃;
diallyl(dimethyl)silane
1113-12-8

diallyl(dimethyl)silane

A

Allylchlorodimethylsilane
4028-23-3

Allylchlorodimethylsilane

B

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
With tungsten(VI) oxychloride In benzene at 50℃; for 60h;A 25%
B 74%
With tungsten(VI) oxychloride In benzene at 50℃; for 60h;A 25%
B 74%
methyldiphenylsilane
776-76-1

methyldiphenylsilane

chloromethylmethyldichlorosilane
1558-33-4

chloromethylmethyldichlorosilane

A

chloromethyldiphenylsilane
144-79-6

chloromethyldiphenylsilane

B

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
at 160 - 230℃; for 12h;A 71.2%
B 69.8%
at 160 - 230℃; for 12h;A 69.8%
B 71.2%
(2-Chlor-vinyl)-dimethyl-chlorsilan
18142-52-4

(2-Chlor-vinyl)-dimethyl-chlorsilan

A

1,2-Dichloroethylene
540-59-0

1,2-Dichloroethylene

B

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

C

Chloro-dimethyl-(1,2,2-trichloro-ethyl)-silane
176102-95-7

Chloro-dimethyl-(1,2,2-trichloro-ethyl)-silane

D

Chloro-dimethyl-(1,2,2,2-tetrachloro-ethyl)-silane

Chloro-dimethyl-(1,2,2,2-tetrachloro-ethyl)-silane

Conditions
ConditionsYield
With chlorine for 5h; Further byproducts given;A 5%
B 6%
C 70%
D 2%
para-bromotoluene
106-38-7

para-bromotoluene

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

bis(4-methylphenyl)dimethylsilane
2097-02-1

bis(4-methylphenyl)dimethylsilane

Conditions
ConditionsYield
With magnesium In tetrahydrofuran Grignard Reaction; Inert atmosphere; Schlenk technique;100%
With magnesium In not given73%
With Mg In not given73%
methyl propargyl alcohol
764-01-2

methyl propargyl alcohol

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

But-2-ynyloxy-chloro-dimethyl-silane
143887-59-6

But-2-ynyloxy-chloro-dimethyl-silane

Conditions
ConditionsYield
Ambient temperature;100%
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

phenylthio 3,4,6-tri-O-acetyl-β-D-galactopyranoside
150592-48-6

phenylthio 3,4,6-tri-O-acetyl-β-D-galactopyranoside

Acetic acid (2R,3S,4S,5R,6S)-3-acetoxy-2-acetoxymethyl-5-(chloro-dimethyl-silanyloxy)-6-phenylsulfanyl-tetrahydro-pyran-4-yl ester
153439-89-5

Acetic acid (2R,3S,4S,5R,6S)-3-acetoxy-2-acetoxymethyl-5-(chloro-dimethyl-silanyloxy)-6-phenylsulfanyl-tetrahydro-pyran-4-yl ester

Conditions
ConditionsYield
With pyridine In dichloromethane100%
With pyridine In toluene at 25 - 110℃;
With pyridine In toluene at 25℃; for 1h; Yield given;
N,N'-dimethylbenzylamine
103-83-3

N,N'-dimethylbenzylamine

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

[2-(Chloro-dimethyl-silanyl)-benzyl]-dimethyl-amine

[2-(Chloro-dimethyl-silanyl)-benzyl]-dimethyl-amine

Conditions
ConditionsYield
With n-butyllithium; tetrachlorosilane In diethyl ether; hexane at 25℃;100%
1,1,4,4,7,7,10,10-octamethyl-2,3,4,7,8,9,10,12-octahydro-1H-dibenzo[b,h]fluorene
77308-48-6

1,1,4,4,7,7,10,10-octamethyl-2,3,4,7,8,9,10,12-octahydro-1H-dibenzo[b,h]fluorene

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

chlorodimethyl (1,1,4,4,7,7,10,10-octamethyl-2,3,4,7,8,9,10,12-octahydro-1H-dibenzo[b,h]-fluorene-12-yl)silane
676647-37-3

chlorodimethyl (1,1,4,4,7,7,10,10-octamethyl-2,3,4,7,8,9,10,12-octahydro-1H-dibenzo[b,h]-fluorene-12-yl)silane

Conditions
ConditionsYield
Stage #1: 1,1,4,4,7,7,10,10-octamethyl-2,3,4,7,8,9,10,12-octahydro-1H-dibenzo[b,h]fluorene With n-butyllithium In diethyl ether at -78 - 20℃; Schlenk technique;
Stage #2: dimethylsilicon dichloride In diethyl ether at -78 - 20℃; Schlenk technique;
100%
Stage #1: 1,1,4,4,7,7,10,10-octamethyl-2,3,4,7,8,9,10,12-octahydro-1H-dibenzo[b,h]fluorene With n-butyllithium In diethyl ether at -78 - 20℃; Schlenk technique;
Stage #2: dimethylsilicon dichloride In diethyl ether at -78 - 20℃; Schlenk technique;
100%
Stage #1: 1,1,4,4,7,7,10,10-octamethyl-2,3,4,7,8,9,10,12-octahydro-1H-dibenzo[b,h]fluorene With n-butyllithium In tetrahydrofuran; hexane for 20h;
Stage #2: dimethylsilicon dichloride In tetrahydrofuran; hexane for 17.5h;
87.7%
Stage #1: 1,1,4,4,7,7,10,10-octamethyl-2,3,4,7,8,9,10,12-octahydro-1H-dibenzo[b,h]fluorene With n-butyllithium In tetrahydrofuran; diethyl ether; hexane at 0 - 20℃; for 48h;
Stage #2: dimethylsilicon dichloride In diethyl ether; hexane at 0 - 20℃; for 24h;
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

1,4,8-triazacycloundecane trihydrochloride

1,4,8-triazacycloundecane trihydrochloride

1,4,8-Tris-(chloro-dimethyl-silanyl)-1,4,8-triaza-cycloundecane

1,4,8-Tris-(chloro-dimethyl-silanyl)-1,4,8-triaza-cycloundecane

Conditions
ConditionsYield
Stage #1: 1,4,8-triazacycloundecane trihydrochloride With triethylamine In dichloromethane at 0℃; for 0.25h;
Stage #2: dimethylsilicon dichloride In dichloromethane at 20℃;
100%
(2-Chlor-vinyl)-dimethyl-chlorsilan
18142-52-4

(2-Chlor-vinyl)-dimethyl-chlorsilan

A

1,2-Dichloroethylene
540-59-0

1,2-Dichloroethylene

B

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

C

Chloro-dimethyl-(1,2,2-trichloro-ethyl)-silane
176102-95-7

Chloro-dimethyl-(1,2,2-trichloro-ethyl)-silane

D

Chloro-dimethyl-(1,1,2,2-tetrachloro-ethyl)-silane

Chloro-dimethyl-(1,1,2,2-tetrachloro-ethyl)-silane

Conditions
ConditionsYield
With chlorine at 22 - 83℃; for 5h; Further byproducts given;A 5%
B 6%
C 70%
D 3%
(2-Chlor-vinyl)-dimethyl-chlorsilan
18142-52-4

(2-Chlor-vinyl)-dimethyl-chlorsilan

A

1,2-Dichloroethylene
540-59-0

1,2-Dichloroethylene

B

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

C

Chloro-dimethyl-(1,2,2-trichloro-ethyl)-silane
176102-95-7

Chloro-dimethyl-(1,2,2-trichloro-ethyl)-silane

D

Chloro-dimethyl-pentachloroethyl-silane

Chloro-dimethyl-pentachloroethyl-silane

Conditions
ConditionsYield
With chlorine for 5h; Further byproducts given;A 5%
B 6%
C 70%
D 2%
(2-Chlor-vinyl)-dimethyl-chlorsilan
18142-52-4

(2-Chlor-vinyl)-dimethyl-chlorsilan

A

1,2-Dichloroethylene
540-59-0

1,2-Dichloroethylene

B

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

C

Chloro-dimethyl-(1,2,2-trichloro-ethyl)-silane
176102-95-7

Chloro-dimethyl-(1,2,2-trichloro-ethyl)-silane

D

1,1,2,2-tetrachloroethane
79-34-5

1,1,2,2-tetrachloroethane

Conditions
ConditionsYield
With chlorine for 5h; Further byproducts given;A 5%
B 6%
C 70%
D 2%
3,6-di-tert-butyl-9H-fluorene
58775-07-8

3,6-di-tert-butyl-9H-fluorene

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

dimethyl (3,6-di-tert-butylfluoren-9-yl)silyl chloride

dimethyl (3,6-di-tert-butylfluoren-9-yl)silyl chloride

Conditions
ConditionsYield
Stage #1: 3,6-di-tert-butyl-9H-fluorene With n-butyllithium In diethyl ether at -78 - 20℃; Schlenk technique;
Stage #2: dimethylsilicon dichloride In diethyl ether at -78 - 20℃; Schlenk technique;
100%
Stage #1: 3,6-di-tert-butyl-9H-fluorene With n-butyllithium In diethyl ether at -78 - 20℃; Schlenk technique;
Stage #2: dimethylsilicon dichloride In diethyl ether at -78 - 20℃; Schlenk technique;
100%
Stage #1: 3,6-di-tert-butyl-9H-fluorene With n-butyllithium In diethyl ether; hexane at 20℃; for 3h;
Stage #2: dimethylsilicon dichloride In diethyl ether; hexane at 20℃; Further stages.;
87.9%
Stage #1: 3,6-di-tert-butyl-9H-fluorene With n-butyllithium In diethyl ether
Stage #2: dimethylsilicon dichloride In diethyl ether
(((CH3)2CH)2N)2BP(H)Li(CH3OCH2CH2OCH3)
235756-34-0

(((CH3)2CH)2N)2BP(H)Li(CH3OCH2CH2OCH3)

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

bis([bis(diisopropylamino)boryl]phosphino)dimethylsilane
235756-04-4

bis([bis(diisopropylamino)boryl]phosphino)dimethylsilane

Conditions
ConditionsYield
In hexane byproducts: LiCl, DME; inert atmosphere; mixing stoich. amts. at 0°C, stirring at 23°C for 5 h; filtration off of LiCl, evapn. (reduced pressure); elem. anal.;100%
1-propynyl lithium
4529-04-8

1-propynyl lithium

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

bis(prop-1-ynyl)dimethylsilane
75405-43-5

bis(prop-1-ynyl)dimethylsilane

Conditions
ConditionsYield
In tetrahydrofuran at 20℃; for 4h;100%
In tetrahydrofuran at 20℃; for 4h;100%
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

C32H40Cl2Si2
1388645-07-5

C32H40Cl2Si2

Conditions
ConditionsYield
Stage #1: C28H30 With n-butyllithium In tetrahydrofuran; hexane at -78 - 20℃; Inert atmosphere;
Stage #2: dimethylsilicon dichloride In tetrahydrofuran; hexane at -78 - 20℃; Inert atmosphere;
100%
n-Dodecylamine
124-22-1

n-Dodecylamine

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

bis(n-dodecylamino)dimethylsilane
1384112-03-1

bis(n-dodecylamino)dimethylsilane

Conditions
ConditionsYield
In hexane at 20℃; for 24h; Cooling;100%
With triethylamine In pentane at -0.16 - 19.84℃; Inert atmosphere;
n-Octylamine
111-86-4

n-Octylamine

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

bis(n-octylamino)dimethylsilane
1384112-02-0

bis(n-octylamino)dimethylsilane

Conditions
ConditionsYield
In hexane at 20℃; for 24h; Cooling;100%
With triethylamine In pentane at -0.16 - 19.84℃; Inert atmosphere;
2,2,6-trimethyl-1,2,3,5-tetrahydro-s-indacene

2,2,6-trimethyl-1,2,3,5-tetrahydro-s-indacene

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

chloro(dimethyl)(2,6,6-trimethyl-1,5,6,7-tetrahydro-s-indacen-1-yl)silane

chloro(dimethyl)(2,6,6-trimethyl-1,5,6,7-tetrahydro-s-indacen-1-yl)silane

Conditions
ConditionsYield
Stage #1: 2,2,6-trimethyl-1,2,3,5-tetrahydro-s-indacene With n-butyllithium In tetrahydrofuran; hexane; toluene at 20 - 60℃; for 4h;
Stage #2: dimethylsilicon dichloride In tetrahydrofuran; hexane; toluene for 1h; Reflux;
100%
2,2,7-trimethyl-1,2,3,6-tetrahydro-as-indacene

2,2,7-trimethyl-1,2,3,6-tetrahydro-as-indacene

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

chloro(dimethyl)(2,7,7-trimethyl-3,6,7,8-tetrahydro-as-indacen-3-yl)silane

chloro(dimethyl)(2,7,7-trimethyl-3,6,7,8-tetrahydro-as-indacen-3-yl)silane

Conditions
ConditionsYield
Stage #1: 2,2,7-trimethyl-1,2,3,6-tetrahydro-as-indacene With n-butyllithium In tetrahydrofuran; hexane; toluene at 60℃; for 4h;
Stage #2: dimethylsilicon dichloride In tetrahydrofuran; hexane; toluene at 20℃; for 1h;
100%
1-(2-methyl-1H-inden-4-yl)-1,2,3,4-tetrahydroquinoline

1-(2-methyl-1H-inden-4-yl)-1,2,3,4-tetrahydroquinoline

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

1-(1-(chlorodimethylsilyl)-2-methyl-1H-inden-4-yl)-1,2,3,4-tetrahydroquinoline

1-(1-(chlorodimethylsilyl)-2-methyl-1H-inden-4-yl)-1,2,3,4-tetrahydroquinoline

Conditions
ConditionsYield
Stage #1: 1-(2-methyl-1H-inden-4-yl)-1,2,3,4-tetrahydroquinoline With n-butyllithium In diethyl ether at -78 - 20℃; Schlenk technique;
Stage #2: dimethylsilicon dichloride In diethyl ether at -78 - 20℃; Schlenk technique;
100%
2-methyl-5-tert-Butyl-6-methoxy-7-(3,5-di-tert-butylphenyl)-1H-indene
1417537-10-0

2-methyl-5-tert-Butyl-6-methoxy-7-(3,5-di-tert-butylphenyl)-1H-indene

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

bis[6-tert-butyl-4-(3,5-di-tert-butylphenyl)-5-methoxy-2-methyl-1H-inden-1-yl]dimethylsilane

bis[6-tert-butyl-4-(3,5-di-tert-butylphenyl)-5-methoxy-2-methyl-1H-inden-1-yl]dimethylsilane

Conditions
ConditionsYield
Stage #1: 5-tert-butyl-7-(3,5-di-tert-butylphenyl)-6-methoxy-2-methyl-1H-indene With n-butyllithium In diethyl ether; hexane at -50 - 20℃; for 4h;
Stage #2: With copper(l) cyanide In diethyl ether at -50 - -25℃; for 0.5h;
Stage #3: dimethylsilicon dichloride In diethyl ether at 20℃;
100%
Cyclododecylamine
1502-03-0

Cyclododecylamine

1-(5-methyl-2-furyl)indene

1-(5-methyl-2-furyl)indene

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

(cyclododecylamine){3-(5-methyl-2-furyl)indenyl}dimethylsilane

(cyclododecylamine){3-(5-methyl-2-furyl)indenyl}dimethylsilane

Conditions
ConditionsYield
Stage #1: 1-(5-methyl-2-furyl)indene With n-butyllithium In tetrahydrofuran; hexane at -78 - 20℃; for 2h;
Stage #2: dimethylsilicon dichloride In tetrahydrofuran; hexane at -78 - 20℃; for 2h;
Stage #3: Cyclododecylamine Further stages;
100%
lithium(trimethylsilyl)methylcyclopentadienide

lithium(trimethylsilyl)methylcyclopentadienide

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

dimethylsilyl-bis((trimethylsilyl)methylcyclopentadiene)

dimethylsilyl-bis((trimethylsilyl)methylcyclopentadiene)

Conditions
ConditionsYield
In tetrahydrofuran at -25℃;100%
4,8-di(3,5-dimethylphenyl)-6-methyl-1,2,3,5-tetrahydro-s-indacene

4,8-di(3,5-dimethylphenyl)-6-methyl-1,2,3,5-tetrahydro-s-indacene

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

[4,8-bis(3,5-dimethylphenyl)-2-methyl-1,5,6,7-tetrahydro-s-indacen-1-yl]chlorodimethylsilane

[4,8-bis(3,5-dimethylphenyl)-2-methyl-1,5,6,7-tetrahydro-s-indacen-1-yl]chlorodimethylsilane

Conditions
ConditionsYield
Stage #1: 4,8-di(3,5-dimethylphenyl)-6-methyl-1,2,3,5-tetrahydro-s-indacene With n-butyllithium In tetrahydrofuran; diethyl ether; hexane at -30 - 20℃;
Stage #2: dimethylsilicon dichloride In tetrahydrofuran; diethyl ether; hexane at -50 - 20℃;
100%
Stage #1: 4,8-di(3,5-dimethylphenyl)-6-methyl-1,2,3,5-tetrahydro-s-indacene With n-butyllithium In tetrahydrofuran; diethyl ether; hexane at -30 - 20℃;
Stage #2: dimethylsilicon dichloride In tetrahydrofuran; diethyl ether; hexane at -50 - 20℃;
100%
Na[(η-9-SMe2-7,8-C2B9H10)]

Na[(η-9-SMe2-7,8-C2B9H10)]

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

η1-8-SiMe2Cl-9-SMe2-7,8-C2B9H10
1068054-94-3

η1-8-SiMe2Cl-9-SMe2-7,8-C2B9H10

Conditions
ConditionsYield
In tetrahydrofuran byproducts: NaCl; under Ar; mixt. of Me2SiCl2 and soln. of B compd. in THF stirred at roomtemp. for 3 d; filtered; solvent removed from filtrate by evapn. in vac.; dissolved in THF; pptd. by addition of petroleum ether; recrystd. twice; dried overnight under vac.; elem. anal.;99.7%
sodium methylate
124-41-4

sodium methylate

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

dimethyldimethoxysilan
1112-39-6

dimethyldimethoxysilan

Conditions
ConditionsYield
In methanol at 18 - 57℃; for 3.5h;99%
With diethyl ether
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

aniline
62-53-3

aniline

Bis(anilino)dimethylsilane
13435-09-1

Bis(anilino)dimethylsilane

Conditions
ConditionsYield
With triethylamine In diethyl ether Cooling with ice; Inert atmosphere; Schlenk technique;99%
In diethyl ether for 1h; Substitution; aminolysis;81%
With triethylamine In pentane at -0.16 - 19.84℃; Inert atmosphere;55%
2,2′-(ethyne-1,2-diyl)diphenol
93533-83-6

2,2′-(ethyne-1,2-diyl)diphenol

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

6,6-dimethyl-12,13-didehydrobenzo[d,h][1,3,2]dioxasilonine

6,6-dimethyl-12,13-didehydrobenzo[d,h][1,3,2]dioxasilonine

Conditions
ConditionsYield
With triethylamine In dichloromethane at 20℃; for 12h; Cyclization;99%
allyl tert-butyldimethylsilane
74472-22-3

allyl tert-butyldimethylsilane

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

1-(tert-butyl-dimethyl-silanyl)-3-{[3-(tert-butyl-dimethyl-silanyl)-allyl]-dimethyl-silanyl}-propene

1-(tert-butyl-dimethyl-silanyl)-3-{[3-(tert-butyl-dimethyl-silanyl)-allyl]-dimethyl-silanyl}-propene

Conditions
ConditionsYield
Stage #1: allyl tert-butyldimethylsilane With n-butyllithium In hexane at -78 - 20℃; Metallation;
Stage #2: dimethylsilicon dichloride In hexane for 15h; silylation; Further stages.;
99%
2-bromo-4,6-di-tert-butylphenyl trimethylsilyl ether
5920-84-3

2-bromo-4,6-di-tert-butylphenyl trimethylsilyl ether

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

(3,5-di-tert-butyl-2-trimethylsiloxyphenyl)chlorodimethylsilane

(3,5-di-tert-butyl-2-trimethylsiloxyphenyl)chlorodimethylsilane

Conditions
ConditionsYield
With n-butyllithium In tetrahydrofuran; hexane99%
(tert-butylamino){tert-butyl(trimethylsilyl)amino}borane
93109-75-2

(tert-butylamino){tert-butyl(trimethylsilyl)amino}borane

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

{tert-butyl(chlorodimethylsilyl)amino}{tert-butyl(trimethylsilyl)amino}chloroborane
112795-02-5

{tert-butyl(chlorodimethylsilyl)amino}{tert-butyl(trimethylsilyl)amino}chloroborane

Conditions
ConditionsYield
In hexane addn. of soln. of (CH3)3SiNC(CH3)3BNC(CH3)3 in hexane at 20°C to (CH3)2SiCl2 at 60°C; removal of solvent, distn.; elem. anal.;99%
4-bromo-2-isopropoxy-1-vinylbenzene

4-bromo-2-isopropoxy-1-vinylbenzene

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

C13H19ClOSi
1080555-72-1

C13H19ClOSi

Conditions
ConditionsYield
Stage #1: 4-bromo-2-isopropoxy-1-vinylbenzene With iodine; magnesium In tetrahydrofuran Inert atmosphere; Reflux;
Stage #2: dimethylsilicon dichloride In tetrahydrofuran at 0 - 20℃; Inert atmosphere;
99%

75-78-5Relevant articles and documents

PROCESS FOR THE STEPWISE SYNTHESIS OF SILAHYDROCARBONS

-

Page/Page column 54; 58, (2021/12/08)

The invention relates to a process for the stepwise synthesis of silahydrocarbons bearing up to four different organyl substituents at the silicon atom, wherein the process includes at least one step a) of producing a bifunctional hydridochlorosilane by a redistribution reaction, selective chlorination of hydridosilanes with an ether/HCI reagent, or by selective chlorination of hydridosilanes with SiCI4, at least one step b) of submitting a bifunctional hydridochloromonosilane to a hydrosilylation reaction, at least one step c) of hydrogenation of a chloromonosilane, and a step d) in which a silahydrocarbon compound is obtained in a hydrosilylation reaction.

Method for preparing methylchlorosilanes

-

Paragraph 0040-0056, (2020/10/29)

The present invention relates to a method for producing methylchlorosilane by a direct synthesis method and, more specifically, to a method for preparing dimethyldichlorosilane with an improved output of methylchlorosilane (M2) and trimethylchlorosilane (M3). According to the present invention, the method for preparing methylchlorosilane comprises the step of reacting a contact composition including metal silicon, aluminum, a catalyst and a cocatalyst with methyl chloride, wherein the contact composition includes 0.1 to 0.2 parts by weight based on 100 parts by weight of metal silicon.(AA) MCS+ECM+Unreacted MC(BB) ECM+Unreacted MC(CC) FBR(MCS Reactor)(DD) ECM(By-product)(EE) Unreacted MCCOPYRIGHT KIPO 2021

Synthesis of Functional Monosilanes by Disilane Cleavage with Phosphonium Chlorides

Santowski, Tobias,Sturm, Alexander G.,Lewis, Kenrick M.,Felder, Thorsten,Holthausen, Max C.,Auner, Norbert

supporting information, p. 3809 - 3815 (2019/02/13)

The Müller–Rochow direct process (DP) for the large-scale production of methylchlorosilanes MenSiCl4?n (n=1–3) generates a disilane residue (MenSi2Cl6?n, n=1–6, DPR) in thousands of tons annually. This report is on methylchlorodisilane cleavage reactions with use of phosphonium chlorides as the cleavage catalysts and reaction partners to preferably obtain bifunctional monosilanes MexSiHyClz (x=2, y=z=1; x,y=1, z=2; x=z=1, y=2). Product formation is controlled by the reaction temperature, the amount of phosphonium chloride employed, the choice of substituents at the phosphorus atom, and optionally by the presence of hydrogen chloride, dissolved in ethers, in the reaction mixture. Replacement of chloro by hydrido substituents at the disilane backbone strongly increases the overall efficiency of disilane cleavage, which allows nearly quantitative silane monomer formation under comparably moderate conditions. This efficient workup of the DPR thus not only increases the economic value of the DP, but also minimizes environmental pollution.

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