Technology Process of 2(1H)-Isoquinolinebutanoic acid, β-[[2-[3-[4-(aminoiminomethyl)phenyl]-4,5-dihydro-5-isoxazolyl]acetyl]amino]-3,4-dihydro-γ-oxo-, (βS)-
There total 11 articles about 2(1H)-Isoquinolinebutanoic acid, β-[[2-[3-[4-(aminoiminomethyl)phenyl]-4,5-dihydro-5-isoxazolyl]acetyl]amino]-3,4-dihydro-γ-oxo-, (βS)- which
guide to synthetic route it.
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synthetic route:
- Guidance literature:
-
Multi-step reaction with 5 steps
1: TBTU, Et3N / ethyl acetate / 18 h / Ambient temperature
2: 4 M HCl / dioxane / 1 h / Ambient temperature
3: TBTU, Et3N / dimethylformamide / 2 h / Ambient temperature
4: 4 M HCl / dioxane / 10 h / Ambient temperature
5: 40percent conc. HCl, formic acid / Ambient temperature
With
hydrogenchloride; formic acid; O-(benzotriazol-1-yl)-N,N,N',N'-tetramethyluronium tetrafluoroborate; triethylamine;
In
1,4-dioxane; ethyl acetate; N,N-dimethyl-formamide;
DOI:10.1021/jm960799i
- Guidance literature:
-
Multi-step reaction with 8 steps
1: 34 percent / aq. NaOCl / tetrahydrofuran / Ambient temperature
2: 73 percent / HCl / 24 h / Ambient temperature
3: NH3 / methanol / 14 h / Ambient temperature
4: 75 percent / Et3N / dimethylformamide / 16 h / 22 °C
5: 97 percent / aq. LiOH*H2O / methanol / 16 h / 22 °C
6: TBTU, Et3N / dimethylformamide / 2 h / Ambient temperature
7: 4 M HCl / dioxane / 10 h / Ambient temperature
8: 40percent conc. HCl, formic acid / Ambient temperature
With
hydrogenchloride; lithium hydroxide; sodium hypochlorite; formic acid; ammonia; O-(benzotriazol-1-yl)-N,N,N',N'-tetramethyluronium tetrafluoroborate; triethylamine;
In
tetrahydrofuran; 1,4-dioxane; methanol; N,N-dimethyl-formamide;
DOI:10.1021/jm960799i
- Guidance literature:
-
Multi-step reaction with 7 steps
1: 73 percent / HCl / 24 h / Ambient temperature
2: NH3 / methanol / 14 h / Ambient temperature
3: 75 percent / Et3N / dimethylformamide / 16 h / 22 °C
4: 97 percent / aq. LiOH*H2O / methanol / 16 h / 22 °C
5: TBTU, Et3N / dimethylformamide / 2 h / Ambient temperature
6: 4 M HCl / dioxane / 10 h / Ambient temperature
7: 40percent conc. HCl, formic acid / Ambient temperature
With
hydrogenchloride; lithium hydroxide; formic acid; ammonia; O-(benzotriazol-1-yl)-N,N,N',N'-tetramethyluronium tetrafluoroborate; triethylamine;
In
1,4-dioxane; methanol; N,N-dimethyl-formamide;
DOI:10.1021/jm960799i