Ligand-free nickel-catalyzed conversion of aldoximes into nitriles
Catalytic dehydration of aldoximes can be performed efficiently with NiCl2 in acetonitrile under neutral and mild conditions. Under these conditions, various functionalized aldoximes produce the corresponding nitriles in good to excellent yields. Georg Thieme Verlag Stuttgart. New York.
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.
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(2010/04/23)
Novel tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process
Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.
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(2008/06/13)
Amine compounds, resist compositions and patterning process
Amine compounds having a cyano group are useful in resist compositions for preventing a resist film from thinning and also for enhancing the resolution and focus margin of resist.
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(2008/06/13)
Gas Phase Thermolysis of Allyl Cyanomethyl Amine, Diallyl Cyanomethyl Amine, Diethyl Cyanomethyl Amine, and Diethyl Propargyl Amine
The title amines were pyrolyzed in a stirred-flow reactor at 380 - 510 deg C, pressures of 8 - 15 torr and residence times of 0.3 - 2.4 s, using toluene as carrier gas.The substrates with an allyl group yielded propene and iminonitriles as reaction products.HCN is formed by decomposition of the iminonitriles.The first-order rate coefficients for propene formation fit the Arrhenius equations.Allyl cyanomethyl amine: k(s-1) = 1013.29 +/- 0.35exp(-189 +/- 5 kJ/mol RT) Diallyl cyanomethyl amine: k(s-1) = 1013.00 +/- 0.20exp(-183 +/- 3 kJ/mol RT) Diethyl cyanomethyl amine gave a 20:1 gas mixture of ethylene and ethane, plus HCN.The liquid product fraction contained mainly N-ethyl methanaldimine.The first-order rate coefficients for ethylene formation followed the Arrhenius equation k(s-1) = 1015.30 +/- 0.24exp(-226 +/- 3 kJ/mol RT) Diethyl propargyl amine decomposed cleanly into allene and N-ethyl ethanaldimine.The first-order rate coefficients for allene formation fit the Arrhenius equation k(s-1) = 1012.84 +/- 0.30exp(-168 +/- 4 kJ/mol RT).The results suggest that the above allyl and propargyl amines decompose unimolecularly by mechanisms involving six-center cyclic transition states.For diethyl cyanomethyl amine, a nonchain free radical mechanism is proposed.
Martin, Gonzalo,Ascanio, Julian,Rodriguez, Jesus
p. 99 - 108
(2007/10/02)
Method for 1,2-substituted imidazoline compositions
This invention is a method for making 1,2-substituted imidazoline compositions utilizing a polyamine mixture containing a high concentration of linear polyamine. The polyamine is either triethylenetetramine or tetraethylenepentamine. The polyamine mixture is reacted with a fatty acid, fatty dimer acid or the fatty esters thereof to yield the 1,2-substituted imidazoline composition. The highly linear polyamine provides higher yields of the imidazoline compound in the composition.
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(2008/06/13)
FORMATION OF DIALKYLAMINOACETONITRILE FROM N,N-DIALKYLAMIDES IN AN RF PLASMA
An unprecedented transformation of N,N-dimethylamides into dimethylaminoacetonitrile (1) by passing through a 13.56 MHz gaseous discharge was found.Diethylaminoacetonitrile (2) was similarly given from N,N-dimethylformamide.