Angewandte
Research Articles
Chemie
primarily activated by detrimental UV or near-UV light with
poor tissue penetration,[15] and it remained a grand challenge
to develop photoCORMs capable of releasing CO under red
or near-infrared light irradiation.[16] Considering the facile
preparation, quantitative CO yield, and low toxicity of the
photolyzed products of 3-HF-based CO releasers, we envi-
sioned that 3-HF derivative might be an ideal candidate for
metal-free CORMs to evaluate the antibacterial capacity of
CO. Nevertheless, it was impractical to directly activate 3-HF
moieties under red light irradiation owing to the weak
absorbance. It was worth noting that the CO release from 3-
HF derivatives involved the oxygenation of excited 3-HF
derivatives by ground oxygen (3O2).[11d] We hypothesized it
was possible to oxidize 3-HF derivatives through a photo-
oxygenation mechanism using more oxidative singlet oxygen
(1O2) in the presence of a specific photosensitizer with long-
wavelength absorbance, thereby enabling CO release via an
indirect approach under red light irradiation.[17]
In this work, we report a metal-free CO-releasing plat-
form by integrating 3-HF derivatives and tetraphenylpor-
phyrin (TPP) moieties into the cores of micellar nano-
particles, serving as the CO donor and photosensitizer,
respectively. The formation of micellar nanoparticles not
only increased the water-dispersity but also locally concen-
trated 3-HF derivatives and the photosensitizer. When
exposed to 650 nm light irradiation, the excited TPP photo-
sensitizer converted 3O2 to 1O2 that spontaneously oxidized 3-
HF derivatives, resulting in CO release (Scheme 1b). The
CO-releasing micelles were selectively internalized by Gram-
positive Staphylococcus aureus (S. aureus) instead of Gram-
negative Escherichia coli (E. coli) bacteria, and the red light-
triggered intracellular CO release exerted an excellent
bactericidal effect against S. aureus. Moreover, in vivo studies
revealed that the CO-releasing micelles could efficiently
eradicate methicillin-resistant S. aureus (MRSA) bacteria and
accelerate MRSA-infected wounds in a full-thickness skin
wound model.
Scheme 2. Chemical structures of HF, TPP-HF, TPP-CHF, and TPP-Flav
diblock copolymers used in this study.
known as inhibitors of radicals, the HFM and FlavM
monomer containing a phenolic group at the 3-position could
be directly polymerized through RAFT polymerization.
With the synthesized block copolymers in hand, we first
investigated their self-assembly behavior in aqueous solu-
tions. TPP-HF, TPP-CHF, and HF block copolymers self-
assembled into micellar nanoparticles with hydrodynamic
diameters, hDhi, of ca. 20–60 nm (Figure S12). Upon exposure
to mild red light irradiation (650 nm, 26 mWcmꢀ2), no
significant changes in hDhi were observed for all three
micelles, whereas a decrease in scattering intensities was
observed for TPP-HF micelles (Figure 1a–c, S12). To under-
stand this phenomenon, we monitored the UV/Vis absorb-
ance spectra of all three micelles under 650 nm light
irradiation. We found that a continuous decrease centered
at 356 nm was only observed for TPP-HF micelles (Fig-
ure 1d), whereas TPP-CHF micelles with caged 3-HF moi-
eties and HF micelles without the labeling of TPP photo-
sensitizers did not reveal noticeable changes in UV/Vis
spectra (Figure S13). The apparent photolysis constant, kobs
,
of TPP-HF micelles was determined to be 0.08 minꢀ1 under
650 nm light irradiation (Figure S13d and Table S2). Remark-
ably, when TPP-HF micelles were exposed to 365 nm light
irradiation, the kobs value was increased to 0.151 minꢀ1
(Figure S14), which was likely ascribed to the higher absorb-
ance at 365 nm (Figure 1d). However, the kobs of HF micelles
without TPP photosensitizer dropped to 0.034 minꢀ1 under
identical 365 nm light irradiation (Figure S14 and Table S2),
demonstrating that the photolysis of 3-HF moieties proceed-
ed more efficiently in the presence of TPP photosensitizer
under 650 nm light irradiation.
Results and Discussion
Starting from 4-hydroxybenzaldehyde, both 3-HF-based
monomers, N-(2-(4-(3-hydroxy-4-oxo-4H-chromen-2-yl)phe-
noxy) ethyl)methacrylamide (HFM) and N-(2-(4-(3-hydroxy-
4-oxo-4H-benzo[g]chromen-2-yl)phenoxy)ethyl)methacryla-
mide (FlavM), were successfully synthesized using a similar
procedure. Moreover, the phenolic group of HFM could be
further modified with the formation of caged HF monomer
(CHFM) in the presence of benzyl bromide (Supporting
Information, Scheme S1). Also, we synthesized TPP photo-
sensitizer-based monomer (TPPM; Scheme S2) and HF, TPP-
HF, TPP-CHF, and TPP-Flav block copolymers through
reversible addition-fragmentation chain transfer (RAFT)
polymerization (Scheme S3).[18] All the precursors, targeted
monomers, and block copolymers were thoroughly charac-
terized (Figures S1–S11). The chemical structures and the
structural parameters of the as-synthesized diblock copoly-
mers are shown in Scheme 2 and Table S1, respectively.
Remarkably, although phenol-containing compounds were
Using the allyl-Flu (AFCO) probe,[19] red light-mediated
CO release from TPP-HF micelles was confirmed by the
fluorescence increase (Figure 1e). Moreover, the CO release
process was monitored by a portable CO detector (Drꢀger
Pac6500), revealing that a higher CO yield under 650 nm
irradiation than that of 365 nm irradiation (Figure 1 f).
Specifically, the CO release amounts were calculated to be
1.26 mmol and 1.06 mmol under 650 and 365 nm irradiation for
90 min, corresponding to ca. 69% and ca. 58% of the 3-HF
moieties, respectively (Figure 1 f). However, no CO release
was detected for TPP-CHF and HF micelles under identical
red light irradiation (Figure 1 f), in good agreement with the
negligible changes in UV/Vis spectra (Figure 1d and S13).
Taken together, although 3-HF moieties showed negligible
absorbance at 650 nm, the incorporation of TPP photosensi-
tizer and 3-HF moieties into the cores of micellar nano-
particles enabled the photooxygenation of 3-HF moieties,
Angew. Chem. Int. Ed. 2021, 60, 2 – 10
ꢀ 2021 Wiley-VCH GmbH
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