Supported CuCl/γ-Al2O3 for Friedel–Crafts Acylation with Effective Inhibition of…
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a single-electron transfer process which is mediated either
by electrochemically or low-valent metals. It often pro-
ceeds by initial electron transfer from a reductant, followed
by scission of the C–F bond to give a fluoride ion and a
carbon radical. The oxidative addition pathway means
employing transition metals for C–F bond cleavage through
oxidative addition of the C–F bond to the transition metal
center. The nucleophilic pathway refers to nucleophilic
substitution reaction in which fluorine atom is substituted
by nucleophile such as OH−, SH− and so on.
surface area, and as a result could reduce the amount of
work of Tang and coworkers, where monolayered CuCl
was dispersed on γ-Al2O3 [11], a series of γ-Al2O3 sup-
6, 10, 13, 16 and 17%) were prepared to serve as the co-
catalysts for inhibiting the defluorination during the phe-
nylacetylation of fluorobenzene.
Among these three mechanisms, the electron transfer
pathway should be the most reasonable way in our work,
because that there is no existence of transition metal or
nucleophile, while there is free aluminum impurities (which
meets the requirement of the presence of low-valent metals
manufaction [19, 20]. The side reactions during the acyla-
tion can thus be deduced as (1) fluorobenzene was firstly
reduced to anion radical by gaining one electron from the
trace free Al in AlCl3; (2) the anion radical dissociated as
a benzene radical and a F−; (3) the benzene radical gener-
ates benzene by hydrogen abstraction reaction; and (4) the
acylation of the formed benzene, which has higher reactiv-
ity to be acylated than fluorobenzene, leads to the forma-
tion of the by-product 1. In this way, the occurrences of by-
product 1 and benzene in Scheme 1 are thus explained.
Then it is hoped that Cu2+ or Cu+ could have defluori-
nation inhibiting effect because of their electron-accepting
nature, in the way of being reduced to Cu+ or Cu by gaining
the electron, which would no longer come to fluobenzene
again from Al. Before verifying the defluorination inhibit-
ing effect of Cu2+/Cu+ during the acylation of fluoroben-
zene, the content of benzene among the starting fluoroben-
zene was identified as 0.011% by GC measurement. Then
phenylacetylation of fluorobenzene under AlCl3 catalyst
in the presence of CuCl, CuO, CuCl2 and the blank con-
trol were then carried out. The contents of benzene among
the first run of the recycled fluorobenzene (Cben) with 1.5
equiv. CuCl, CuO, CuCl2 and blank control were 0.011,
0.032, 0.030 and 0.030%, respectively. It can be seen that
CuCl had inhibiting effect for defluorination while CuO
and CuCl2 has no effect, indicating that CuCl could be used
as the defluorination inhibitor, probably due to its covalent
character.
3.2 The Characterizations of the Supported CuCl/
γ-Al2O3
3.2.1 XRD
shown in Fig. 1. The diffraction peaks corresponding to
Al (10%) and Cu@Al (13%), while the increasing reflec-
tions corresponding to crystalline CuCl at 2θ = 28.6°,
47.5° and 56.3° were clearly observed in Cu@Al (16%)
and Cu@Al (17%). These results indicate that those co-
catalysts whose Cu content lower than 16% formed mon-
olayer CuCl on the γ-Al2O3 surface, while CuCl began to
stack when the Cu content becomes equal to or greater
than 16%, this phenomenon is in accordance with the
reported result that 0.33 g of CuCl salt was necessary to
form a monolayer onto the surface of 1 g γ-Al2O3 [30]
(Cu content was calculated as 15.9%).
Then different molar ratios of CuCl were then used
to evaluate the inhibiting effect. GC results of recycled
solvents were shown in Table S1. It was found that the
Cben decreased with the addition of CuCl and became
the same as that of the starting fluorobenzene when 1.5
equiv. of CuCl was added. Considering that industrial
CuCl were nonuniform in size and has small surface area,
supported CuCl was supposed to have better defluorina-
tion-inhibiting performance for possessing a much larger
Fig. 1 XRD patterns of γ-Al2O3(a), Cu@Al (2%) (b), Cu@Al (10%)
(c), Cu@Al(13%) (d), Cu@Al(16%) (e), and Cu@Al(17%) (f)
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