2,5-BIS(TRIMETHYLSILYL)THIOPHENE

Base Information

Chemical Name:2,5-BIS(TRIMETHYLSILYL)THIOPHENE
CAS No.:17906-71-7
Molecular Formula:C10H20SSi2
Molecular Weight:228.506
Hs Code.:2934999090
Mol file:17906-71-7.mol

Synonyms:2,5-trimethylsilylthiophene;hexa-Si-methyl-Si,Si'-thiophene-2,5-diyl-bis-silane;

Suppliers and Price of 2,5-BIS(TRIMETHYLSILYL)THIOPHENE

Supply Marketing:

Business phase:: The product has achieved commercial mass production^*data from LookChem market partment

Manufacturers and distributors:

Manufacture/Brand
Chemicals and raw materials
Packaging
price

American Custom Chemicals Corporation
2,5-BIS(TRIMETHYLSILYL)THIOPHENE 95.00%
5MG
$ 496.57

Total 6 raw suppliers

Chemical Property of 2,5-BIS(TRIMETHYLSILYL)THIOPHENE

Chemical Property:

PSA：28.24000
LogP:2.83850

Purity/Quality:

97% ^*data from raw suppliers

2,5-BIS(TRIMETHYLSILYL)THIOPHENE 95.00% ^*data from reagent suppliers

Safty Information:

Pictogram(s):
Hazard Codes:

MSDS Files:

Useful:

Technology Process of 2,5-BIS(TRIMETHYLSILYL)THIOPHENE

There total 18 articles about 2,5-BIS(TRIMETHYLSILYL)THIOPHENE which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield: 100.0%

: 234773-45-6
3,6-bis(trimethylsilyl)-1,2-dithiin

: 17906-71-7
2,5-bis(trimethylsilyl)thiophene

Guidance literature:: Irradiation;
DOI:10.1002/(SICI)1521-3773(19990601)38:11<1604::AID-ANIE1604>3.0.CO;2-I

Reference yield: 93.0%

: 3141-27-3
2,5-dibromothiophen

: 75-77-4
chloro-trimethyl-silane

: 17906-71-7
2,5-bis(trimethylsilyl)thiophene

Guidance literature:: 2,5-dibromothiophen; With n-butyllithium; In diethyl ether; hexane; at -78 - 20 ℃; Inert atmosphere; Schlenk technique;

chloro-trimethyl-silane; In diethyl ether; hexane; at -78 - 20 ℃;
DOI:10.1021/ol4024024