
Journal of Organic Chemistry p. 5480 - 5486 (1995)
Update date:2022-07-31
Topics:
Guo, Yushen
Jenks, William S.
The photochemistry of aryl benzyl sulfoxides is described.The initial event is homolytic cleavage to form a singlet sulfinyl/benzyl radical pair.The radical pair partitions between reversion to starting material with at least partial racemization and closure to form a sulfenic ester.With acetone sensitization, the primary radical pair also undergoes quite significant escape, leading to formation of diphenylethane and aryl arenethiosulfonates.Secondary photolysis of the sulfenic ester leads exclusively to S-O homolysis, yielding the radical pair from which isolated products are derived.Quantum yields and other mechanistic observations are discussed.
View MoreLiaoyang hengye Chemical Co., Ltd.
Contact:86-419-5850866
Address:North Old Xiaoxiao Road,Yantai District, Dengta, Liaoyang, Liaoning, China
website:http://www.shochem.com
Contact:021-50800795
Address:No.1043, Halei Rd, Zhangjiang Hi-Tech Park, Shanghai, Postcode 201203, China
website:http://www.lonwinchem.com
Contact:Tel: 86-21-59858395
Address:No#966,Huaxu Road,Shanghai 201702,P.R.China
Contact:+86-710-3516804
Address:Number 83,Panggong road,Xiangcheng District,Xiangyang ,Hubei
Meryer (Shanghai) Chemical Technology Co., Ltd.
website:http://www.meryer.com/cn/index/
Contact:+86-755-86170518
Address:Minhang,Shanghai, China
Doi:10.1021/om8003493
(2008)Doi:10.1016/0022-328X(85)80309-0
(1985)Doi:10.1016/S0020-1693(00)84620-4
(1986)Doi:10.1021/acs.jnatprod.6b01006
(2017)Doi:10.1021/ja802993m
(2008)Doi:10.1039/b805328f
(2008)