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N-Ethyl-3,5-dimethylaniline is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

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  • 13342-22-8 Structure
  • Basic information

    1. Product Name: N-Ethyl-3,5-dimethylaniline
    2. Synonyms: N-Ethyl-3,5-dimethylaniline;(3,5-dimethylphenyl)-ethyl-amine
    3. CAS NO:13342-22-8
    4. Molecular Formula: C10H15N
    5. Molecular Weight: 149.2328
    6. EINECS: N/A
    7. Product Categories: N/A
    8. Mol File: 13342-22-8.mol
  • Chemical Properties

    1. Melting Point: N/A
    2. Boiling Point: N/A
    3. Flash Point: N/A
    4. Appearance: /
    5. Density: N/A
    6. Refractive Index: N/A
    7. Storage Temp.: N/A
    8. Solubility: N/A
    9. CAS DataBase Reference: N-Ethyl-3,5-dimethylaniline(CAS DataBase Reference)
    10. NIST Chemistry Reference: N-Ethyl-3,5-dimethylaniline(13342-22-8)
    11. EPA Substance Registry System: N-Ethyl-3,5-dimethylaniline(13342-22-8)
  • Safety Data

    1. Hazard Codes: Xi
    2. Statements: N/A
    3. Safety Statements: N/A
    4. WGK Germany:
    5. RTECS:
    6. HazardClass: IRRITANT
    7. PackingGroup: N/A
    8. Hazardous Substances Data: 13342-22-8(Hazardous Substances Data)

13342-22-8 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 13342-22-8 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,3,3,4 and 2 respectively; the second part has 2 digits, 2 and 2 respectively.
Calculate Digit Verification of CAS Registry Number 13342-22:
(7*1)+(6*3)+(5*3)+(4*4)+(3*2)+(2*2)+(1*2)=68
68 % 10 = 8
So 13342-22-8 is a valid CAS Registry Number.

13342-22-8SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 17, 2017

Revision Date: Aug 17, 2017

1.Identification

1.1 GHS Product identifier

Product name 3,5-dimethyl-N-ethylaniline

1.2 Other means of identification

Product number -
Other names N-ethyl-3,5-dimethylaniline

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:13342-22-8 SDS

13342-22-8Relevant articles and documents

Cobalt-Catalyzed Reductive Alkylation of Amines with Carboxylic Acids

Emayavaramban, Balakumar,Chakraborty, Priyanka,Sundararaju, Basker

, p. 3089 - 3093 (2018/12/11)

Direct reductive alkylation of amines with carboxylic acid is carried out by using an inexpensive, air-stable cobalt/triphos catalytic system with molecular hydrogen as the reductant. This efficient synthetic method proceeds through reduction and condensation, followed by reduction of the in situ-generated imine into the amine in a green catalytic process.

Photoinduced self-structured surface pattern on a molecular azo glass film: Structure-property relationship and wavelength correlation

Wang, Xiaolin,Yin, Jianjun,Wang, Xiaogong

experimental part, p. 12666 - 12676 (2012/06/18)

In this study, three series of star-shaped molecular azo glasses were synthesized, and self-structured surface pattern formation on the azo compound films was studied by laser irradiation at different wavelengths. The molecular azo glasses were synthesized from three core precursors (Tr-AN, Tr-35AN, Tr-H35AN), which were prepared by ring-opening reactions between 1,3,5-triglycidyl isocyanurate and corresponding aniline derivatives. The star-shaped azo compounds were obtained through azo-coupling reactions between the core precursors and diazonium salts of 4-chloroaniline, 4-aminobenzonitrile, and 4-nitroaniline, respectively. By using the two-step reaction scheme, three series of azo compounds with different structures were obtained. The core precursors and azo compounds were characterized by using 1H NMR, FT-IR, UV-vis, mass spectrometry, and thermal analyses. The self-structured surface pattern formation on films of the azo compounds was studied by irradiating the azo compound films with a normal-incident laser beam at different wavelengths (488, 532, and 589 nm). The results show that the photoinduced surface pattern formation behavior is closely related to the structure of the azo compounds, excitation wavelength, and light polarization conditions. The absorption band position of the π-π* transition is mainly determined by the electron-withdrawing groups on the azo chromophores. When the excitation wavelength is between λmax and the band tail at the longer wavelength side, the self-structured surface patterns can be more efficiently induced to form on the films. The 3,5-dimethyl substitution on azo chromophores inhibits the surface pattern formation for certain excitation wavelengths. Increasing molecular interaction also shows an effect of restraining the surface pattern formation. The irradiations with linearly and circularly polarized light cause significant differences in the alignment manner of the pillarlike structures and their saturated height.

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