
Journal of Organic Chemistry p. 5480 - 5486 (1995)
Update date:2022-07-31
Topics:
Guo, Yushen
Jenks, William S.
The photochemistry of aryl benzyl sulfoxides is described.The initial event is homolytic cleavage to form a singlet sulfinyl/benzyl radical pair.The radical pair partitions between reversion to starting material with at least partial racemization and closure to form a sulfenic ester.With acetone sensitization, the primary radical pair also undergoes quite significant escape, leading to formation of diphenylethane and aryl arenethiosulfonates.Secondary photolysis of the sulfenic ester leads exclusively to S-O homolysis, yielding the radical pair from which isolated products are derived.Quantum yields and other mechanistic observations are discussed.
View MoreYicheng Goto Pharmaceuticals Co.,Ltd.
Contact:+86 710 3423122
Address:5th Floor,East Gate of Building #2,Servo-Industrial Park,1st Qilin Road,Xiangyang,Hubei,China
Taixing Joxin Bio-tec Co.,Ltd.
website:http://www.joxbio.com
Contact:86-523-87558858 87612088
Address:No.88, chengdong industrial park
Contact:+49-9398-993127
Address:Untertorstr. 27
website:http://www.apeptides.com/en/
Contact:+86-21-60871011
Address:No. 80 Chuanshan Shuyuan Steet,Pudong,Shanghai
Tianjin Jiuri New Materials Co., Ltd.
Contact:+86-22-58889220
Address:C-5/6, Vison Hill, No.1 Gonghua Road, Huayuan Hi-tech Park, Tianjin, China.
Doi:10.1021/om8003493
(2008)Doi:10.1016/0022-328X(85)80309-0
(1985)Doi:10.1016/S0020-1693(00)84620-4
(1986)Doi:10.1021/acs.jnatprod.6b01006
(2017)Doi:10.1021/ja802993m
(2008)Doi:10.1039/b805328f
(2008)