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Difluoroamino is a chemical group consisting of an amino group (-NH2) with two fluorine atoms replacing the hydrogen atoms, resulting in the difluoroamino group (-NF2). This group is known for its unique electronic properties, as the fluorine atoms are highly electronegative, which can significantly influence the reactivity and stability of molecules containing it. Difluoroamino compounds are of interest in various fields, including pharmaceuticals, agrochemicals, and materials science, due to their potential to alter the physical and chemical properties of molecules. They can be used to modify the lipophilicity, metabolic stability, and binding affinity of drug candidates, making them valuable in the design of new therapeutic agents.

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  • 3744-07-8 Structure
  • Basic information

    1. Product Name: difluoroamino
    2. Synonyms: Difluoroamino radical
    3. CAS NO:3744-07-8
    4. Molecular Formula: F2N
    5. Molecular Weight: 52.0035
    6. EINECS: N/A
    7. Product Categories: N/A
    8. Mol File: 3744-07-8.mol
  • Chemical Properties

    1. Melting Point: N/A
    2. Boiling Point: N/A
    3. Flash Point: N/A
    4. Appearance: N/A
    5. Density: N/A
    6. Refractive Index: N/A
    7. Storage Temp.: N/A
    8. Solubility: N/A
    9. CAS DataBase Reference: difluoroamino(CAS DataBase Reference)
    10. NIST Chemistry Reference: difluoroamino(3744-07-8)
    11. EPA Substance Registry System: difluoroamino(3744-07-8)
  • Safety Data

    1. Hazard Codes: N/A
    2. Statements: N/A
    3. Safety Statements: N/A
    4. WGK Germany:
    5. RTECS:
    6. HazardClass: N/A
    7. PackingGroup: N/A
    8. Hazardous Substances Data: 3744-07-8(Hazardous Substances Data)

3744-07-8 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 3744-07-8 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 3,7,4 and 4 respectively; the second part has 2 digits, 0 and 7 respectively.
Calculate Digit Verification of CAS Registry Number 3744-07:
(6*3)+(5*7)+(4*4)+(3*4)+(2*0)+(1*7)=88
88 % 10 = 8
So 3744-07-8 is a valid CAS Registry Number.

3744-07-8SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 17, 2017

Revision Date: Aug 17, 2017

1.Identification

1.1 GHS Product identifier

Product name Difluoroamidogen

1.2 Other means of identification

Product number -
Other names nitrogen difluoride

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:3744-07-8 SDS

3744-07-8Relevant articles and documents

Simple N≡UF3 and P≡UF3 molecules with triple bonds to uranium

Andrews, Lester,Wang, Xuefeng,Lindh, Roland,Roos, Bjoern O.,Marsden, Colin J.

, p. 5366 - 5370 (2009/03/12)

UN-beatable? Laser-ablated uranium atoms activate NF3 and PF3 to form the N≡UF3 and P≡UF3 molecules containing novel terminal nitride and phosphide functional groups. These molecules are identified from matrix infrared spectra and theoretical methods. The N≡UF3 molecule contains the strongest triple bond to uranium in a ternary compound.

Modification of an NF3 film by sub-excitation electrons

Tegeder, Petra,Illenberger, Eugen

, p. 401 - 406 (2008/10/08)

By applying the IRAS technique (infrared-absorption-reflection spectroscopy) and electron stimulated desorption (ESD) of negative ions we demonstrate that a 10 monolayer (ML) film of NF3 is degraded in the course of low-energy electron irradiation in the range 0-5 eV which is far below the electronic excitation of NF3. Degradation is accompanied by the desorption of F- fragment ions from the film and formation of NF2 radicals and N2F4 molecules in the film. The energy dependence of the degradation cross-section follows that for resonant (dissociative) electron attachment in the low-energy region (≈0-5eV) and increases above 6 eV. We therefore identify (dissociative) electron capture at low energy as the only initial reaction responsible for the chemical changes in the NF3 film.

Electron affinities and gas-phase acidities of organogermanium and organotin compounds

Brinkman, Elizabeth A.,Salomon, Karen,Tumas, William,Brauman, John I.

, p. 4905 - 4910 (2007/10/02)

The electron affinities have been measured for trimethylgermanium and trimethyltin radicals as 31.9 ± 0.7 and 39.2 ± 1.5 kcal/mol, respectively, using electron photodetachment spectroscopy. The acidities (ΔH°acid) for the corresponding hydrides

Fluoride Affinities of Perfluorobenzenes C6F5X. Meisenheimer Complexes in the Gas Phase and Solution

Dillow, Glen W.,Kebarle, Paul

, p. 4877 - 4882 (2007/10/02)

Measurements of gas phase fluoride transfer equilibria lead to ΔGo and ΔHo for the reaction F- + C6F5X = where the substituents X of the perfluorobenzenes are F, H, CF3, COCH3, CN, and NO2.The relative energy changes are found to lead to an approximately linear correlation with the electron affinities of C6F5X.The gas-phase ΔGo and ΔHo data are used in combination with rate measurements in solution from the literature for a comparison of the reaction coordinates in the gas phase and solution and for determinations of the solvation energy of the transition state occuring in solution.

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