Porphyrins Bearing Arylphosphonic Acid Tethers
investigate the synthesis of a much wider variety of
charge-storage molecules, particularly porphyrinic mol-
ecules, which bear phosphonic acid terminated linkers.
Porphyrins bearing phosphonic acid tethers have been
synthesized and attached to oxide surfaces for a variety
of other applications including solar energy, oxidative
catalysis, sensing, and recognition of polysaccharides.2-14
The synthetic approaches that have been employed to
prepare porphyrins bearing phosphonic acid/phosphonate
units can be characterized by (1) whether the phospho-
nate unit is introduced into precursors to the porphyrin
or by derivatization of a preexisting porphyrin, (2)
whether statistical or rational routes are employed, (3)
the number and pattern of phosphonate groups at the
perimeter of the porphyrin, (4) the type of phosphonic
acid protecting group employed, (5) the nature of the
central metal, and (6) the method of cleavage of the
phosphonic acid protecting groups.
A4-Porphyrins bearing four arylphosphonic acids have
been prepared by condensation of a dialkoxyphosphoryl-
benzaldehyde with pyrrole followed by deprotection of the
free base porphyrin.2 Alternatively, the free base por-
phyrin can be metalated followed by deprotection.4,5 A4-
Porphyrins bearing four alkylphosphonic acids have been
prepared by derivatization of a reactive halo-substituted
porphyrin.5-7 A3B-Porphyrins bearing a single phospho-
nic acid have been prepared by a mixed-aldehyde con-
densation of a dialkoxyphosphorylbenzaldehyde, benzal-
dehyde, and pyrrole4 or by derivatization of a porphyrin
bearing a single reactive halo group.6,14 trans-A2B2-
Porphyrins bearing two phosphonic acid groups have
been prepared by condensation of a dialkoxyphosphoryl-
benzaldehyde and dipyrromethane.12 Chlorins bearing
two phosphonic acids have been prepared by derivatiza-
tion of a deuterochlorin-dibromide with tris(trimethylsi-
lyl)phosphite.9 In each case, the porphyrinic species were
employed as the free base or as a metal chelate that is
rather robust toward the acidic conditions for cleavage
of the dialkyl phosphonate. The metals include Mn,4,5 Fe,9
Co,9 Ni,9 Pd,6 and Os,7 which are all categorized in the
porphyrin field as class I or class II metals, affording
chelates that are exceptionally resilient toward acids.15
In general, phosphonic acids combine with metals to give
extended, often insoluble, metal phosphonates. A rare
case wherein metalation was performed in the presence
of a free phosphonic acid employed a porphyrin super-
structure containing a hindered phosphonic acid.14
In this paper, we first describe new strategies for the
synthesis of porphyrins bearing phenylphosphonic acid
tethers. This extends our prior work where diverse
porphyrinic compounds bearing alcohol, thiol, or selenol
tethers (in free or protected form) have been prepared
for attachment to metals or silicon.16 We employ the di-
tert-butyl group as a masking group for the phosphonic
acid, with predominant use of strategies wherein the di-
tert-butyl phosphonate is incorporated in precursors of
the porphyrin. In the course of this work, we have also
developed methods for unveiling the free phosphonic acid
that are compatible with zinc (class III) or magnesium
(class IV) chelates of porphyrins. We then describe the
electrochemical characteristics of selected porphyrin-
phosphonic acids tethered to SiO2 dielectric layers on Si
platforms. Collectively, these studies provide the basis
for the rational synthesis of a wide variety of porphyrins,
including porphyrin building blocks and multiporphyrin
arrays, bearing phenylphosphonic acid tethers and dem-
onstrate the robust electrical characteristics of the mol-
ecule-oxide-semiconductor architectures.
Resu lts a n d Discu ssion
1. Ap p r oa ch . A variety of protecting groups have been
used for phosphonic acids, including methyl, ethyl, allyl,
and tert-butyl groups.2-14,17-23 For our application, a key
issue concerns the stability of the metalloporphyrin
toward conditions employed for protecting group removal,
as inadvertent demetalation of the porphyrin would
complicate the synthesis of mixed-metal multiporphyrin
arrays. Accordingly, the ideal masking agent should meet
the following requirements: (1) compatibility with por-
phyrin forming conditions, including acid catalysis and
DDQ oxidation conditions, (2) stability toward a variety
of metalation conditions, (3) compatibility with Pd-
mediated coupling reactions, and (4) ability to undergo
cleavage without demetalation of the metalloporphyrins.
Mild conditions for the cleavage of a dialkyl phospho-
nate to give the phosphonic acid originate with Rabino-
witz, who first used trimethylsilyl chloride (TMS-Cl)
followed by hydrolysis of the resulting bis(trimethylsilyl)
phosphonate.24 Modifications of this approach have led
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