Full text of DOI:10.1063/1.92094

Oxidation mechanisms in TiSi2 films on single silicon substrates
JiannRuey Chen, MauPhon Houng, ShenKan Hsiung, and Yuenchung Liu
Citation: Applied Physics Letters 37, 824 (1980); doi: 10.1063/1.92094
View online: http://dx.doi.org/10.1063/1.92094
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/37/9?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
130.239.20.174 On: Sun, 23 Nov 2014 16:31:35

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
130.239.20.174 On: Sun, 23 Nov 2014 16:31:35

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
130.239.20.174 On: Sun, 23 Nov 2014 16:31:35