N. Miyaura
Bull. Chem. Soc. Jpn. Vol. 81, No. 12 (2008) 1543
M'+
3. C–C and C–N Bond-Forming Reactions
[M]-R
+ [B(OH)4]M'
+ M'X
OH
-
[M]-X
OH-
M'OH
OH
R B
OH
3.1 Transmetalation to Transition-Metal Complexes.
Transmetalation between organometallic reagents and transi-
tion-metal complexes is a fundamental process involved in
metal-catalyzed bond-forming reactions. It is the first step in
metal-catalyzed 1,4-addition of organic electrophiles to ꢀ,ꢁ-
unsaturated carbonyl compounds9 and the second step in palla-
dium- or nickel-catalyzed cross-coupling reactions of organo-
boron compounds with nucleophiles.6 Main group nonmetallic
compounds such as boron and silicon compounds are attractive
for use in organic syntheses due to their high degrees of ther-
mal stability and air stability for isolation or handling and due
to their compatibility with a wide range of functional groups,
but transmetalation is very slow due to low nucleophilicity
of the nonmetal organoelement compounds. However, they
transfer the organic groups to transition-metal complexes by
one of the following three processes (eqs 21, 22, and 23).6,74
The addition of a base such as alkoxy, hydroxy, or fluoride
anion exerts a remarkable accelerating effect on the cross-
coupling reactions of organoboron and -silicon compounds
(eq 21).6h,75,76 Thereby, the coordination of a negatively charg-
ed base enhances the nucleophilicity of the organic group so
that ligand exchange between [M]–X (X ¼ halogen) and an
organometallic reagent proceeds via a four-centered ꢃ-bond
metathesis (94).
R B OH
OH
95
stability constants for OH- (log K at 25 °C)
Li+
0.36
Na+
-0.2
K+
Cs+
-
-0.5
stability constants for X- (log K at 25 °C)
K+
Cs+ Ba2+ Bu4N+ Tl+ Cu+ Ag+
Cl-
Br-
I-
-0.7 -0.39 -0.13 0.40 0.49 2.7 3.3
-
0.03
-
-
0.49 0.91 5.9 4.7
0.78 8.9 6.6
-0.19 -0.03
-
Scheme 13.
proceed under neutral conditions for organic electrophiles, di-
rectly yielding RO–Pd complexes via oxidative addition. Re-
actions of boron or silicon compounds with allylic acetates,78
allylic carbonates,79 1,3-butadiene monoxide,80 propargyl car-
bonates,81 acetic anhydrides,82 and phenyl trifluoroacetate83
have been carried out in the absence of a base.
OH
H
O
-
R'
R B OH
RB(OH)2
-
B
O
OH
OH
OH
OH
ð21Þ
[M]−R
+ B(OH)4
+ X-
[M] X
X
[M]
ð22Þ
[M]−R
+ R'OB(OH)2
[M] OR'
[M]
B
-
R
94
OH
R
96
[M]=Pd(II), Ni(II), Rh(I); X=halogen
[M]=Pd(II), Rh(I), Re(I); R'=H, Me, COMe
The effects of bases and counter cations on such a base-as-
sisted transmetalation can be roughly estimated by the basic
strength, affinity of counter cations for halide ions (stability
constant)77 and solubility of M0X (Scheme 13). The transmeta-
lation is a reversible process that involves nucleophilic dis-
placement of [M]–X (M ¼ PdII and NiII) with [RB(OH)3]M0
95 to yield [M]–R, B(OH)3, and M0X. The concentration of
hydroxyborate anion 95, which exists in an alkaline solution
in equilibrium with a free organoboronic acid, increases by
Although the transmetalation shown in eq 22 takes place
under neutral conditions, there is a strong accelerating effect
of bases (Scheme 14).84 For example, addition of KOH to a
mixture of p-tolylboronic acid, 2-cyclohexenone, and a rhodi-
um complex in aqueous DME at 5 ꢀC exerts a remarkable ac-
celerating effect. The RhOH complex, that is believed to be an
active species for transmetalation ( ), is a better catalyst than
the RhCl complex ( ), but addition of aqueous KOH results in
completion of both reactions within 1 h ( and ). Thus, quar-
ternization of arylboronic acids with a base greatly facilitates
transmetalation to both RhCl and RhOH complexes.
increasing the basic strength (OHꢁ > MPO4 > MCO3
>
ꢁ
ꢁ
HCO3ꢁ). For each series of bases, cesium may yield a higher
concentration of 95 than do the corresponding smaller alkali
metals because the stability constant of OHꢁ becomes smaller
The third process is transmetalation to cationic metal com-
plexes (eq 23). Cross-coupling reactions of organoboron and
as we move down the periodic table (Csþ < Kþ < Naþ
Liþ). Transmetalation can be fast for counter cations (M0þ
that have a high stability constant for halide ions (Agþ
<
)
>
85
silicon compounds with Ph2IBF4 or ArN2BF4,86 which af-
fords an Ar–[Pd]þ intermediate via oxidative addition, have
been carried out in the absence of a base because transmetala-
tion takes place smoothly under neutral conditions.
Tlþ > R4Nþ > Ba2þ > Csþ > Kþ). Precipitation of insoluble
AgX, TlX, and BaX2 is also a strong driving force of transme-
talation.
The second process is transmetalation to [M]–OR0 (M ¼ Pd,
Rh, and Re; R0O ¼ OAc, OMe, and OH) complexes (eq 22).
Due to the high oxophilicity of boron and silicon compounds
and high basicity of [M]–OR0 complexes, transmetalation
takes place without any assistance of a base for these Pd,
Rh, and Re complexes. Thus, cross-coupling reactions often
H
H
B
+
O
R
RB(OH)2
H2O
OH
OH
[M]+
[M]−R
+ B(OH)3
ð23Þ
[M]
97
[M]+=Pd2+, RPd+, Pt2+ , Rh+