Multi-step reaction with 22 steps
1.1: D-DIPT; Ti(OiPr)4; t-BuOOH / CH2Cl2 / -25 - -15 °C
2.1: 99 percent / imidazole; Ph3P; I2 / tetrahydrofuran; acetonitrile / 0.5 h / 20 °C
3.1: 98 percent / Zn; AcOH / methanol / 2.5 h / 37 °C
4.1: 100 percent / Et3N; DMAP / CH2Cl2 / 21 h / 20 °C
5.1: DDQ / CH2Cl2; H2O / 1 h / 0 °C
5.2: 81 percent / NaBH4 / methanol / 0.5 h / 20 °C
6.1: 97 percent / (COCl)2; DMSO; Et3N / CH2Cl2 / -63 - 20 °C
7.1: 86 percent / NaH / tetrahydrofuran / 0.5 h / -78 °C
8.1: 87 percent / DIBAL / CH2Cl2; toluene / 1 h / -78 °C
9.1: 100 percent / D-DIPT; Ti(OiPr)4; t-BuOOH / CH2Cl2 / -30 - -15 °C
10.1: 70 percent / Red-Al / toluene / 21 h / -30 °C
11.1: 95 percent / pyridine / CH2Cl2 / 3.5 h / 20 °C
12.1: 97 percent / 2,6-lutidine / CH2Cl2 / 0.5 h / 0 °C
13.1: 80 percent / aq. NaOH / methanol / 11 h / 20 °C
14.1: 1.97 g / (COCl)2; DMSO; Et3N / CH2Cl2 / -78 - 20 °C
15.1: diisopropylamine; n-BuLi / tetrahydrofuran; hexane / 1 h / -78 °C
16.1: 69 percent / Dess-Martin reagent / CH2Cl2 / 15 h / 20 °C
17.1: 85 percent / NaH / tetrahydrofuran / -5 - 20 °C
18.1: 98 percent / DIBAL / CH2Cl2; toluene / 0.5 h / -78 °C
19.1: 52 percent / Ph3P; Et3N; Pd(OAc)2 / dimethylformamide / 24.5 h / 20 °C
20.1: 83 percent / N-chlorosuccinimide; DMS / CH2Cl2 / 1 h / 20 °C
21.1: n-BuLi / tetrahydrofuran; hexane / 1 h / -50 °C
21.2: 86 percent / aq. H2O2 / CHCl3; tetrahydrofuran / 0.5 h / 20 °C
22.1: 33 percent / n-BuLi / tetrahydrofuran; hexane / 5 h / -78 °C
With
pyridine; 1H-imidazole; 2,6-dimethylpyridine; titanium(IV) isopropylate; tert.-butylhydroperoxide; dmap; palladium diacetate; sodium hydroxide; N-chloro-succinimide; n-butyllithium; oxalyl dichloride; 2,3-dimercapto-succinic acid; iodine; sodium hydride; diisobutylaluminium hydride; D-(-)-diisopropyl tartrate; Dess-Martin periodane; acetic acid; dimethyl sulfoxide; triethylamine; diisopropylamine; triphenylphosphine; sodium bis(2-methoxyethoxy)aluminium dihydride; 2,3-dicyano-5,6-dichloro-p-benzoquinone; zinc;
In
tetrahydrofuran; methanol; hexane; dichloromethane; water; N,N-dimethyl-formamide; toluene; acetonitrile;
1.1: Katsuki-Sharpless epoxidation / 5.2: reduction / 6.1: Swern oxidation / 7.1: Horner-Emmons reaction / 9.1: Katsuki-Sharpless epoxidation / 14.1: Swern oxidation / 16.1: Dess-Martin oxidation / 19.1: Heck reaction / 21.2: oxidation;
DOI:10.1016/S0968-0896(00)00259-5