Organometallics, Vol. 25, No. 20, 2006 4707
Scheme 8
Figure 2. Structural data for the five-coordinate osmium complexes
Os(SiR3)Cl(CO)(PPh3)2 (R ) F, Cl, OH, Me). In addition to a
strengthening of the Os-Si bond due to ionic contributions,
calculations reveal the importance of increasing π-bonding in the
order SiMe3 < Si(OH)3 < SiCl3 < SiF3.
d orbitals with a suitable linear combination of either Si-F or
Si-Cl σ* orbitals. In Os(SiF3)Cl(CO)(PPh3)2 the SiF3 ligand
was estimated to have almost half the π-acceptor ability of the
CO ligand in the same molecule. In a related observation, a
photoelectron spectral study established that the SiCl3 ligand
in CpFe(SiCl3)(CO)2 is an effective π-acceptor ligand.28 The
ν(CO) values for Os(SiR3)Cl(CO)(PPh3)2 (R ) F, Cl, OH, Me)
measured in the IR spectra and presented in Figure 2 are
consistent with this picture of the bonding.
C. Reactions at Osmium. The silyl ligand, once introduced
into a five-coordinate ruthenium or osmium complex, can in
some cases undergo an exchange process with a differently
substituted silane; e.g., Os[Si(OH)3]Cl(CO)(PPh3)2 when treated
with HSiMe2Cl affords Os(SiMe2Cl)Cl(CO)(PPh3)2 in good
yield.
An illustration of the usefulness of the labile halide on
osmium in the five-coordinate silyl complexes 14 (see Figure
1) is depicted in Scheme 8, where Os[Si(OEt)3]Cl(CO)(PPh3)2
(25) (from OsPhCl(CO)(PPh3)2 and HSi(OEt)3) undergoes a
reaction with PhLi to replace the chloride and form an Os-
phenyl bond in Os[Si(OEt)3]Ph(CO)(PPh3)2 (26). Both 25 and
26 take up CO to form the six-coordinate complexes Os[Si-
(OEt)3]Cl(CO)2(PPh3)2 (27) and Os[Si(OEt)3]Ph(CO)2(PPh3)2
(28), respectively. Interestingly, the formation of 27 is reversible,
and on heating in solution CO is lost and complex 25 is
reformed. Most bis(triphenylphosphine) dicarbonyl complexes
of osmium(II) resist loss of CO. We have observed one other
osmium silyl complex to behave similarly, Os[Si(NC4H4)3]Cl-
(CO)2(PPh3)2, which loses CO in solution even at room
temperature within minutes.14 It is interesting that in complex
26, where there are two ligands (phenyl and silyl), both of
recognized strong σ bonding/trans influence character, it is the
silyl ligand which dominates and which adopts the apical site
of the tetragonal pyramid, as revealed by crystal structure
determination. Complexes 26 and 28, with adjacent silyl and
aryl ligands, are models for the kind of metal complex
intermediates postulated to facilitate silicon-carbon bond
formation through reductive elimination in metal-catalyzed
processes such as hydrosilation.29 However, both 26 and 28 are
remarkably robust compounds which resist thermal decomposi-
tion at elevated temperatures over long periods of time, and
PhSi(OEt)3 is not observed among the decomposition products
that eventually form.23 These observations are in marked contrast
to the reactivity of the analogous boryl complex Os(Bcatecho-
late)(o-tolyl)(CO)2(PPh3)2, which at room temperature readily
undergoes reductive elimination to form o-tolylBcatecholate.30,31
D. Insertion Reactions into the Ru/Os-Si Bond. Another
reflection of the low reactivity of the Os-Si bonds in both the
or two chlorine substituents, viz., H-SiR2Cl and H-SiRCl2,
with silanes bearing other electronegative substituents such as
H-Si(NC4H4)3, H-Si(OEt)3, and H-Si(OC2H4)3N,14,22-24 and
even with trimethyl- and triethylsilane. However, in an atypical
reaction, trimethylsilane with OsPhCl(CO)(PPh3)2 gives the
osmium(IV) complex OsH3(SiMe3)(CO)(PPh3)2 (24) (see Scheme
7) rather than the expected Os(SiMe3)Cl(CO)(PPh3)2.25 The
formation of this product must involve multiple oxidative
addition and reductive elimination steps. Complex 24 is clearly
related to the trihydride silyl complexes MH3(SiR3)(PPh3)3 (M
) Ru, Os), which have been discussed in section IIIB, above.
B. Structure and Bonding. The tetragonal-pyramidal ge-
ometry of the five-coordinate silyl complexes represented by
14 in Figure 1 has been confirmed by numerous X-ray crystal
structure determinations. In all of these structures the silyl ligand
is located in the apical site. It is worth noting here that the related
five-coordinate boryl complexes of ruthenium and osmium also
adopt this structure with the boryl ligand apical, as do the five-
coordinate stannyl derivatives to be discussed below.26,27
Structural data for the set of five-coordinate osmium complexes
Os(SiR3)Cl(CO)(PPh3)2 (R ) F, Cl, OH, Me) (see Figure 2)
confirm other observations that the transition-metal-silicon
distance becomes shorter as the electronegativity of the sub-
stituents on silicon becomes greater.12 The measured distances
are Os-SiR3 ) 2.254(2), 2.273(6), 2.319(2), and 2.374(2) Å
for R ) F, Cl, OH, Me, respectively.20 These very short
distances lie at the short end of the range of 75 observations
for Os-Si distances recorded in the Cambridge Crystallographic
Data Base, and indeed, the value of 2.254(2) Å remains the
shortest Os-Si distance ever reported. A computational study
of this same set of four isostructural compounds20 shows that,
in addition to the expected strengthening of the Os-Si σ bond
as the ionic contributions increase, there is at least for the SiF3
and SiCl3 ligands a significant contribution to the bonding from
an Os-Si π bond formed from overlap of appropriate osmium
(22) Kwok, W.-H.; Lu, G.-L.; Rickard, C. E. F.; Roper, W. R.; Wright,
L. J. J. Organomet. Chem. 2004, 689, 2511.
(23) Albrecht, M.; Rickard, C. E. F.; Roper, W. R.; Williamson, A.;
Woodgate, S. D.; Wright, L. J. J. Organomet. Chem. 2001, 625, 77.
(24) Attar-Bashi, M. T.; Rickard, C. E. F.; Roper, W. R.; Wright, L. J.;
Woodgate, S. D. Organometallics 1998, 17, 504.
(25) Mo¨hlen, M.; Rickard, C. E. F.; Roper, W. R.; Salter, D. M.; Wright,
L. J. J. Organomet. Chem. 2000, 593-594, 458.
(26) Irvine, G. J.; Roper, W. R.; Wright, L. J. Organometallics 1997,
16, 2291.
(28) Lichtenberger, D. L.; Rai-Chaudhuri, A. J. Am. Chem. Soc. 1991,
113, 2923.
(29) Schubert, U. Angew. Chem., Int. Ed. Engl. 1994, 33, 419.
(27) Rickard, C. E. F.; Roper, W. R.; Williamson, A.; Wright, L. J.
Organometallics 1998, 17, 4869.