Journal of Materials Chemistry C
Paper
28.51, 28.40, 25.72, 25.70, 21.87, 12.50. EA: (%, found/calcd): 365 nm UV light for 30 min with the voltage applied, and then
C, 60.59/60.56; H, 5. 62/5.82; N, 18.17/18.42; S, 2.06/2.34.
the photo-crosslinked films were obtained.
DN-SH. Under an atmosphere of nitrogen, DN-S-S-DN
The depoling curves of second-order nonlinear materials
(135 mg, 0.05 mmol), DTT (16.74 mg, 0.11 mmol), Et3N after poling were conducted as follows: poled films were heated
(11.33 mg, 0.11 mmol) and distilled dichloromethane (2 mL) gradually from room temperature until no obvious signals were
were added into a Schlenk flask. The reaction mixture was observed. The heating rate was 4 1C minꢀ1. T80% represents the
stirred at room temperature for 5 h. The organic layer was temperature at which the SHG signals decreased to initial 80%.
washed with HCl (0.1 mol Lꢀ1) and water, and the solvent was
removed by rotary evaporation. The crude product was purified
by column chromatography on silica gel using dichloro-
Conflicts of interest
methane and ethyl acetate as eluents (2/1), to yield a red solid
There are no conflicts to declare.
(60 mg, 44%). 1H NMR (400 MHz, CDCl3, 298 K), d (TMS, ppm):
1.24 (t, J = 4.0 Hz, 6H, –CH3), 1.71–1.48 (m, 7H, –CH2–, SH),
1.95–1.90 (m, 2H, –CH2–), 2.24 (m, 4H, –CH2–), 2.60 (t, J = Acknowledgements
8.0 Hz, 2H, –CH2–), 2.71 (q, 2H, –CH2–), 2.96 (t, J = 8.0 Hz, 4H,
We are grateful to the National Natural Science Foundation of
China (21734007) for financial support.
–CH2–), 3.48 (q, 4H, –CH2–), 3.73 (t, J = 4.0 Hz, 4H, –CH2–), 4.00
(t, J = 4.0 Hz, 4H,–CH2–), 4.20–4.09 (m, 8H, –CH2–), 4.38 (t, J =
8.0 Hz, 4H, –CH2–), 5.18 (m, 4H, –CQCH2), 5.88–5.81 (m, 2H,
–CHQC), 6.59 (d, J = 8.0 Hz, 2H, ArH), 6.70 (d, J = 8.0 Hz, 4H,
Notes and references
ArH), 7.63–7.58 (m, 3H, ArH), 7.85–7.76 (m, 12H, ArH). 13C
NMR (100 MHz, CDCl3), d (TMS, ppm): 171.74, 155.55, 154.90,
151.58, 149.18, 148.62, 147.90, 147.22, 147.19, 146.36, 145.36,
144.20, 132.72, 126.30, 126.12, 122.42, 117.37, 117.33, 116.64,
117.57, 116.23, 111.73, 111.46, 109.20, 108.95, 69.78, 68.55,
64.68, 52.67, 51.30, 47.26, 45.37, 38.47, 28.89, 28.53, 28.41,
25.76, 25.71, 21.87, 19.80, 12.50. HRMS (ESI, m/z): calcd for
1 S. R. Marder, B. Kippelen, A. K. Y. Jen and
N. Peyghambarian, Nature, 1997, 388, 845; C. V.
McLaughlin, L. M. Hayden, B. Polishak, S. Huang, J. Luo,
T.-D. Kim and A. K. Y. Jen, Appl. Phys. Lett., 2008, 92, 151107;
S. Huang, J. Luo, Z. Jin, X.-H. Z. Z. Shi and A. K. Y. Jen,
J. Mater. Chem. C, 2012, 22, 20353; M. J. Cho, D. H. Choi,
P. A. Sullivan, A. J. P. Akelaitis and L. R. Dalton, Prog. Polym.
Sci., 2008, 33, 1013; K. Clays and B. J. Coe, Chem. Mater.,
2003, 15, 642; Y. Bai, N. Song, J. P. Gao, X. Sun, X. Wang,
G. Yu and Z. Y. Wang, J. Am. Chem. Soc., 2005, 127, 2060;
D. M. Burland, R. D. Miller and C. A. Walsh, Chem. Rev.,
1994, 94, 31; Q. Li and Z. Li, Acc. Chem. Res., 2020, 53, DOI:
10.1021/acs.accounts.0c00060.
2 M. Lee, H. E. Katz, C. Erben and D. M. Gill, Science, 2002,
298, 1401; L. R. Dalton, P. A. Sullivan and D. H. Bale, Chem.
Rev., 2010, 110, 25; C. Ji, Z. Sun, S. Zhang, S. Zhao, T. Chen,
Y. Tang and J. Luo, Chem. Commun., 2015, 51, 2298;
Y. Cheng, J. Luo, S. Huang, X. Zhou, Z. Shi, T.-D. Kim,
D. H. Bale, S. Takahashi, A. Yick, B. M. Polishak, S.-H. Jang,
L. R. Dalton, P. J. Reid, W. H. Steier and A. K. Y. Jen, Chem.
Mater., 2008, 20, 5047; J. Luo, Y.-J. Cheng, T.-D. Kim, S. Hau,
S.-H. Jang, Z. Shi, X.-H. Zhou and A. K. Y. Jen, Org. Lett.,
2006, 8, 1387.
3 F. Wang, A. W. Harper, M. S. Lee and L. R. Dalton, Chem.
Mater., 1999, 11, 2285; T.-A. Chen, A. K.-Y. Jen and Y. Cai,
J. Am. Chem. Soc., 1995, 117, 7295; W. Jin, P. V. Johnston,
D. L. Elder, K. T. Manner, K. E. Garrett, W. Kaminsky, R. Xu,
B. H. Robinson and L. R. Dalton, J. Mater. Chem. C, 2016,
4, 3119; D. Yu, A. Gharavi and L. Yu, J. Am. Chem. Soc., 1995,
117, 11680; T. J. Marks and M. A. Ratner, Angew. Chem., Int.
Ed. Engl., 1995, 34, 155.
4 J. Zhou, M. Wang, A. A. Fedorchuk, I. V. Kityk and J. Liu,
J. Mater. Sci: Mater. Electron., 2017, 28, 4931; M. H. Davey,
V. Y. Lee, L.-M. Wu, C. R. Moylan, W. Volksen, A. Knoesen,
R. D. Miller and T. J. Marks, Chem. Mater., 2000, 12,
1679; A. Scarpaci, E. Blart, V. Montembault, L. Fontaine,
C
69H81N18O11S: 1369.6047 [M + H]+; found: 1369.6033. EA
(%, found/calcd): C, 60.2/60.51; H, 5.601/5.89; N, 18.32/18.41;
S, 2.163/2.34.
Preparation of films
The monomers DN-SH and DS-SH, and doped systems were
dissolved in dichloromethane respectively with the concentration
of 30 mg mLꢀ1, and the solutions were filtered by syringe filters.
Then the solution was spin-coated onto indium-tin-oxide (ITO)-
coated glass substrates to give thick films. These glass substrates
were cleaned by ultrasonic treatment in different solvents of
water, acetone, deionized water, DMF, and THF before use.
Finally, thin films were heated in a vacuum oven at 45 1C to
remove residual solvents.
NLO measurements and photo-crosslinking of monomers
The second-order optical nonlinearity of the materials was
conducted by an in situ second harmonic generation (SHG)
experiment by using a closed temperature-controlled oven with
optical windows and three needle electrodes. The films were
kept at 451 to the incident beam and poled inside the oven, and
the SHG intensity was monitored simultaneously. The SHG
measurements were carried out with an Nd:YAG laser operating
at a 10 Hz repetition rate and an 8 ns pulse width at 1064 nm.
The poling voltage is 7 kV. The temperature was different for
different monomers.
The thin films were heated to the best poling temperature
(Te) under the electric field. After maintaining for 10 min at Te,
the photo-crosslinking process was conducted immediately
or at room temperature. The poled films were exposed to the
J. Mater. Chem. C
This journal is © The Royal Society of Chemistry 2020