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1066-35-9

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1066-35-9 Usage

Chemical Properties

Colorless clear liquid

Uses

Chlorodimethylsilane is used to prepare vinyldimethylsilanols for palladium-catalyzed cross-coupling with aryl iodides. Chlorodimethylsilane in combination with a tertiary amine such as triethylamine is another useful reagent for the synthesis of hydrodimethylsilyl ethers, especially for large scale preparations.

Application

The popular uses of chlorodimethylsilane are listed as below:Will form high-boiling polymeric by-products with aqueous work-up.A monomer ('building block') in the production of silicone polymers. Silicone polymers may be oils, greases, rubbers and resins and have a wide-range of uses.In the electronics industry for the production of ultra-pure polysilicon and in the manufacture of semiconductors and photovoltaics.Although the end uses of products made from chlorodimethylsilane will vary, it can be assumed that due to its highly reactive nature, no residual unreacted material will be present in any of the final products.

General Description

A colorless fuming liquid with a pungent, burning odor. Flash point -18°F. Boiling point 95°F. Density about 6.9 lb / gal. Extremely corrosive to skin and respiratory tissues, both as a liquid and vapor. Vapors are heavier than air.

Air & Water Reactions

Highly flammable. Reacts violently on contact with water to liberate heat and hydrogen chloride gas.

Reactivity Profile

Chlorosilanes, such as DIMETHYLCHLOROSILANE, are compounds in which silicon is bonded to from one to four chlorine atoms with other bonds to hydrogen and/or alkyl groups. Chlorosilanes react with water, moist air, or steam to produce heat and toxic, corrosive fumes of hydrogen chloride. They may also produce flammable gaseous H2. They can serve as chlorination agents. Chlorosilanes react vigorously with both organic and inorganic acids and with bases to generate toxic or flammable gases.

Health Hazard

May cause toxic effects if inhaled or ingested/swallowed. Contact with substance may cause severe burns to skin and eyes. Fire will produce irritating, corrosive and/or toxic gases. Vapors may cause dizziness or suffocation. Runoff from fire control or dilution water may cause pollution.

Fire Hazard

Flammable/combustible material. May be ignited by heat, sparks or flames. Vapors may form explosive mixtures with air. Vapors may travel to source of ignition and flash back. Most vapors are heavier than air. They will spread along ground and collect in low or confined areas (sewers, basements, tanks). Vapor explosion hazard indoors, outdoors or in sewers. Runoff to sewer may create fire or explosion hazard. Containers may explode when heated. Many liquids are lighter than water.

Flammability and Explosibility

Extremelyflammable

Check Digit Verification of cas no

The CAS Registry Mumber 1066-35-9 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 1,0,6 and 6 respectively; the second part has 2 digits, 3 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 1066-35:
(6*1)+(5*0)+(4*6)+(3*6)+(2*3)+(1*5)=59
59 % 10 = 9
So 1066-35-9 is a valid CAS Registry Number.
InChI:InChI=1/C2H6ClSi/c1-4(2)3/h1-2H3

1066-35-9 Well-known Company Product Price

  • Brand
  • (Code)Product description
  • CAS number
  • Packaging
  • Price
  • Detail
  • TCI America

  • (C0778)  Chlorodimethylsilane  >95.0%(GC)

  • 1066-35-9

  • 25mL

  • 290.00CNY

  • Detail
  • TCI America

  • (C0778)  Chlorodimethylsilane  >95.0%(GC)

  • 1066-35-9

  • 250mL

  • 1,500.00CNY

  • Detail
  • Alfa Aesar

  • (A13113)  Chlorodimethylsilane, 97%   

  • 1066-35-9

  • 10ml

  • 187.0CNY

  • Detail
  • Alfa Aesar

  • (A13113)  Chlorodimethylsilane, 97%   

  • 1066-35-9

  • 50ml

  • 468.0CNY

  • Detail
  • Alfa Aesar

  • (A13113)  Chlorodimethylsilane, 97%   

  • 1066-35-9

  • 250ml

  • 2182.0CNY

  • Detail
  • Aldrich

  • (144207)  Chlorodimethylsilane  98%

  • 1066-35-9

  • 144207-50G

  • 576.81CNY

  • Detail

1066-35-9SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 10, 2017

Revision Date: Aug 10, 2017

1.Identification

1.1 GHS Product identifier

Product name Chlorodimethylsilane

1.2 Other means of identification

Product number -
Other names Dimethylchlorosilane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only. Intermediates
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:1066-35-9 SDS

1066-35-9Synthetic route

dimethylsilane
1111-74-6

dimethylsilane

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

Conditions
ConditionsYield
With hydrogenchloride In diethyl ether at 60℃; for 0.5h; Temperature; Solvent;100%
With hydrogenchloride In diethylene glycol dimethyl ether at -45 - 15℃; for 12h;99%
methylsilane
992-94-9

methylsilane

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

Conditions
ConditionsYield
97%
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

Conditions
ConditionsYield
With N,N-diethylaminodimethylsilane Heating;87%
With sodium tetrahydroborate; tetra-n-butylphosphonium chloride In diethylene glycol dimethyl ether at 80 - 140℃; for 26h;11%
With Dichloromethylsilane; homogeneous catalyst, preferably pyridinium, phosphonium or imidazolium salt Industry scale;
1,1,2,2-tetramethyldisilane
814-98-2

1,1,2,2-tetramethyldisilane

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C

dimethylsilane
1111-74-6

dimethylsilane

D

trimethylsilan
993-07-7

trimethylsilan

Conditions
ConditionsYield
With tetra-n-butylphosphonium chloride at 180℃; for 17h; Sealed tube;A 2%
B 4%
C 87%
D 7%
1,1,3,3-tetramethyldisilazane
15933-59-2

1,1,3,3-tetramethyldisilazane

A

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

B

1,1-dimethyl-3,3,3-trichlorosilazane
135764-59-9

1,1-dimethyl-3,3,3-trichlorosilazane

C

1,1,3,3-tetramethyl-(2-trichlorosilyl)disilazane
135764-60-2

1,1,3,3-tetramethyl-(2-trichlorosilyl)disilazane

Conditions
ConditionsYield
With tetrachlorosilane at 20℃; for 24h;A n/a
B n/a
C 78%
With tetrachlorosilane at 20℃; for 24h;A n/a
B 54%
C n/a
1,1,3,3-Tetramethyldisiloxane
3277-26-7

1,1,3,3-Tetramethyldisiloxane

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

Conditions
ConditionsYield
With tetrabutylammomium bromide In water74.9%
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

B

dimethylsilane
1111-74-6

dimethylsilane

Conditions
ConditionsYield
With sodium tetrahydroborate; N,N,N,N,N,N-hexamethylphosphoric triamide in a glass ampoule under hermetic conditions;A 62%
B 6.1 % Chromat.
With Tetraethylene glycol dimethyl ether; tetra-n-butylphosphonium chloride; lithium hydride In 1,4-dioxane at -196 - 120℃; for 115.5h; Time; Temperature; Reagent/catalyst; Sealed tube;A 57%
B 35%
With lithium hydride; triphenylphosphine In diethylene glycol dimethyl ether at -196 - 160℃; for 62h; Time; Reagent/catalyst; Sealed tube;A 56%
B 11%
1,1,3,3-tetramethyldisilazane
15933-59-2

1,1,3,3-tetramethyldisilazane

chloromethylmethyldichlorosilane
1558-33-4

chloromethylmethyldichlorosilane

A

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

B

1-Chloro-1-chloromethyl-1,3,3-trimethyl-disilazane
135790-73-7

1-Chloro-1-chloromethyl-1,3,3-trimethyl-disilazane

Conditions
ConditionsYield
at 20℃; for 24h;A n/a
B 61%
N,N,N,N,N,N-hexamethylphosphoric triamide
680-31-9

N,N,N,N,N,N-hexamethylphosphoric triamide

1,1,3,3-Tetramethyldisiloxane
3277-26-7

1,1,3,3-Tetramethyldisiloxane

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

Conditions
ConditionsYield
In water60%
diethyl ether
60-29-7

diethyl ether

dimethylsilane
1111-74-6

dimethylsilane

A

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

B

dimethyl chloro ethoxy silane
1825-69-0

dimethyl chloro ethoxy silane

Conditions
ConditionsYield
With hydrogenchloride at 100℃; for 158h;A 60%
B 26%
1,2-dichlorotetramethylsilane
4342-61-4

1,2-dichlorotetramethylsilane

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
With 2-methylimidazole; tetra-n-butylphosphonium chloride at 175℃; for 89h; Temperature; Reagent/catalyst; Time; Sealed tube;A 7%
B 34%
C 57%
With tetra-n-butylphosphonium chloride at 140℃; for 64h; Temperature; Schlenk technique; Inert atmosphere; Sealed tube;
1,2-dichlorotetramethylsilane
4342-61-4

1,2-dichlorotetramethylsilane

A

1,3-dichloro-1,1,2,2,3,3-hexamethyltrisilane
812-36-2

1,3-dichloro-1,1,2,2,3,3-hexamethyltrisilane

B

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

C

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

D

1,4-dichloropermethyltetrasilane
754-75-6

1,4-dichloropermethyltetrasilane

E

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
With 2-methylimidazole; tetra-n-butylphosphonium chloride at 175℃; for 2.5h; Temperature; Time; Sealed tube;A 14%
B 7%
C 34%
D 8%
E 57%
1,2-dichlorotetramethylsilane
4342-61-4

1,2-dichlorotetramethylsilane

A

1,3-dichloro-1,1,2,2,3,3-hexamethyltrisilane
812-36-2

1,3-dichloro-1,1,2,2,3,3-hexamethyltrisilane

B

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

C

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

D

dimethylsilane
1111-74-6

dimethylsilane

E

1,4-dichloropermethyltetrasilane
754-75-6

1,4-dichloropermethyltetrasilane

F

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
With tetra-n-butylphosphonium chloride at 220℃; for 21h; Reagent/catalyst; Time; Sealed tube;A 6%
B 15%
C 21%
D 1%
E 1%
F 49%
1,2-dichlorotetramethylsilane
4342-61-4

1,2-dichlorotetramethylsilane

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C

trimethylsilan
993-07-7

trimethylsilan

D

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
With tetra-n-butylphosphonium chloride at 220℃; for 24h; Sealed tube;A 16%
B 30%
C 5%
D 44%
1,2-dichlorotetramethylsilane
4342-61-4

1,2-dichlorotetramethylsilane

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

B

dimethylsilane
1111-74-6

dimethylsilane

C

1,1,2,2-tetramethyldisilane
814-98-2

1,1,2,2-tetramethyldisilane

D

1-chloro-2-hydro-1,1,2,2-tetramethyldisilane
4455-83-8

1-chloro-2-hydro-1,1,2,2-tetramethyldisilane

Conditions
ConditionsYield
With tetra-n-butylphosphonium chloride; lithium hydride In diethylene glycol dimethyl ether at -196 - 160℃; for 35h; Sealed tube;A 42%
B 35%
C 6%
D 5%
1,2-dichlorotetramethylsilane
4342-61-4

1,2-dichlorotetramethylsilane

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C

dimethylsilane
1111-74-6

dimethylsilane

D

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
With 2-methylimidazole at 220℃; for 64h; Time;A 13%
B 37%
C 10%
D 40%
methane
34557-54-5

methane

A

Dichloromethylsilane
75-54-7

Dichloromethylsilane

B

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

Conditions
ConditionsYield
With Si-Cu; HCl In neat (no solvent) Si-Cu (10:2) and a mixt. of CH4 and HCl at 350°C;;A 38.8%
B 9.4%
With hydrogenchloride; copper; silicon In neat (no solvent) Si-Cu (10:2) and a mixt. of CH4 and HCl at 350°C;;A 38.8%
B 9.4%
1,2-dichlorotetramethylsilane
4342-61-4

1,2-dichlorotetramethylsilane

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C

dimethylsilane
1111-74-6

dimethylsilane

D

trimethylsilan
993-07-7

trimethylsilan

E

dichloro[(chlorodimethylsilyl)methyl]methylsilane
4519-04-4

dichloro[(chlorodimethylsilyl)methyl]methylsilane

F

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
With n-Butyl chloride; tributylphosphine at 220℃; for 70h; Sealed tube;A 13%
B 30%
C 2%
D 2%
E 18%
F 35%
trimethylsilyl(dimethylchlorosilyl)methane
13683-11-9

trimethylsilyl(dimethylchlorosilyl)methane

bis(chlorodimethylsilyl)methane
5357-38-0

bis(chlorodimethylsilyl)methane

dichloro[(chlorodimethylsilyl)methyl]methylsilane
4519-04-4

dichloro[(chlorodimethylsilyl)methyl]methylsilane

bis(methyldichlorosilyl)methane
4519-03-3

bis(methyldichlorosilyl)methane

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

Dichloromethylsilane
75-54-7

Dichloromethylsilane

B

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C

methylsilane
992-94-9

methylsilane

D

dimethylsilane
1111-74-6

dimethylsilane

E

chloro-methyl-silane
993-00-0

chloro-methyl-silane

Conditions
ConditionsYield
With tetra-n-butylphosphonium chloride; lithium hydride In diethylene glycol dimethyl ether at -196 - 220℃; for 31h; Sealed tube;A 7%
B 34%
C 9%
D 5%
E 7%
1,1,3,3-Tetramethyldisiloxane
3277-26-7

1,1,3,3-Tetramethyldisiloxane

dichloro(fluoro)(phenyl)silane
368-44-5

dichloro(fluoro)(phenyl)silane

A

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

B

phenyl(dimethylsiloxy)fluorochlorosilane
1344680-26-7

phenyl(dimethylsiloxy)fluorochlorosilane

Conditions
ConditionsYield
at 20℃; for 14h;A n/a
B 30%
Dichloromethylsilane
75-54-7

Dichloromethylsilane

A

Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

B

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C

chloro-methyl-silane
993-00-0

chloro-methyl-silane

Conditions
ConditionsYield
dihydrogen hexachloroplatinate at 150℃; for 4h;A 25.1%
B 3.5%
C 2.9%
dihydrogen hexachloroplatinate at 150℃; for 4h;A 25.1%
B 3.5%
C 2.9%
Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

Dichloromethylsilane
75-54-7

Dichloromethylsilane

B

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C

methylsilane
992-94-9

methylsilane

D

chloro-methyl-silane
993-00-0

chloro-methyl-silane

Conditions
ConditionsYield
With Tetraethylene glycol dimethyl ether; tetra-n-butylphosphonium chloride; lithium hydride at 80 - 120℃; for 86.25h;A 17%
B 19%
C 11%
D 23%
1,1,1,2,2,2-hexamethyldisilane
1450-14-2

1,1,1,2,2,2-hexamethyldisilane

pentamethylchlorodisilane
1560-28-7

pentamethylchlorodisilane

1,2-dichlorotetramethylsilane
4342-61-4

1,2-dichlorotetramethylsilane

1,1,2-trichloro-1,2,2-trimethyldisilane
13528-88-6

1,1,2-trichloro-1,2,2-trimethyldisilane

1,1,2,2-tetrachloro-1,2-dimethyldisilane
4518-98-3

1,1,2,2-tetrachloro-1,2-dimethyldisilane

1,1-dichlorotetramethyldisilane
4518-99-4

1,1-dichlorotetramethyldisilane

A

Dichloromethylsilane
75-54-7

Dichloromethylsilane

B

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

C

Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

D

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

E

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
With hydrogenchloride at 430 - 750℃; for 72h; Conversion of starting material;A 4 %Chromat.
B 12 %Chromat.
C 7 %Chromat.
D 6 %Chromat.
E 21%
1,1,1,2,2-pentamethyldisilane
812-15-7

1,1,1,2,2-pentamethyldisilane

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C

trimethylsilan
993-07-7

trimethylsilan

D

pentamethylchlorodisilane
1560-28-7

pentamethylchlorodisilane

Conditions
ConditionsYield
With hydrogenchloride In dibutyl ether; water at 70℃; for 24h;A 5%
B 22.8 %Spectr.
C 26 %Spectr.
D 6.3 %Spectr.
With hydrogenchloride In dibutyl ether; benzene-d6 at 70℃; for 24h; Sealed tube;
hexachlorodisilane
13465-77-5

hexachlorodisilane

tetra-n-butylphosphonium chloride
2304-30-5

tetra-n-butylphosphonium chloride

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

Conditions
ConditionsYield
With 2-methylimidazole at 175℃; for 2.5h; Sealed tube;5%
Dichloromethylsilane
75-54-7

Dichloromethylsilane

methylmagnesium bromide
75-16-1

methylmagnesium bromide

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

methane
34557-54-5

methane

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

Conditions
ConditionsYield
With hydrogenchloride; copper(II) hydroxide; silicon at 350℃;
dimethyl(ethoxy)silane
14857-34-2

dimethyl(ethoxy)silane

benzoyl chloride
98-88-4

benzoyl chloride

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

Conditions
ConditionsYield
at 200℃;
dimethyl(ethoxy)silane
14857-34-2

dimethyl(ethoxy)silane

Chlorodimethylvinylsilane
1719-58-0

Chlorodimethylvinylsilane

A

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

B

ethoxydimethylvinylsilane
5356-83-2

ethoxydimethylvinylsilane

Conditions
ConditionsYield
at 28.5℃; Equilibrium constant;
1-hexene
592-41-6

1-hexene

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

dimethylhexylsilyl chloride
3634-59-1

dimethylhexylsilyl chloride

Conditions
ConditionsYield
at 90℃; for 5h; Inert atmosphere;100%
With platinum on carbon nanotubes In neat (no solvent) at 20℃; for 24h;97%
dihydrogen hexachloroplatinate In diethyl ether for 15h; Heating;80%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

diallyl(dimethyl)silane
1113-12-8

diallyl(dimethyl)silane

1-(Chloro-dimethyl-silanyl)-3-{[3-(chloro-dimethyl-silanyl)-propyl]-dimethyl-silanyl}-propane
55392-19-3

1-(Chloro-dimethyl-silanyl)-3-{[3-(chloro-dimethyl-silanyl)-propyl]-dimethyl-silanyl}-propane

Conditions
ConditionsYield
With platinum 1,3-divinyl-1,1,3,3-tetramethyldisiloxane In 5,5-dimethyl-1,3-cyclohexadiene; hexane at 20℃; Inert atmosphere; Reflux;100%
platinum on activated charcoal In diethyl ether Heating;
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

1-iodo-10-undecene
7766-49-6

1-iodo-10-undecene

11-(dimethylchlorosilyl)-1-iodoundecane
139764-33-3

11-(dimethylchlorosilyl)-1-iodoundecane

Conditions
ConditionsYield
With dihydrogen hexachloroplatinate In dichloromethane for 12h;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

10-undecylenic acid N-hydroxysuccinimide ester
110661-49-9

10-undecylenic acid N-hydroxysuccinimide ester

N-succinimidyl 11-(dimethylchlorosilyl)undecanoate
139764-32-2

N-succinimidyl 11-(dimethylchlorosilyl)undecanoate

Conditions
ConditionsYield
With dihydrogen hexachloroplatinate In dichloromethane for 12h;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

2-Methylene-succinic acid 4-(11-bromo-undecyl) ester 1-[11-((S)-2-dimethylamino-3-phenyl-propoxycarbonyl)-undecyl] ester
139764-38-8

2-Methylene-succinic acid 4-(11-bromo-undecyl) ester 1-[11-((S)-2-dimethylamino-3-phenyl-propoxycarbonyl)-undecyl] ester

2-(Chloro-dimethyl-silanylmethyl)-succinic acid 4-(11-bromo-undecyl) ester 1-[11-((S)-2-dimethylamino-3-phenyl-propoxycarbonyl)-undecyl] ester
139764-39-9

2-(Chloro-dimethyl-silanylmethyl)-succinic acid 4-(11-bromo-undecyl) ester 1-[11-((S)-2-dimethylamino-3-phenyl-propoxycarbonyl)-undecyl] ester

Conditions
ConditionsYield
With dihydrogen hexachloroplatinate In dichloromethane for 12h;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

2-amino-phenol
95-55-6

2-amino-phenol

2,2-dimethyl-2,3-dihydro-benzo[1,3,2]oxazasilole
18245-89-1

2,2-dimethyl-2,3-dihydro-benzo[1,3,2]oxazasilole

Conditions
ConditionsYield
With triethylamine In tetrahydrofuran for 6h; Heating;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

[Methyl-(2-{tris-[2-(methyl-divinyl-silanyl)-ethyl]-silanyl}-ethyl)-vinyl-silanyl]-ethene
146063-23-2

[Methyl-(2-{tris-[2-(methyl-divinyl-silanyl)-ethyl]-silanyl}-ethyl)-vinyl-silanyl]-ethene

1-{bis-[2-(chloro-dimethyl-silanyl)-ethyl]-methyl-silanyl}-2-[tris-(2-{bis-[2-(chloro-dimethyl-silanyl)-ethyl]-methyl-silanyl}-ethyl)-silanyl]-ethane

1-{bis-[2-(chloro-dimethyl-silanyl)-ethyl]-methyl-silanyl}-2-[tris-(2-{bis-[2-(chloro-dimethyl-silanyl)-ethyl]-methyl-silanyl}-ethyl)-silanyl]-ethane

Conditions
ConditionsYield
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane (Karstedt's catalyst) In diethyl ether at 50℃; for 20h;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

tetrakis[2-(trivinylsilyl)ethyl]silane
151626-10-7

tetrakis[2-(trivinylsilyl)ethyl]silane

C56H136Cl12Si17

C56H136Cl12Si17

Conditions
ConditionsYield
bis(tetrabutylammonium) hexachloroplatinate(IV) In ethanol100%
chloroplatinic acid 1,1,3,3-tetramethyl-1,3-divinyldisiloxane complex Hydrosilation;
platinum Addition;
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

(4-(allyloxy)phenyl)(phenyl)methanone
42403-77-0

(4-(allyloxy)phenyl)(phenyl)methanone

4-(3'-chlorodimethylsilyl)propyloxybenzophenone

4-(3'-chlorodimethylsilyl)propyloxybenzophenone

Conditions
ConditionsYield
platinum on activated charcoal for 5h; Addition; hydrosilation; Heating;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

bis-allyloxy-dimethyl-silane
18269-92-6

bis-allyloxy-dimethyl-silane

1-(chloro-dimethyl-silanyl)-3-{[3-(chloro-dimethyl-silanyl)-propoxy]-dimethyl-silanyloxy}-propane

1-(chloro-dimethyl-silanyl)-3-{[3-(chloro-dimethyl-silanyl)-propoxy]-dimethyl-silanyloxy}-propane

Conditions
ConditionsYield
dihydrogen hexachloroplatinate at 25℃; for 3.25h;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

tris-allyloxy-methyl-silane
17984-91-7

tris-allyloxy-methyl-silane

C16H39Cl3O3Si4

C16H39Cl3O3Si4

Conditions
ConditionsYield
dihydrogen hexachloroplatinate at 25℃; for 3.25h;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

3-[allyloxy-(3-{[3-(bis-allyloxy-methyl-silanyl)-propoxy]-dimethyl-silanyloxy}-propyl)-methyl-silanyloxy]-propene
394737-60-1

3-[allyloxy-(3-{[3-(bis-allyloxy-methyl-silanyl)-propoxy]-dimethyl-silanyloxy}-propyl)-methyl-silanyloxy]-propene

1-{bis-[3-(chloro-dimethyl-silanyl)-propoxy]-methyl-silanyl}-3-[(3-{bis-[3-(chloro-dimethyl-silanyl)-propoxy]-methyl-silanyl}-propoxy)-dimethyl-silanyloxy]-propane

1-{bis-[3-(chloro-dimethyl-silanyl)-propoxy]-methyl-silanyl}-3-[(3-{bis-[3-(chloro-dimethyl-silanyl)-propoxy]-methyl-silanyl}-propoxy)-dimethyl-silanyloxy]-propane

Conditions
ConditionsYield
dihydrogen hexachloroplatinate In diethyl ether at 25℃; for 1.25h;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C31H60O9Si4
394737-65-6

C31H60O9Si4

C43H102Cl6O9Si10

C43H102Cl6O9Si10

Conditions
ConditionsYield
dihydrogen hexachloroplatinate at 25℃; for 3.25h;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

3-{allyloxy-[3-([3-(bis-allyloxy-methyl-silanyl)-propoxy]-{3-[(3-{bis-[3-(bis-allyloxy-methyl-silanyl)-propoxy]-methyl-silanyl}-propoxy)-dimethyl-silanyloxy]-propyl}-methyl-silanyloxy)-propyl]-methyl-silanyloxy}-propene

3-{allyloxy-[3-([3-(bis-allyloxy-methyl-silanyl)-propoxy]-{3-[(3-{bis-[3-(bis-allyloxy-methyl-silanyl)-propoxy]-methyl-silanyl}-propoxy)-dimethyl-silanyloxy]-propyl}-methyl-silanyloxy)-propyl]-methyl-silanyloxy}-propene

C66H156Cl8O14Si15

C66H156Cl8O14Si15

Conditions
ConditionsYield
dihydrogen hexachloroplatinate at 25℃; for 3.25h;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C73H144O21Si10

C73H144O21Si10

C97H228Cl12O21Si22

C97H228Cl12O21Si22

Conditions
ConditionsYield
dihydrogen hexachloroplatinate at 25℃; for 3.25h;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C106H212O30Si15

C106H212O30Si15

C138H324Cl16O30Si31

C138H324Cl16O30Si31

Conditions
ConditionsYield
dihydrogen hexachloroplatinate at 25℃; for 3.25h;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C108H228Si17

C108H228Si17

C132H312Cl12Si29

C132H312Cl12Si29

Conditions
ConditionsYield
With bis(tetrabutylammonium) hexachloroplatinate(IV) at 20℃;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

hex-1-yne
693-02-7

hex-1-yne

hex-1-yn-1-yldimethylsilane
79966-86-2

hex-1-yn-1-yldimethylsilane

Conditions
ConditionsYield
With n-butyllithium In tetrahydrofuran; pentane at -78 - 20℃;100%
Stage #1: hex-1-yne With ethylmagnesium bromide In tetrahydrofuran; diethyl ether at 0 - 20℃; for 0.0833333h; Inert atmosphere;
Stage #2: dimethylmonochlorosilane In tetrahydrofuran; diethyl ether at 0 - 20℃; for 4h; Inert atmosphere;
98%
Stage #1: hex-1-yne With n-butyllithium In diethyl ether; hexane at -78℃; for 0.5h;
Stage #2: dimethylmonochlorosilane In diethyl ether; hexane at -78 - 20℃; Further stages.;
85%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

4-(pent-4-en-1-yloxy)-1,1'-biphenyl
648930-60-3

4-(pent-4-en-1-yloxy)-1,1'-biphenyl

4-biphenyloxypentyldimethylchlorosilane
761401-74-5

4-biphenyloxypentyldimethylchlorosilane

Conditions
ConditionsYield
chloroplatinic acid 1,1,3,3-tetramethyl-1,3-divinyldisiloxane complex In xylene at 60℃; for 24h;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

acetic acid 2-allyloxyethyl ester
70964-99-7

acetic acid 2-allyloxyethyl ester

3-(dimethylchlorosilyl)propyloxyethyl acetate

3-(dimethylchlorosilyl)propyloxyethyl acetate

Conditions
ConditionsYield
divinyltetramethylsiloxaneplatinum(O) In xylene at 30 - 36℃; for 120h;100%
N-(10'-undecenyl)-12,14-dinitrodehydroabietamide
868152-12-9

N-(10'-undecenyl)-12,14-dinitrodehydroabietamide

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

N-[11'-(chlorodimethylsilyl)undecyl]-12,14-dinitrodehydroabietamide

N-[11'-(chlorodimethylsilyl)undecyl]-12,14-dinitrodehydroabietamide

Conditions
ConditionsYield
With dihydrogen hexachloroplatinate In dichloromethane; isopropyl alcohol Heating;100%
4-(10'-undecenylaminocarbonyl)-1-(friedelan-3α-yl)-benzoate
868152-15-2

4-(10'-undecenylaminocarbonyl)-1-(friedelan-3α-yl)-benzoate

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

4-[11'-(chlorodimethylsilyl)undecylaminocarbonyl]-1-(friedelan-3α-yl)-benzoate

4-[11'-(chlorodimethylsilyl)undecylaminocarbonyl]-1-(friedelan-3α-yl)-benzoate

Conditions
ConditionsYield
With dihydrogen hexachloroplatinate In dichloromethane; isopropyl alcohol Heating;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

Zr[Me2Si(η5-C5Me4)(η5-C5H3CMe2CH2CH2CHCH2)]Cl2
1093380-37-0

Zr[Me2Si(η5-C5Me4)(η5-C5H3CMe2CH2CH2CHCH2)]Cl2

Zr[Me2Si(η5-C5Me4)(η5-C5H3CMe2(CH2)4SiMe2Cl)]Cl2
1093380-62-1

Zr[Me2Si(η5-C5Me4)(η5-C5H3CMe2(CH2)4SiMe2Cl)]Cl2

Conditions
ConditionsYield
divinyltetramethylsiloxaneplatinum(O) In toluene (N2), 2 drops of catalyst were added to soln. of Zr complex in toluene, stirred at room temp. for 10 min, treated with excess SiHMe2Cl dropwise,stirred for 6 h; filtered, evapd.(vac.), elem. anal.;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

permethyldecasiloxane-1,19-diol

permethyldecasiloxane-1,19-diol

C24H74O11Si12
50632-55-8

C24H74O11Si12

Conditions
ConditionsYield
With pyridine In toluene at 90℃; for 18h;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

Ethyl 3,4,6-tri-O-benzyl-1-thio-α-D-mannopyranoside
129750-23-8

Ethyl 3,4,6-tri-O-benzyl-1-thio-α-D-mannopyranoside

ethyl 2-O-dimethylsilane-3,4,6-tri-O-benzyl-1-thio-α-D-mannopyranoside
1180492-12-9

ethyl 2-O-dimethylsilane-3,4,6-tri-O-benzyl-1-thio-α-D-mannopyranoside

Conditions
ConditionsYield
With triethylamine In dichloromethane at 0℃; Inert atmosphere;100%
With triethylamine
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

ethyl 3,4,6-tri-O-benzyl-1-thio-β-D-glucopyranoside
180187-58-0

ethyl 3,4,6-tri-O-benzyl-1-thio-β-D-glucopyranoside

ethyl 2-O-dimethylsilane-3,4,6-tri-O-benzyl-1-thio-β-D-glucopyranoside
1180492-09-4

ethyl 2-O-dimethylsilane-3,4,6-tri-O-benzyl-1-thio-β-D-glucopyranoside

Conditions
ConditionsYield
With triethylamine In dichloromethane at 0℃; Inert atmosphere;100%
With triethylamine
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

1-Bromonaphthalene
90-11-9

1-Bromonaphthalene

dimethyl(naphthalen-1-yl)silane
38274-80-5

dimethyl(naphthalen-1-yl)silane

Conditions
ConditionsYield
Stage #1: 1-Bromonaphthalene With diisobutylaluminium hydride; magnesium; lithium chloride In tetrahydrofuran; hexane at 20℃; for 3h; Schlenk technique; Inert atmosphere;
Stage #2: dimethylmonochlorosilane In tetrahydrofuran; hexane at 20℃; Schlenk technique; Inert atmosphere;
100%
With n-butyllithium In tetrahydrofuran; hexane at -78 - 20℃; for 1h; Inert atmosphere;96.7%
Stage #1: 1-Bromonaphthalene With n-butyllithium In tetrahydrofuran; hexane at -78℃; for 0.333333h; Inert atmosphere;
Stage #2: dimethylmonochlorosilane In tetrahydrofuran; hexane at -78 - 20℃; for 0.5h; Inert atmosphere;
91%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C74H122O6
1379460-61-3

C74H122O6

C76H129ClO6Si
1379460-55-5

C76H129ClO6Si

Conditions
ConditionsYield
With dihydrogen hexachloroplatinate In dichloromethane for 18h; Reflux;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C79H132O6
1379460-62-4

C79H132O6

2-(ω-(chlorodimethylsilyl)-undecyl)-3,6,7,10,11-penta-decyloxytriphenylene
1379460-56-6

2-(ω-(chlorodimethylsilyl)-undecyl)-3,6,7,10,11-penta-decyloxytriphenylene

Conditions
ConditionsYield
With dihydrogen hexachloroplatinate In dichloromethane for 18h; Reflux;100%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

C84H142O6
1379460-63-5

C84H142O6

C86H149ClO6Si
1379460-57-7

C86H149ClO6Si

Conditions
ConditionsYield
With dihydrogen hexachloroplatinate In dichloromethane for 18h; Reflux;100%

1066-35-9Related news

The rotational spectrum of Chlorodimethylsilane (cas 1066-35-9) using Fourier transform microwave spectroscopy07/24/2019

The microwave spectra of five isotopic species of chlorodimethylsilane have been investigated in the region from 5 to 20 GHz using a Fourier transform microwave spectrometer. The molecular structure of (CH3)2SiHCl obtained by the substitution method is the following one: rs(Si–Cl)=2.0604(10)Å,...detailed

1066-35-9Relevant articles and documents

Dual Role of Doubly Reduced Arylboranes as Dihydrogen- and Hydride-Transfer Catalysts

Von Grotthuss, Esther,Prey, Sven E.,Bolte, Michael,Lerner, Hans-Wolfram,Wagner, Matthias

, (2019)

Doubly reduced 9,10-dihydro-9,10-diboraanthracenes (DBAs) are introduced as catalysts for hydrogenation as well as hydride-transfer reactions. The required alkali metal salts M2[DBA] are readily accessible from the respective neutral DBAs and Li metal, Na metal, or KC8. In the first step, the ambiphilic M2[DBA] activate H2 in a concerted, metal-like fashion. The rates of H2 activation strongly depend on the B-bonded substituents and the counter cations. Smaller substituents (e.g., H, Me) are superior to bulkier groups (e.g., Et, pTol), and a Mes substituent is even prohibitively large. Li+ ions, which form persistent contact ion pairs with [DBA]2-, slow the H2-addition rate to a higher extent than more weakly coordinating Na+/K+ ions. For the hydrogenation of unsaturated compounds, we identified Li2[4] (Me substituents at boron) as the best performing catalyst; its substrate scope encompasses Ph(H)CNtBu, Ph2CCH2, and anthracene. The conversion of E-Cl to E-H bonds (E = C, Si, Ge, P) was best achieved by using Na2[4]. The latter protocol provides facile access also to Me2Si(H)Cl, a most important silicone building block. Whereas the H2-transfer reaction regenerates the dianion [4]2- and is thus immediately catalytic, the H--transfer process releases the neutral 4, which has to be recharged by Na metal before it can enter the cycle again. To avoid Wurtz-type coupling of the substrate, the reduction of 4 must be performed in the absence of the element halide, which demands an alternating process management (similar to the industrial anthraquinone process).

Kinetics of Insertion Reactions of Dimethylsilylene

Davidson, Iain M. T.,Lawrence, F. Timothy,Ostah, Naaman A.

, p. 859 - 860 (1980)

Dimethylsilylene, generated by photolysis of dodecamethylcyclohexasilane, inserts into the silicon-hydrogen bond in trimethylsilane and pentamethyldisilane with approximately zero activation energy, while insertion into hydrogen chloride requires an activation energy of 28 kJ mol-1; the results for silicon-hydrogen insertion shed some light on the mechanism of the thermolysis of pentamethyldisilane.

-

Suryanarayanan,B. et al.

, p. 65 - 71 (1973)

-

-

Simon, Gerard,Lefort, Marcel,Birot, Marc,Dunogues, Jacques,Duffaut, Norbert,Calas, Raymond

, p. 279 - 286 (1981)

Partial reduction of MeSiCl3 and Me2SiCl2 using CaH2 or (TiH2)n at high temperature (300°C) leads to MeSiHCl2 and Me2SiHCl, respectively, in good yields but in low proportion. In the presence of AlCl3 as catalyst the reaction affords Me2SiCl2 and Me3SiCl, in yields higher than those previously observed in the absence of a reducing agent. These redistribution reactions involve MeSiHCl2 and Me2SiHCl as intermediates. Consequently Me2SiHCl with or without Me2SiCl2 and Alcl3 deposited on carbon black as catalyst can undergo disproportionation to give Me3SiCl.

-

Kriegsmann,Engelhardt

, p. 100,108 (1961)

-

GAS-PHASE PHOTOCHEMICAL REACTIONS OF DODECAMETHYLCYCLOHEXASILANE WITH SILICON COMPOUNDS. KINETICS OF SOME INSERTION REACTIONS OF DIMETHYLSILYLENE

Davidson, Iain M.T.,Ostah, Naaman A.

, p. 149 - 158 (1981)

Attempts to measure the kinetics of gas-phase insertion reactions of dimethylsilylene, generated by photolysis of dodecamethylcyclohexasilane, are described.Insertion of dimethylsilylene into silicon-hydrogen bonds was the main reaction with trimethylsilane, pentamethyldisilane, and sym-tetramethyldisilane; in all cases the activation energy for insertion was zero, and the rate constants were in the ratio of 1:3.1:4.3.Dimethylsilylene also inserted cleanly into hydrogen chloride with an activation energy of 28 kJ mol-1.Photochemical reactions with methylchlorosilanes were much more complex, involving little or no silylene chemistry; such reactions as did occur appeared to proceed almost entirely by radical mechanisms.

Chlorine Abstraction from Silicon-Chlorine Bonds by Trimethylsilyl Radicals

Davidson, Iain M. T.,Matthews, J. Ioan

, p. 2277 - 2280 (1981)

Attempts to measure the kinetics of the unusual abstraction reaction, Me3Si. + Me2SiCl2 -> Me3SiCl + Me2Si.Cl using thermal radical sources were unsuccessful.Kinetic data were obtained by using a photochemical radical source, yielding unconvetional Arrhenius parameters, the significance of which is discussed.

Synthesis of Functional Monosilanes by Disilane Cleavage with Phosphonium Chlorides

Santowski, Tobias,Sturm, Alexander G.,Lewis, Kenrick M.,Felder, Thorsten,Holthausen, Max C.,Auner, Norbert

, p. 3809 - 3815 (2019)

The Müller–Rochow direct process (DP) for the large-scale production of methylchlorosilanes MenSiCl4?n (n=1–3) generates a disilane residue (MenSi2Cl6?n, n=1–6, DPR) in thousands of tons annually. This report is on methylchlorodisilane cleavage reactions with use of phosphonium chlorides as the cleavage catalysts and reaction partners to preferably obtain bifunctional monosilanes MexSiHyClz (x=2, y=z=1; x,y=1, z=2; x=z=1, y=2). Product formation is controlled by the reaction temperature, the amount of phosphonium chloride employed, the choice of substituents at the phosphorus atom, and optionally by the presence of hydrogen chloride, dissolved in ethers, in the reaction mixture. Replacement of chloro by hydrido substituents at the disilane backbone strongly increases the overall efficiency of disilane cleavage, which allows nearly quantitative silane monomer formation under comparably moderate conditions. This efficient workup of the DPR thus not only increases the economic value of the DP, but also minimizes environmental pollution.

-

Moedritzer,van Wazer

, p. 69,70, 74 (1968)

-

PROCESS FOR THE PRODUCTION OF ORGANOHYDRIDOCHLOROSILANES

-

Page/Page column 28; 29; 32; 33; 34; 41, (2019/04/16)

The invention relates to a process for the manufacture of organomonosilanes, in particular, bearing both hydrogen and chlorine substituents at the silicon atom by subjecting a silane substrate comprising one or more organomonosilanes, with the proviso that at least one of these silanes has at least one chlorine substituent at the silicon atom, to the reaction with one or more metal hydrides selected from the group of an alkali metal hydride and an alkaline earth metal hydride in the presence of one or more compounds (C) acting as a redistribution catalyst.

INTEGRATED PROCESS FOR THE MANUFACTURE OF METHYLCHLOROHYDRIDOMONOSILANES

-

Page/Page column 35; 36; 37; 38; 39, (2019/04/16)

The present invention relates to an integrated process for the manufacture of methylchlorohydridomonosilanes in particular, from products of the Müller-Rochow Direct Process.

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