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Bis(dimethylsilyl)methane is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

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  • 18163-84-3 Structure
  • Basic information

    1. Product Name: Bis(dimethylsilyl)methane
    2. Synonyms: 2,4-Dimethyl-2,4-disilapentane;Bis(dimethylsilyl)methane;Methylenebis(dimethylsilane)
    3. CAS NO:18163-84-3
    4. Molecular Formula: C5H16Si2
    5. Molecular Weight: 0
    6. EINECS: N/A
    7. Product Categories: N/A
    8. Mol File: 18163-84-3.mol
  • Chemical Properties

    1. Melting Point: N/A
    2. Boiling Point: N/A
    3. Flash Point: N/A
    4. Appearance: /
    5. Density: N/A
    6. Refractive Index: N/A
    7. Storage Temp.: N/A
    8. Solubility: N/A
    9. CAS DataBase Reference: Bis(dimethylsilyl)methane(CAS DataBase Reference)
    10. NIST Chemistry Reference: Bis(dimethylsilyl)methane(18163-84-3)
    11. EPA Substance Registry System: Bis(dimethylsilyl)methane(18163-84-3)
  • Safety Data

    1. Hazard Codes: N/A
    2. Statements: N/A
    3. Safety Statements: N/A
    4. WGK Germany:
    5. RTECS:
    6. HazardClass: N/A
    7. PackingGroup: N/A
    8. Hazardous Substances Data: 18163-84-3(Hazardous Substances Data)

18163-84-3 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 18163-84-3 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,8,1,6 and 3 respectively; the second part has 2 digits, 8 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 18163-84:
(7*1)+(6*8)+(5*1)+(4*6)+(3*3)+(2*8)+(1*4)=113
113 % 10 = 3
So 18163-84-3 is a valid CAS Registry Number.

18163-84-3SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 14, 2017

Revision Date: Aug 14, 2017

1.Identification

1.1 GHS Product identifier

Product name dimethylsilylmethyl(dimethyl)silane

1.2 Other means of identification

Product number -
Other names 1,1,3,3-Tetramethyl-1,3-disilapropan

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:18163-84-3 SDS

18163-84-3Relevant articles and documents

Disilane Cleavage with Selected Alkali and Alkaline Earth Metal Salts

Santowski, Tobias,Sturm, Alexander G.,Lewis, Kenrick M.,Felder, Thorsten,Holthausen, Max C.,Auner, Norbert

supporting information, p. 13202 - 13207 (2019/10/22)

The industry-scale production of methylchloromonosilanes in the Müller–Rochow Direct Process is accompanied by the formation of a residue, the direct process residue (DPR), comprised of disilanes MenSi2Cl6-n (n=1–6). Great research efforts have been devoted to the recycling of these disilanes into monosilanes to allow reintroduction into the siloxane production chain. In this work, disilane cleavage by using alkali and alkaline earth metal salts is reported. The reaction with metal hydrides, in particular lithium hydride (LiH), leads to efficient reduction of chlorine containing disilanes but also induces disproportionation into mono- and oligosilanes. Alkali and alkaline earth chlorides, formed in the course of the reduction, specifically induce disproportionation of highly chlorinated disilanes, whereas highly methylated disilanes (n>3) remain unreacted. Nearly quantitative DPR conversion into monosilanes was achieved by using concentrated HCl/ether solutions in the presence of lithium chloride.

METHODS AND APPARATUS FOR FORMING GASEOUS ORGANOSILICON COMPOUNDS

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Page/Page column 35-39, (2009/07/03)

The present application is directed to a method for producing, from a solid organosilane compound, a mixture of gaseous organosilicon compounds having a desired molar ratio, the method comprising the step of pyrolysing the solid organosilane while maintaining a predetermined pressure which is selected to provide the desired molar ratio of gaseous organosilicon compounds. Associated apparatus and control mechanisms are also disclosed.

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