{3,5-bis[1-(4-methoxyphenyl)-1-methylethyl]-7-[triethylsilyl]hepta-3,4-diene-1,6-diyn-1-yl}(triisopropyl)silane

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Chemical Name:{3,5-bis[1-(4-methoxyphenyl)-1-methylethyl]-7-[triethylsilyl]hepta-3,4-diene-1,6-diyn-1-yl}(triisopropyl)silane
CAS No.:949589-25-7
Molecular Formula:C₄₂H₆₂O₂Si₂
Molecular Weight:655.124
Hs Code.:

Synonyms:{3,5-bis[1-(4-methoxyphenyl)-1-methylethyl]-7-[triethylsilyl]hepta-3,4-diene-1,6-diyn-1-yl}(triisopropyl)silane

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Chemical Property of {3,5-bis[1-(4-methoxyphenyl)-1-methylethyl]-7-[triethylsilyl]hepta-3,4-diene-1,6-diyn-1-yl}(triisopropyl)silane

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Technology Process of {3,5-bis[1-(4-methoxyphenyl)-1-methylethyl]-7-[triethylsilyl]hepta-3,4-diene-1,6-diyn-1-yl}(triisopropyl)silane

There total 8 articles about {3,5-bis[1-(4-methoxyphenyl)-1-methylethyl]-7-[triethylsilyl]hepta-3,4-diene-1,6-diyn-1-yl}(triisopropyl)silane which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield: 46.0%

: 949589-14-4
4-(4-methoxyphenyl)-1-[1-(4-methoxyphenyl)-1-methylethyl]-4-methyl-1-[(triisopropylsilyl)ethynyl]pent-2-yn-1-yl methyl carbonate

: 1777-03-3
2-triethylsilylacetylene

: 949589-25-7
{3,5-bis[1-(4-methoxyphenyl)-1-methylethyl]-7-[triethylsilyl]hepta-3,4-diene-1,6-diyn-1-yl}(triisopropyl)silane

Guidance literature:: With copper(l) iodide; tetrakis(triphenylphosphine) palladium⁽⁰⁾; N-ethyl-N,N-diisopropylamine; In 1,2-dichloro-ethane; at 80 ℃;
DOI:10.1002/ejoc.200700373

Reference yield:

: 5351-07-5
2-(4-methoxy-phenyl)-2-methyl-propionitrile

: 949589-25-7
{3,5-bis[1-(4-methoxyphenyl)-1-methylethyl]-7-[triethylsilyl]hepta-3,4-diene-1,6-diyn-1-yl}(triisopropyl)silane

Guidance literature:: Multi-step reaction with 6 steps

1.1: 91 percent / KOH; water / ethane-1,2-diol / 38 h / Heating

2.1: Et₃N; methanesulfonyl chloride / tetrahydrofuran / 0.17 h / 0 °C

2.2: 80 percent / tetrahydrofuran / 1 h / 0 °C

3.1: n-BuLi / tetrahydrofuran; hexane / 0.5 h / -78 - 20 °C

3.2: 82 percent / tetrahydrofuran; hexane / -78 - 20 °C

4.1: nBuLi / tetrahydrofuran / 0.5 h / -78 - 20 °C

4.2: 99 percent / tetrahydrofuran / -78 °C

5.1: NaHDMS / tetrahydrofuran / 0.5 h / -78 - 20 °C

5.2: 93 percent / tetrahydrofuran / -78 - 20 °C

6.1: 46 percent / CuI; Pd(PPh₃)4; Huenig base / 1,2-dichloro-ethane / 80 °C

With potassium hydroxide; copper(l) iodide; tetrakis(triphenylphosphine) palladium⁽⁰⁾; n-butyllithium; water; sodium hexamethyldisilazane; methanesulfonyl chloride; triethylamine; N-ethyl-N,N-diisopropylamine; In tetrahydrofuran; hexane; ethylene glycol; 1,2-dichloro-ethane; 6.1: Sonogashira cross-coupling reaction;
DOI:10.1002/ejoc.200700373

Reference yield:

: 949589-16-6
6-(4-methoxyphenyl)-3-[1-(4-methoxyphenyl)-1-methylethyl]-6-methyl-1-(triisopropylsilyl)hepta-1,4-diyn-3-ol

: 949589-25-7
{3,5-bis[1-(4-methoxyphenyl)-1-methylethyl]-7-[triethylsilyl]hepta-3,4-diene-1,6-diyn-1-yl}(triisopropyl)silane

Guidance literature:: Multi-step reaction with 2 steps

1.1: NaHDMS / tetrahydrofuran / 0.5 h / -78 - 20 °C

1.2: 93 percent / tetrahydrofuran / -78 - 20 °C

2.1: 46 percent / CuI; Pd(PPh₃)4; Huenig base / 1,2-dichloro-ethane / 80 °C

With copper(l) iodide; tetrakis(triphenylphosphine) palladium⁽⁰⁾; sodium hexamethyldisilazane; N-ethyl-N,N-diisopropylamine; In tetrahydrofuran; 1,2-dichloro-ethane; 2.1: Sonogashira cross-coupling reaction;
DOI:10.1002/ejoc.200700373