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Titanium nitride

Base Information
  • Chemical Name:Titanium nitride
  • CAS No.:25583-20-4
  • Deprecated CAS:12068-93-8,12209-87-9,165390-89-6,524738-58-7,1029928-47-9,1362048-35-8,1642326-67-7,1818834-95-5,1029928-47-9,12209-87-9,1362048-35-8,165390-89-6,524738-58-7
  • Molecular Formula:NTi
  • Molecular Weight:61.8867
  • Hs Code.:2849909000
  • European Community (EC) Number:247-117-5
  • DSSTox Substance ID:DTXSID8067109
  • Wikipedia:Titanium nitride,Titanium_nitride
  • Wikidata:Q415638
  • Mol file:25583-20-4.mol
Titanium nitride

Synonyms:titanium nitride;titanium nitride (Ti2N);titanium nitride (TiN)

Suppliers and Price of Titanium nitride
Supply Marketing:
Business phase:
The product has achieved commercial mass production*data from LookChem market partment
Manufacturers and distributors:
  • Manufacture/Brand
  • Chemicals and raw materials
  • Packaging
  • price
  • Strem Chemicals
  • Titanium nitride (99+%-Ti)
  • 100g
  • $ 127.00
  • Strem Chemicals
  • Titanium nitride, 1.3-1.9 microns (99+%-Ti)
  • 100g
  • $ 95.00
  • Strem Chemicals
  • Titanium nitride, 1.3-1.9 microns (99+%-Ti)
  • 500g
  • $ 380.00
  • Strem Chemicals
  • Titanium nitride (99+%-Ti)
  • 25g
  • $ 42.00
  • Sigma-Aldrich
  • Titanium nitride <3 μm
  • 25g
  • $ 50.70
  • Alfa Aesar
  • Titanium nitride sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick 99.5% (metals basis)
  • 1each
  • $ 899.00
  • Alfa Aesar
  • Titanium nitride sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick 99.5% (metals basis)
  • 1each
  • $ 834.00
  • Alfa Aesar
  • Titanium nitride, Aerosol Refractory Paint 99+%
  • *5x13oz
  • $ 762.00
  • Alfa Aesar
  • Titanium nitride sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick 99.5% (metals basis)
  • 1each
  • $ 639.00
  • Alfa Aesar
  • Titanium nitride 99.7% (metals basis)
  • 1kg
  • $ 631.00
Total 89 raw suppliers
Chemical Property of Titanium nitride
Chemical Property:
  • Appearance/Colour:gold or brown powder 
  • Melting Point:2930 °C(lit.) 
  • Boiling Point:0 °C 
  • Flash Point:0°C 
  • PSA:23.79000 
  • Density:5.24 g/mL at 25 °C(lit.) 
  • LogP:0.01508 
  • Solubility.:it is soluble in aqua regia on boiling. 
  • Water Solubility.:Soluble in aqua regain. Partly soluble in water. 
  • Hydrogen Bond Donor Count:0
  • Hydrogen Bond Acceptor Count:1
  • Rotatable Bond Count:0
  • Exact Mass:61.9510147
  • Heavy Atom Count:2
  • Complexity:10
Purity/Quality:

99.90% *data from raw suppliers

Titanium nitride (99+%-Ti) *data from reagent suppliers

Safty Information:
  • Pictogram(s):  
  • Hazard Codes: 
  • Safety Statements: 22-24/25 
MSDS Files:

SDS file from LookChem

Total 1 MSDS from other Authors

Useful:
  • Chemical Classes:Metals -> Metals, Inorganic Compounds
  • Canonical SMILES:N#[Ti]
  • General Description Titanium nitride (TiN) is a hard, ceramic material known for its exceptional hardness (up to 2800 kg/mm2), strong adhesion (up to 15 N), and corrosion resistance, making it valuable as a protective coating. It can be synthesized via techniques like ion beam-assisted deposition (IBAD), where titanium is evaporated and irradiated with nitrogen ions. Titanium carbonitride (TiCN), a related compound, exhibits even higher hardness (up to 4000 kg/mm2) when acetylene is introduced during deposition. These coatings are widely used to enhance the durability and performance of materials, particularly in corrosive environments like seawater.
Technology Process of Titanium nitride

There total 2 articles about Titanium nitride which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:
Guidance literature:
With nitrogen; In gas; microwave discharge, total pressure ca. 500 mTorr; laser induced fluorescence monitoring;
DOI:10.1016/0022-2852(90)90305-A
Guidance literature:
In gas; Electric Arc; TiCl4 and N2 were mixed with the inert gas Kr, passed through a high frequency discharge (0,1 Torr); or N2-inert gas mixture was passed throughthe discharge and reacted then with TiCl4; matrix isolated;
DOI:10.1016/0009-2614(81)80012-7
Refernces

Reaction of oxygen difluoride with sulfur dioxide, sulfur trioxide, and peroxydisulfuryl difluoride

10.1021/ic50016a044

The main content of the study revolves around the chemical reactions involving various nitrides and oxygen difluoride (O2F2). The research explores the fluorination of different types of nitrides, such as lithium nitride (Li3N), beryllium nitride (Be3N2), magnesium nitride (Mg3N2), boron nitride (BN), silicon nitride (Si3N4), titanium nitride (TiN), vanadium nitride (VN), and copper(I) nitride, using elementary fluorine. The aim is to establish if there is a relationship between the structure of a nitride and the formation of nitrogen trifluoride (NF3) as a product of its direct fluorination. Additionally, the study investigates the reaction of oxygen difluoride with sulfur dioxide, sulfur trioxide, and peroxydisulfuryl difluoride, focusing on the photochemical decomposition and the role of 0-F radical species as reaction intermediates. The experiments involve irradiating gaseous mixtures with ultraviolet light to observe the reactions and identify the products, which include peroxysulfuryl difluoride, pyrosulfuryl fluoride, sulfuryl fluoride, and fluorine fluorosulfonate, among others. The study employs various analytical techniques such as infrared and F19 n.m.r. spectroscopy to characterize the compounds formed.

Nitride and carbonitride layers of titanium formed under high energy ion irradiation

10.1007/BF00553698

The study investigates the formation of titanium nitride (TiN) and titanium carbonitride (TiCN) films using ion beam assisted deposition (IBAD) and reactive ion beam assisted deposition (RIBAD) techniques. Titanium is evaporated and simultaneously irradiated with nitrogen ions to form TiN, while the introduction of acetylene (C2H2) leads to the formation of TiCN. The research examines how the composition, purity, hardness, adhesion, and corrosion resistance of these films are influenced by process parameters such as nitrogen ion current density and reactive gas pressure. The study finds that the hardness of TiN films can reach up to 2800 kg/mm2 and TiCN films up to 4000 kg/mm2, with adhesion values of up to 15 N for TiN and 10 N for TiCN. Both coatings significantly reduce the corrosion rate of stainless steel in seawater, demonstrating their potential as protective coatings.

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