6646
H. Du, M. K. Boyd / Tetrahedron Letters 42 (2001) 6645–6647
H
COOH
H
CH2OH
Acknowledgements
LiAlH4
THF
O
O
Acknowledgement is made to the donors of the
Petroleum Research Fund, administered by the Ameri-
can Chemical Society, for the support of this research.
1
2
O
X
OCCl
pyridine, CH2Cl2
References
O
O
X
H
CH2OCO
H
CH2OC NHR
1. Organic Photochemistry; Pillai, V. N. R.; Padwa, A.,
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2. Ellis-Davies, G. C. R.; Kaplan, J. H. J. Org. Chem. 1988,
53, 1966–1969.
RNH2
(4a-e)
i, ii, iii
O
O
3a-b
5a-e
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7687–7690.
Scheme 1. 3a: X=H, 3b: X=NO2. 5a–c: i=DMF, 5d: ii=
Na2CO3/THF, 5e: iii=TEA/THF.
Photochemical deprotection was accomplished by irra-
diation of 5a–e in neutral aqueous acetonitrile using
low pressure 300 nm mercury lamps and quartz photol-
ysis tubes in a Rayonet photolysis chamber. Analysis of
the photolysis solution by GC or HPLC showed recov-
ery of the substrate amines. Parallel dark reactions were
conducted for all experiments and demonstrated that
there was no thermal reaction under the photolysis
conditions.
7. Fodor, S. P. A.; Read, J. L.; Pirrung, M. C.; Stryer, L.;
Lu, A. T.; Solas, D. Science 1991, 251, 767–773.
8. Misetic, A.; Boyd, M. K. Tetrahedron Lett. 1998, 39,
1653–1656.
9. Coleman, M. P.; Boyd, M. K. Tetrahedron Lett. 1999, 40,
7911–7915.
10. Pirrung, M. C.; Bradley, J. C. J. Org. Chem. 1995, 60,
1116–1117.
11. Pirrung, M. C.; Lee, Y. R. J. Org. Chem. 1993, 58,
6961–6963.
12. Green, T. W.; Wuts, P. G. M. Protective Groups in
Organic Synthesis, 3rd ed.; Wiley: New York, 1999; pp.
545–547.
13. Holmes, C. P.; Kiangsoontra, B. Pept.: Chem., Struct.
Biol., Proc. Am. Pept. Sup., 13th. 1994, 110.
14. Amit, B.; Zehavi, U.; Patchornik, A. J. Org. Chem. 1974,
39, 192–196.
15. Cameron, J. F.; Willson, C. G.; Frechet, J. M. J. J.
Chem. Soc., Chem. Commun. 1995, 923–924.
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5883–5884.
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3917–3932.
18. Cameron, J. F.; Willson, C. G.; Frechet, J. M. J. J.
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20. The following synthesis is representative for 5a–c: 9-Xan-
thylmethyl phenylcarbonate 3a19 (0.32 mmol, 0.11 g) was
dissolved in 1.5 mL DMF at 50°C. Cyclohexylamine
(0.35 mmol, 0.040 mL) was dissolved in 0.5 mL DMF,
and added to the 9-xanthylmethyl phenylcarbonate solu-
tion. The reaction mixture was stirred overnight at 50°C.
Ethyl ether (10 mL) and water (10 mL) were added to the
reaction mixture. The aqueous layer was washed with
ether (2×10 mL). The combined organic layers were dried
over MgSO4, filtered and the solvent was evaporated in
vacuo to give a white solid. Recrystallization from hex-
ane:ethyl acetate (95:5) gave 0.078 g (72%). Mp 135–
Experiments were conducted in order to determine both
the best possible solvent system and irradiation time to
optimize the deprotection yield. When the solvent sys-
tem was varied from 10:90 to 50:50 water:acetonitrile,
an optimum deprotection yield for amine recovery was
obtained using
a
solvent system of 40:60
water:acetonitrile for substrates 5a–c. A solvent system
of 50:50 water:acetonitrile was used for substrates 5d
and 5e. Higher percentages of water resulted in solubil-
ity problems for some of the substrates. Reaction con-
ditions were also optimized by varying times of
irradiation. Optimum deprotection times varied from
80 to 150 min. Longer irradiation times resulted in
decreased deprotection yields due to secondary pho-
toreactions. The deprotection yields are summarized in
Table 1. Very good to excellent yields were obtained for
5a–c, demonstrating the utility of the 9-phenylxan-
thenyl carbamate moiety as a photolabile protecting
group for primary amines. However, lower yields were
obtained for 5d and 5e. We were unable to obtain
higher yields for the deprotection due to a secondary
photochemical reaction between the amines and xan-
thone, a byproduct of the irradiation. This secondary
reaction was particularly problematic for the selected
amino acid substrates. In addition, both substrates 5d
and 5e contain g-benzylic hydrogens, which may be
abstracted by the carbonate carbonyl resulting in addi-
tional side reactions. Higher yields may be expected
with other amino acid substrates.
In summary, the 9-xanthenylmethyl moiety is a useful
photoremovable protecting group for selected primary
amines.