25255-90-7

Basic information

• Product Name: TETRAMETHYLAMMONIUM BENZOATE
• Synonyms: TETRAMETHYLAMMONIUM BENZOATE;TETRAMETHYLAMMONIUM BENZOATE, ELECTRO-CH EMICAL GRADE
• CAS NO: 25255-90-7
• Molecular Formula: C₄H₁₂N*C₇H₅O₂
• Molecular Weight: 195.26
• Mol File: 25255-90-7.mol
• Article Data: 6

Chemical Properties

• Melting Point: 188-192 °C (dec.)
• Appearance: /
• Solubility: H2O: soluble0.1g/mL, clear, colorless
• CAS DataBase Reference: TETRAMETHYLAMMONIUM BENZOATE(CAS DataBase Reference)
• NIST Chemistry Reference: TETRAMETHYLAMMONIUM BENZOATE(25255-90-7)
• EPA Substance Registry System: TETRAMETHYLAMMONIUM BENZOATE(25255-90-7)

Safety Data

• Hazard Codes: Xi
• Statements: 36/37/38
• Safety Statements: 26-36
• Hazardous Substances Data: 25255-90-7(Hazardous Substances Data)

Upstream product

• 75-59-2 tetramethyl ammoniumhydroxide 
• 65-85-0 benzoic acid 
• 93-58-3 benzoic acid methyl ester 
• 75-50-3 trimethylamine 
• 51-92-3 tetramethylammonium 

Downstream Products

• 93-58-3 benzoic acid methyl ester 
• 75-50-3 trimethylamine 
• 164412-12-8 tetramethylammonium bis(benzoato)(octaethylporphyrinato)ruthenate(III) 
• 21185-22-8 bis-benzoyloxy-(4-methoxy-phenyl)-methane 

Relevant articles and documents

Benzoate Cyclometalation Enables Oxidative Addition of Haloarenes at a Ru(II) Center

The first Ru(II)-catalyzed arylation of substrates without a directing group was recently developed. Remarkably, this process only worked in the presence of a benzoate additive, found to be crucial for the oxidative addition step at Ru(II). However, the exact mode of action of the benzoate was unknown. Herein, we disclose a mechanistic study that elucidates the key role of the benzoate salt in the C-H arylation of fluoroarenes with aryl halides. Through a combination of rationally designed stoichiometric experiments and DFT studies, we demonstrate that the aryl-Ru(II) species arising from initial C-H activation of the fluoroarene undergoes cyclometalation with the benzoate to generate an anionic Ru(II) intermediate. The enhanced lability of this intermediate, coupled with the electron-rich anionic Ru(II) metal center renders the oxidative addition of the aryl halide accessible. The role of an additional (NMe4)OC(CF3)3 additive in facilitating the overall arylation process is also shown to be linked to a shift in the C-H pre-equilibrium associated with benzoate cyclometalation.

Backscattering Interferometry: An alternative approach for the study of hydrogen bonding interactions in organic solvents

Intermolecular interactions involving hydrogen bonds are responsible for catalysis and recognition. Traditional methods used to study hydrogen-bonding interactions are generally limited to relatively large volumes and high substrate concentrations. Backscattering Interferometry (BSI) provides a microfluidic platform to study these interactions in nonaqueous media at micromolar to nanomolar concentrations in picoliter volumes by monitoring changes in the refractive index.

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.