Angewandte
Chemie
Triflic acid itself is not an oxidant, but in the presence of an
oxidizing agent, or in the presence of UV radiation and
oxygen, the radical cations of dibenzo-p-dioxins have been
observed.[34] In this case and in several other examples, in the
absence of oxygen the radical cation still persists.[33] The
level as the unprotonated device at Vg = 0 V in Figure 2B. As
a positive gate bias is applied, the holes are depleted and the
device can be converted into the off state. The mobility, on/off
ratio, and threshold voltage are 7 ꢀ 10ꢀ4 cm2 Vꢀ1 sꢀ1, 1.5 ꢀ 103,
and 88 V, respectively. Importantly, the device is in the on
state after exposure to trifluoroacetic acid, and the gate
electrode can deplete the carriers in the channel. This is
opposite from the operation of typical organic field-effect
transistors in which carriers are introduced by application of
a gate bias voltage. The reversibility with respect to acid
treatment and removal, which we observed in the optical
behavior of c-OBCB (see above), is observed in the electrical
behavior of these devices. After the acid-treated devices are
placed in a vacuum for a few hours, the device behaves
qualitatively as it did before treatment with acid. The carriers
are now no longer in the channel and the device operates as
a standard OFET where a bias introduces the carriers. There
are some quantitative differences in the absolute current
levels and mobility in the devices. This data is shown in
Figure S4 in the Supporting Information. We were able to
repeat this process four times.
When triflic acid, the stronger acid, is used the device is
also very conductive. Figure 3 shows the performance of
a device after it has been exposed to triflic acid vapor for
5 min. In the case of triflic acid the device is so heavily doped
that it cannot be turned off with a gate bias. The resistance of
the treated film is six orders of magnitude lower than that of
the untreated film (VG = 0 V). We can also reverse this
process by applying a vacuum to the sample.
The origin of the effect of the doping process with acid is
twofold. 1) As is shown in Figure 2A, the layer of protonated
material is on the surface of the film and in an OFET
configuration with the source and drain
mechanism for oxidation in the presence of triflic acid as
+
ꢀ
a Brønsted acid, to form c-OBCB H C is shown by the
following equations:
c-OBCB þ CF3SO3H Ð c-OBCBꢀHþ þ CF3SO3
ð1Þ
ð2Þ
ꢀ
c-OBCBꢀHþ þ c-OBCB Ð c-OBCBꢀH þ c-OBCB
C
þC
To determine how the layer of protonated PAH in the thin
film influences electrical properties, we fabricated OFETs
with c-OBCB 1 and then subjected the devices to acid vapor
(Figure 2A). Before it is exposed to acid, the device exhibits
characteristics of a typical OFET (Figure 2B and C). The
c-OBCB is a p-type, hole-transporting semiconductor. The
mobility, threshold voltage, and on/off ratio for this device are
2.4 ꢀ 10ꢀ3 cm2 Vꢀ1 sꢀ1, ꢀ5.0 V, and 6.7 ꢀ 103, respectively. The
1/2
mobility is calculated by plotting j IDS
j
versus j VG j and
using the equation: IDS = (mWCi/2L)(VGꢀV0)2 with W (elec-
trode width) = 2 mm and L (channel length) = 100 mm; the
source-drain voltage is fixed at ꢀ100 V, in the saturation
regime of the current–voltage curves (Figure 2B).
The electrical characteristics change dramatically when
the OFETs made from c-OBCB are exposed to trifluoroacetic
acid. This change is shown in Figure 2D and Figure 2E. The
transistor can now be operated in depletion or “turn-off”
mode. It is important to note that at zero gate bias the
protonated device already shows essentially the same current
electrodes. The originally formed cation,
+
ꢀ
c-OBCB H , is not the carrier in the
films, as if it were, at minimum, the
movement of protons would be required
for conduction to occur. The carriers
must be the electrons/holes represented
by the radical cations[35] and produced
through charge transfer as described by
equations (1) and (2).[36] The charge
transport is then the thermoneutral
charge transfer between c-OBCB+C and
c-OBCB. As with the cation, the radical
is not the carrier because then the
movement of a hydrogen atom would
be required for conduction to occur. We
see evidence in the EPR spectra (Fig-
ure S3) in films for the formation of c-
OBCB+C upon protonation. 2) Impor-
tantly, the counterion, trifluoroacetate,
will be localized at the top of the film,
thus creating a dipole layer. We do not
Figure 2. A) Schematic of a thin-film field-effect transistor made from c-OBCB 1 after its
exposure to triflic acid. Electrode width W=2 mm and channel length L=100 mm. B) Transistor
output before treatment with acid. VG =0 and ꢀ100 V in ꢀ20 V steps. C) Transfer characteristics
before treatment with acid. VDS =ꢀ100 V. D) Transistor output after treatment with trifluoro-
acetic acid. VG =0 and 100 V in 20 V steps. E) Transfer characteristics after treatment with acid.
anticipate that the counterions will be
able to penetrate the entire film, based
on the UV/Vis data in Figure 1B, thus
creating a dipole field into the channel in
the same way that a gate bias introduces
VDS =ꢀ100 V.
Angew. Chem. Int. Ed. 2013, 52, 1 – 6
ꢀ 2013 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim
3
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