M. Kako et al. / Journal of Organometallic Chemistry 636 (2001) 63–68
67
cially available and used as received. Compounds 1a [6a],
b [6b], 6 [14], 7 [15a,b], and 8 [15c] were prepared
according to the literatures.
from the Ministry of Education, Science, Sports and
Culture in Japan. We also thank Toshiba Silicone Co.
Ltd for a gift of organosilicon reagents.
1
3.2. Photoreactions of cyclosilanes
References
A typical procedure is exemplified as follows. A
−
2
[1] M. Kako, Y. Nakadaira, Coord. Chem. Rev. 176 (1998) 87 (and
references therein).
degassed solution of 1a (1.1×10
M) and PQ (3.5×
−
2
1
0
M) in a mixed solvent (CH CN–CH Cl =4/1) was
3 2 2
[
2] (a) Y.F. Traven, R. West, J. Am. Chem. Soc. 95 (1973) 6824;
b) H. Sakurai, M. Kira, T. Uchida, J. Am. Chem. Soc. 95
(1973) 6826;
c) H. Sakurai, Y. Kamiyama, J. Am. Chem. Soc. 96 (1974)
192.
irradiated with two 500 W tungsten–halogen lamps
passing through an aqueous NaNO2 solution filter,
(
(
(
6
cutoffB400 nm) at room temperature (r.t.). The silylene
adducts 2a and 3a were obtained by preparative GLC
and HPLC. The yields of 2a and 3a were determined by
analytical GLC. Photolyses of 1b, 6, 7, and 8 were
conducted in the same procedure and the results were
[
3] (a) M. Igarashi, T. Ueda, M. Wakasa, Y. Sakaguchi, H.
Hayashi, J. Organomet. Chem. 421 (1991) 9;
(
b) M. Wakasa, M. Igarashi, Y. Sakaguchi, H. Hayashi, Ni-
honkagakukaishi (1994) 267;
c) H. Komoriya, M. Kako, Y. Nakadaira, K. Mochida, M.
Tonogaki-Kubota, T. Kobayashi, Chem. Lett. (1984) 1213;
d) H. Komoriya, M. Kako, Y. Nakadaira, K. Mochida, M.
1
(
summarized in Table 1. 2a. H-NMR (C D ): l 8.54 (d,
6
6
2
H, J=8.0 Hz), 8.46 (d, 2H, J=8.0 Hz), 7.53 (t, 2H,
J=8.0 Hz), 7.40 (t, 2H, J=8.0 Hz), 0.20 (s, 6H);
(
Tonogaki-Kubota, T. Kobayashi, J. Organomet. Chem. 499
(1995) 123;
1
3
C-NMR (CDCl ): l 139.35 (s), 127.38 (s), 126.97 (d),
3
1
25.39 (s), 124.81 (d), 123.50 (d), 121.06 (d), −0.80 (q).
(e) E. Baciocchi, T.D. Giacco, F. Elisei, M. Ioele, J. Org. Chem.
+
6
0 (1995) 7974.
MS (70 eV); m/z (%): 266 [M , 6], 252 (21), 210 (100),
[
4] (a) K. Maruyama, H. Imahori, A. Osuka, A. Takuwa, H.
Tagawa, Chem. Lett. (1986) 1719;
181 (34), 152 (35), 43 (20). Found: 266.0780. Exact mass
1
Calc. for C H O Si: 266.0763. 3a. H-NMR (CDCl ):
l 8.62 (d, 2H, J=8.0 Hz), 8.16 (d, 2H, J=8.0 Hz),
1
6
14
2
3
(
b) A. Takuwa, H. Tagawa, H. Iwamoto,
O Soga, K.
Maruyama, Chem. Lett. (1987) 1091;
(c) A. Takuwa, Y. Nishigaichi, K. Yamashita, H. Iwamoto,
Chem. Lett. (1990) 639;
1
3
7
1
1
3
.62–7.58 (m, 4H), 0.36 (s, 12H); C-NMR (CDCl ): l
35.43 (s), 129.00 (s), 127.73 (s), 126.65 (d), 125.20 (d),
22.39 (d), 122.14 (d), −0.90 (q). MS (70 eV); m/z (%):
40 [M , 100], 325 (30), 266 (82), 236 (44), 133 (58), 73
3
(
d) A. Takuwa, Y. Nishigaichi, K. Yamashita, H. Iwamoto,
Chem. Lett. (1990) 1761;
e) A. Takuwa, Y. Nishigaichi, T. Yamaoka, K. Iihama, J.
+
(
(
21). Found: 340.0927. Exact mass Calc. for C H O Si :
18 20 3 2
Chem. Soc. Chem. Commun. (1991) 1359;
(f) L. Cermenati, M. Freccero, P. Venturello, A. Albini, J. Am.
Chem. Soc. 117 (1995) 7869.
1
3
8
40.0951. 2b. H-NMR (CDCl ): l 8.67 (d, 2H, J=
.0Hz), 8.15 (d, 2H, J=8.0 Hz), 7.65–7.53 (m, 4H), 1.43
3
13
[5] M. Kako, M. Ninomiya, Y. Nakadaira, Chem. Commun. (1997)
373.
6] (a) H. Gilman, R.A. Tomasi, J. Org. Chem. 28 (1963) 1651;
b) H. Watanabe, T. Maruoka, M. Kageyama, K. Yoshizumi, Y.
(
sept, 2H, J=7.5 Hz), 1.16 (d, 12H, J=7.5 Hz); C-
1
NMR (CDCl ): l 139.66 (s), 126.55 (s), 126.46 (d), 124.63
3
[
[
(
s), 124.25 (d), 120.88 (d), 120.71 (d), 15.80 (q), 13.04 (d).
(
+
MS (70 eV); m/z (%): 322 [M , 100], 236 (28), 208 (10),
Nagai, Organometallics 3 (1984) 141.
7] (a) W. Ando, M. Ikeno, J. Chem. Soc. Chem. Commun. (1979)
43 (20). Exact mass Calc. for C H O Si: 322.1389.
20 22 2
6
(
55;
b) P.P. Gasper, in: M. Jones Jr., R.A. Moss (Eds.), Reactive
Intermediates, vol. 1, Wiley, New York, 1978, p. 229 (vol. 2,
981, p. 335; vol. 3, 1985, p. 333).
Found: 322.1388.
3.3. Laser flash photolysis
1
[
[
8] R. Foster, M.I. Foreman, in: S. Patai (Ed.), The Chemistry of
the Quinonoid Compounds, Wiley, New York, 1974, p. 257
Laser flash photolysis experiments were performed on
(
chap. 6).
nitrogen-bubbled solutions at r.t. by using the third
harmonic (355 nm) of a Nd:YAG laser as an exciting
light source. The concentrations of substrates employed
9] S.L. Murov, Handbook of Photochemistry, Marcel Dekker, New
York, 1973.
[
10] (a) D. Rehm, A. Weller, Isr. J. Chem. 8 (1970) 259;
(b) J. Mattay, J. Runsink, J. Gersdorf, T. Rumbach, C. Ly,
Helv. Chim. Acta 69 (1986) 442.
11] A. Alberti, S. Dellonte, C. Paradisi, S. Roffia, G.F. Pedulli, J.
Am. Chem. Soc. 112 (1990) 1123.
−
4
−3
−3
were 4.80×10
M for PQ, 4.40×10 , 2.20×10
,
−
3
−4
−4
1
.10×10 , 4.40×10 , and 2.20×10
M for 1b,
[
[
respectively, in a mixed solvent (CH CN–CH Cl =4/1).
3
2
2
−
4
In C H , the concentrations were 4.80×10 M for PQ,
.30×10 , 1.00×10 , and 3.00×10
6
6
12] (a) H. Sakurai, K. Sakamoto, M. Kira, Chem. Lett. (1984) 1213;
−
3
−3
−4
3
M for 1b,
(
b) Y. Nakadaira, N. Komatsu, H. Sakurai, Chem. Lett. (1985)
respectively.
1781.
[
13] (a) G. Raabe, J. Michl, Chem. Rev. 85 (1985) 419;
(
b) G. Raabe, in: S. Patai, Z. Rappoport (Eds.), The Chemistry
of Organosilicon Compounds, Wiley, New York, 1989, p. 1015
Acknowledgements
(
(
chap. 17);
c) Y. Nakadaira, T. Otsuka, H. Sakurai, Tetrahedron Lett. 22
This work was supported in part by Grants-in-Aid
(1981) 2417;