Lu-Wen Zhang, L. Wang, N. Ji et al.
Tetrahedron Letters 68 (2021) 152941
enantiomeric excess of 2a gradually increased (Table 1, entries
11–14). 3a with an enantiomeric excess of 65% was obtained
when 0.2 equivalent of TBHP was used (Table 1, entry 14).
Therefore, we adopted the method of adding oxidant in batches
to reduce the reaction rate to obtain high conversion and
enantioselectivity (Table 2, entry 15). Temperature was also very
important for the chiral induction process (Table 1, entries 16–
18). By reducing the reaction temperature to À20 °C, 3a can be
obtained with a yield of 75% and an enantioselectivity of 94%
(Table 1, entry 17).
With the optimal reaction conditions in hand, we investigated
the range of
a,b-unsaturated ketones. When the 4-position sub-
stituents of phenyl were electron-withdrawing groups of F, Cl, Br,
I, NO2, 3b-3f were obtained in moderated yields (58–90%) and high
enantiomeric excesses (84–96%). Specifically, when the substituent
was CF3, 2g was transformed to 3g with a 40% yield and a 44%
enantiomeric excess. Substrates with electron-donating sub-
stituents at the 4-position of phenyl, including Me and tBu to
achieve good performance asymmetric epoxidation with 83–89%
enantiomeric excesses (3h-3i). 3j was synthesized with high con-
version rate, but the enantiomeric excess was only 42%. The above
results demonstrated that the 4-position substituted substrates
with electron donating or withdrawing group both can efficiently
realize the asymmetric epoxidation reaction, except individual
groups, such as CF3 and OMe. Subsequently, we considered the
3-position substitution chalcones. Unexpectedly, the 3-OMe sub-
stituted substrate 2n got the product 3n with an 81% enantiomeric
excess, while the 3-Cl substituted substrate 2k only got 66% enan-
tiomeric excess, and these results were inconsistent with the prod-
ucts of 4-position substituent. 2l and 2m could give the products
with 83% and 80% enantiomeric excesses. Above this, substrates
with substituted groups at the 3-position have a certain weakening
effect on the asymmetric epoxidation transformation. In contrast,
modification of the 2-position on the phenyl group greatly affected
the asymmetric transformation. When Cl and Br were used to mod-
ify the 2-position of the phenyl group, the products 3o and 3p with
Fig. 1. Quinine and its derivatives are used to synthesize a,b-epoxy ketones.
influence on the asymmetric epoxidation reaction (Table 1, entries
1–7). When the reaction was proceeded in DMF, ether, ethanol, and
THF, 2a was transformed to 3a with the opposite configuration
(Table 1, entries 1–4). In comparison, xylene and acetone showed
high conversion activities but low enantioselectivities (Table 1,
entries 5–6). Toluene can be used as the best solvent to gain 3a
with high yield and moderate enantiomeric excess (Table 1, entry
7). Later, we adjusted the amount of KOH with toluene as the sol-
vent (Table 1, entries 8–10). Surprisingly, we chose 0.2 equivalents
of KOH as the matching additive, and found that the enantioselec-
tivity of 3a was slightly improved, while the reaction yield had a
bit reduction (Table 1, entry 9). However, when less than 0.2 equiv-
alents of KOH was used, the reaction yield and enantioselectivity
were reduced (Table 1, entry 10).
In this transformation, the amount of oxidant [4a,5a,8–10,15]
and the method of addition were very critical. Initially, we made
detailed adjustments to the amount of oxidant. When 1.7, 1.2,
0.6, and 0.2 equivalents of TBHP were used, the yields of 2a were
greatly reduced as the amount of TBHP decreased, but the
(aR, bS) configuration were obtained. However, the products 3q
and 3r were generated with electron-donating Me and OMe have
Table 1
Reaction Optimization.
Entrya
Additive (X eq.)
Oxidant (Y eq.)
Solvent
Tem.(°C)
Yield(%)b
ee. (%)c
1
2
3
4
5
6
7
8
KOH (5)
KOH (5)
KOH (5)
KOH (5)
KOH (5)
KOH (5)
KOH (5)
KOH (1)
KOH (0.2)
KOH (0.1)
KOH (0.2)
KOH (0.2)
KOH (0.2)
KOH (0.2)
KOH (0.2)
KOH (0.2)
KOH (0.2)
KOH (0.2)
TBHP (1.2)
TBHP (1.2)
TBHP (1.2)
TBHP (1.2)
TBHP (1.2)
TBHP (1.2)
TBHP (1.2)
TBHP (1.2)
TBHP (1.2)
TBHP (1.2)
TBHP (1.7)
TBHP (1.2)
TBHP (0.6)
TBHP (0.2)
TBHP (1.2)d
TBHP (1.2)
TBHP (1.2)
TBHP (1.2)
DMF
Et2O
EtOH
THF
r.t.
r.t.
r.t.
r.t.
r.t.
r.t.
r.t.
r.t.
r.t.
r.t.
r.t.
r.t.
r.t.
r.t
30
40
35
65
70
60
85
80
80
67
86
80
50
20
80
78
75
50
À51
À32
À7
À20
24
34
49
49
52
43
39
52
56
65
69
75
94
xylene
acetone
toluene
toluene
toluene
toluene
toluene
toluene
toluene
toluene
toluene
toluene
toluene
toluene
9
10
11
12
13
14
15
16
17
18
r.t.
0
À20
À45
92
a
c
General conditions: 2 (0.1- mmol), 1e (10-mol%), KOH (0.2 equiv.), TBHP (1.2 equiv.), toluene (2 mL), À20- °C), 5–72 h. bIsolated yield.
Enantiomeric excess was determined by chiral HPLC analysis using Chiralpak OD-H column, and absolute configuration was established by comparing with the literature
data [4a]
d
Adding TBHP in portions, 0.02 mmol each time.
2