Multi-step reaction with 12 steps
1.1: 71 percent / lithium 4,4'-di-tert-butylbiphenylide / tetrahydrofuran / 0.67 h / -78 °C
2.1: (COCl)2; DMSO / CH2Cl2 / 0.17 h / -78 °C
2.2: 98 percent / Et3N / CH2Cl2 / 0.33 h / -78 - 0 °C
3.1: 70 percent / DDQ / CH2Cl2; H2O / 1 h / 0 °C
4.1: 83 percent / CSA / methanol / 2 h / 21 °C
5.1: 100 percent / DMAP; pyridine / CH2Cl2 / 21 h / 0 - 24 °C
6.1: 86 percent / DDQ / CH2Cl2; H2O / 3.5 h / 25 °C / pH 7
7.1: 90 percent / 2,6-lutidine; DMAP / CH2Cl2 / 2 h / 24 °C
8.1: 88 percent / TBAF / dimethylformamide; acetic acid / 3.3 h / 23 °C
9.1: (COCl)2; DMSO / CH2Cl2 / 0.17 h / -78 °C
9.2: Et3N / CH2Cl2 / 0.33 h / -78 - 0 °C
10.1: NHMDS / tetrahydrofuran / 1 h / 23 °C
10.2: tetrahydrofuran / 1 h / -78 - 0 °C
11.1: 86 percent / K2CO3 / methanol / 3.5 h / 23 °C
12.1: 82 percent / DCC; DMAP / CH2Cl2 / 2 h / 23 °C
With
pyridine; 2,6-dimethylpyridine; dmap; oxalyl dichloride; 4,4'-di(tert-butyl)-[1,1-biphenyl]yllithium; camphor-10-sulfonic acid; tetrabutyl ammonium fluoride; sodium hexamethyldisilazane; potassium carbonate; dimethyl sulfoxide; dicyclohexyl-carbodiimide; 2,3-dicyano-5,6-dichloro-p-benzoquinone;
In
tetrahydrofuran; methanol; dichloromethane; water; acetic acid; N,N-dimethyl-formamide;
2.1: Swern oxidation / 9.1: Swern oxidation / 10.1: Wittig reaction;
DOI:10.1016/j.tetlet.2005.05.062