.
Angewandte
Communications
Table 1: Optimization of reaction conditions for trifluoromethylthiola-
bonds has received great interest and impressive progress has
tion of cyclooctane.[a]
3
been made.[12] Various C(sp ) F bond-containing compounds
À
were efficiently and readily produced, typically through
a radical pathway involving the generation and trapping of
alkyl radicals with fluorine-transfer reagents. These important
3
À
advances inspired us to investigate the formation of C(sp )
3
Entry
Oxidant
Solvent
T [8C]
Yield [%][b]
À
SCF3 bonds through radical C(sp ) H activation and func-
tionalization.
1[c]
2
3
4
5
6
7
8
9
10
11
12
13
14
15
16[g]
17
18
19[h]
20[i]
21[j]
K2S2O8
K2S2O8
NaIO4
CH3CN
CH3CN
CH3CN
CH3CN
CH3CN
CH3CN
CH3CN
DMF
60
60
60
60
60
60
60
60
60
60
60
60
60
40
50
50
70
80
60
60
60
82
82
0
<5
0
74
48
trace
8
10
0
0
<5
0
80
0
81
79
0
In order to test our hypothesis, we chose cyclooctane 1 as
the model substrate for the direct trifluoromethylthiolation of
3
À
PhI(OAc)2
Pb(OAc)4
C(sp ) H bonds. As radical initiator we used N-hydroxyph-
thalimide (NHPI), a precursor of the phthalimido-N-oxyl
[d]
K2S2O8
K2S2O8
(PINO) radical and a well-known organocatalyst for the
[e]
3
effective C(sp ) H activation by hydrogen abstraction.[13] For
À
K2S2O8
K2S2O8
K2S2O8
K2S2O8
K2S2O8
K2S2O8
K2S2O8
K2S2O8
K2S2O8
K2S2O8
K2S2O8
K2S2O8
K2S2O8
K2S2O8
[14]
a CF3S-transfer reagent system, we used AgSCF3 as the
DMSO
convenient CF3S resource and K2S2O8 as the oxidant.[5 g]
When a mixture of 1 (1 equiv), NHPI (0.1 equiv), AgSCF3
(1.5 equiv), and K2S2O8 (2 equiv) in CH3CN was stirred at
608C under Ar atmosphere for 12 h, the desired mono-
trifluoromethylthiolated product 2 was formed in 43% yield
along with some poly-trifluoromethylthiolated products,
which were identified by their characteristic signals in
19F NMR spectroscopy and GC-MS mass spectrometry.
Encouraged by this preliminary result, we optimized the
reaction conditions (Table 1). When AgSCF3 was used as the
limiting reagent with 10 equiv of 1 under similar conditions,
the desired mono-trifluoromethylthiolated product 2 was
obtained in 82% yield without the formation of any poly-
trifluoromethylthiolated products (Table 1, entry 1). Later,
we found that only a little excess of substrate (2 equiv) was
required for the selective formation of the mono-trifluoro-
methylthiolated product, thus demonstrating the high effi-
ciency of the reaction (Table 1, entry 2). The oxidant K2S2O8
played an important role in the reaction, as no desired
product was obtained in its absence or in the presence of other
oxidants, such as NaIO4, PhI(OAc)2, Pb(OAc)4 (Table 1,
entries 3–5). A survey of the oxidant-to-substrate ratio
showed that 2 equiv of K2S2O8 gave the best yield (Table 1,
entries 6 and 7). Among several common solvents that we
screened, CH3CN stood out as the best one and water was
harmful for the reaction (Table 1, entries 8–13). A reaction
temperature higher than 508C was required for an effective
transformation, as no obvious conversion of AgSCF3 was
observed at lower temperatures (Table 1, entries 14–18).
Interestingly, when the reaction was conducted at 508C,
a longer reaction time (12 h) was required, as no reaction
occurred within 4 h (Table 1, entry 16). Finally, the presence
of the free silver cation was crucial for the reaction, because
both the replacement of AgSCF3 with CuSCF3 and the
addition of KCl (KCl/AgSCF3 = 1:1) to the reaction mixture
prevented the formation of the desired trifluoromethylthio-
lated product (Table 1, entries 19 and 20). To our surprise, the
reaction proceeded smoothly in the absence of NHPI, which
we originally considered as the key alkyl radical initiator
(Table 1, entry 21). Based on these test reactions, the
combination of AgSCF3, K2S2O8, and CH3CN at 608C was
established as the optimal conditions for the simple, mild, and
acetone
ClCH2CH2Cl
MeOH
CH3CN/H2O[f]
CH3CN
CH3CN
CH3CN
CH3CN
CH3CN
CH3CN
CH3CN
CH3CN
0
82
[a] Reaction conditions: cyclooctane (2.0 equiv), AgSCF3 (0.2 mmol,
1.0 equiv), oxidant (2.0 equiv) and NHPI (0.1 equiv) in solvent (2 mL)
under Ar atmosphere for 12 h. [b] Yields were determined by 19F NMR
spectroscopy with trifluorotoluene as an internal standard. [c] Cyclo-
octane (10 equiv) was used. [d] K2S2O8 (3.0 equiv) was used. [e] K2S2O8
(1.0 equiv) was used. [f] The reaction was conducted in CH3CN/H2O
(1:0.1 v/v). [g] Reaction time: 4 h. [h] CuSCF3 (1.0 equiv) was used
instead of AgSCF3. [i] KCl (1.0 equiv) was added to the reaction. [j] No
NHPI was used. The entry in bold marks optimized reaction conditions.
Various unactivated saturated hydrocarbons were then
subjected to the optimized reaction conditions. All examined
substrates were effectively transformed to the desired prod-
ucts in good yields (Scheme 2, 2–13). The reaction also
À
showed good site selectivity with preference for tertiary C H
bonds over secondary ones (11–13). The substrate scope of
the reaction was investigated next. A variety of functional
groups, such as ketones, esters, bromides, chlorides, alcohols,
cyanates, and phthalimides, were well tolerated under the
reaction conditions (14–34). Similarly, the direct C(sp ) H
3
À
trifluoromethylthiolation occurred predominantly at tertiary
À
C H bonds. Cyclopentanone and cyclohexanone were not
suitable substrates for the reaction, as only trace amounts of
the desired products were observed, however, the reaction of
cycloheptanone and cyclooctanone successfully resulted in
the desired products (14–17). Various acyclic ketones under-
went the trifluoromethylthiolation to give the desired prod-
ucts in acceptable yields (18–25). Notably, although the
a position of the carbonyl group is generally the most reactive
site in ketones, a-CF3S products were not the major products
and were commonly formed in negligible yields, which might
efficient direct trifluoromethylthiolation of unactivated
be ascribed to the strong polar effect exerted by the carbonyl
3
3
À
À
C(sp ) H bonds.
group in the C(sp ) H bond cleavage step in this reac-
2
ꢀ 2015 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim
Angew. Chem. Int. Ed. 2015, 54, 1 – 6
These are not the final page numbers!