1001-52-1 Usage
Uses
Used in Organic Synthesis:
N-BUTYLDIMETHYLSILANE is used as a reagent for introducing a trimethylsilyl group to various functional groups in organic compounds. This silylating agent helps protect sensitive groups, enhancing their stability during subsequent chemical reactions.
Used in the Production of Silicone Oils and Rubbers:
N-BUTYLDIMETHYLSILANE is used as a precursor in the synthesis of silicone oils and rubbers, contributing to the development of materials with unique properties such as heat resistance, flexibility, and biocompatibility.
Used in Metal-Organic Chemical Vapor Deposition (MOCVD) Processes:
In the semiconductor industry, N-BUTYLDIMETHYLSILANE is utilized in MOCVD processes for the production of thin films. This application is crucial for fabricating electronic devices and components with precise control over material properties and layer thicknesses.
Check Digit Verification of cas no
The CAS Registry Mumber 1001-52-1 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 1,0,0 and 1 respectively; the second part has 2 digits, 5 and 2 respectively.
Calculate Digit Verification of CAS Registry Number 1001-52:
(6*1)+(5*0)+(4*0)+(3*1)+(2*5)+(1*2)=21
21 % 10 = 1
So 1001-52-1 is a valid CAS Registry Number.
InChI:InChI=1/C6H16Si/c1-4-5-6-7(2)3/h7H,4-6H2,1-3H3
1001-52-1Relevant articles and documents
Molecular Zinc Hydride Cations [ZnH]+: Synthesis, Structure, and CO2 Hydrosilylation Catalysis
Douair, Iskander,Maron, Laurent,Okuda, Jun,Ritter, Florian,Spaniol, Thomas P.
, (2020)
Protonolysis of [ZnH2]n with the conjugated Br?nsted acid of the bidentate diamine TMEDA (N,N,N′,N′-tetramethylethane-1,2-diamine) and TEEDA (N,N,N′,N′-tetraethylethane-1,2-diamine) gave the zinc hydride cation [(L2)ZnH]s
Cleavage of Si-C and Ge-C bonds in heterylsilanes and -germanes by organolithium reagents
Gevorgyan, Vladimir,Borisova, Larisa,Lukevics, Edmunds
, p. 381 - 387 (2007/10/02)
Organolithium reagents RLi can cleave Si-C and Ge-C bonds in heterylsilanes and -germanes substituting furyl, dihydrofuryl and dihydropyranyl groups for the organolithium residue R.
