6-(4-chlorophenyl)-10-(4-chlorophenylmethylene)-2-(4-methoxyphenylmethylene)-7,8,9,10-tetrahydrothiazolo-[3',2':1,2]pyrimido[4,5-b]quinoline-3,5-dione

Base Information

Chemical Name:6-(4-chlorophenyl)-10-(4-chlorophenylmethylene)-2-(4-methoxyphenylmethylene)-7,8,9,10-tetrahydrothiazolo-[3',2':1,2]pyrimido[4,5-b]quinoline-3,5-dione
CAS No.:1145713-11-6
Molecular Formula:C₃₄H₂₃Cl₂N₃O₃S
Molecular Weight:624.547
Hs Code.:

6-(4-chlorophenyl)-10-(4-chlorophenylmethylene)-2-(4-methoxyphenylmethylene)-7,8,9,10-tetrahydrothiazolo-[3',2':1,2]pyrimido[4,5-b]quinoline-3,5-dione

Synonyms:

Suppliers and Price of 6-(4-chlorophenyl)-10-(4-chlorophenylmethylene)-2-(4-methoxyphenylmethylene)-7,8,9,10-tetrahydrothiazolo-[3',2':1,2]pyrimido[4,5-b]quinoline-3,5-dione

Supply Marketing:

Business phase:: The product has achieved commercial mass production^*data from LookChem market partment

Manufacturers and distributors:

Manufacture/Brand
Chemicals and raw materials
Packaging
price

Total 0 raw suppliers

Chemical Property of 6-(4-chlorophenyl)-10-(4-chlorophenylmethylene)-2-(4-methoxyphenylmethylene)-7,8,9,10-tetrahydrothiazolo-[3',2':1,2]pyrimido[4,5-b]quinoline-3,5-dione

Chemical Property:

Purity/Quality:

Safty Information:

Pictogram(s):
Hazard Codes:

MSDS Files:

Useful:

Technology Process of 6-(4-chlorophenyl)-10-(4-chlorophenylmethylene)-2-(4-methoxyphenylmethylene)-7,8,9,10-tetrahydrothiazolo-[3',2':1,2]pyrimido[4,5-b]quinoline-3,5-dione

There total 2 articles about 6-(4-chlorophenyl)-10-(4-chlorophenylmethylene)-2-(4-methoxyphenylmethylene)-7,8,9,10-tetrahydrothiazolo-[3',2':1,2]pyrimido[4,5-b]quinoline-3,5-dione which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield:

: 1145713-15-0
6-(chlorophenyl)-10-(4-chlorophenylmethylene)-7,8,9,10-tetrahydrothiazolo[3',2':1,2]pyrimido[4,5-b]quinoline-3,5-dione

: 123-11-5
4-methoxy-benzaldehyde

: 1145713-11-6
6-(4-chlorophenyl)-10-(4-chlorophenylmethylene)-2-(4-methoxyphenylmethylene)-7,8,9,10-tetrahydrothiazolo-[3',2':1,2]pyrimido[4,5-b]quinoline-3,5-dione

Guidance literature:: 6-(chlorophenyl)-10-(4-chlorophenylmethylene)-7,8,9,10-tetrahydrothiazolo[3',2':1,2]pyrimido[4,5-b]quinoline-3,5-dione; 4-methoxy-benzaldehyde; With sodium acetate; acetic anhydride; acetic acid; for 5h; Reflux;

With water; at 20 ℃; Cooling;
DOI:10.1016/j.ejmech.2008.03.022

Reference yield:

: 1027003-73-1
9-(4-chlorophenylmethylene)-5-(4-chlorophenyl)-2-thioxo-2,3,6,7,8,9-hexahydropyrimido[4,5-b]quinolin-4(1H)-one

: 123-11-5
4-methoxy-benzaldehyde

: 79-11-8
chloroacetic acid

: 1145713-11-6
6-(4-chlorophenyl)-10-(4-chlorophenylmethylene)-2-(4-methoxyphenylmethylene)-7,8,9,10-tetrahydrothiazolo-[3',2':1,2]pyrimido[4,5-b]quinoline-3,5-dione

Guidance literature:: 9-(4-chlorophenylmethylene)-5-(4-chlorophenyl)-2-thioxo-2,3,6,7,8,9-hexahydropyrimido[4,5-b]quinolin-4(1H)-one; 4-methoxy-benzaldehyde; chloroacetic acid; With sodium acetate; acetic anhydride; acetic acid; for 15h; Reflux;

With water; Cooling;
DOI:10.1016/j.ejmech.2008.03.022

Reference yield: 82.0%

: 1145713-11-6
6-(4-chlorophenyl)-10-(4-chlorophenylmethylene)-2-(4-methoxyphenylmethylene)-7,8,9,10-tetrahydrothiazolo-[3',2':1,2]pyrimido[4,5-b]quinoline-3,5-dione

: 1145713-18-3
11-(4-chlorophenyl)-7-(4-chlorophenylmethylene)-3-(4-methoxy-phenyl)-2,3,7,8,9,10-hexahydroisoxazolo[5'',4'':4',5']thiazolo[3',2':1,2]pyrimido[4,5-b]quinolin-12-one

Guidance literature:: 6-(4-chlorophenyl)-10-(4-chlorophenylmethylene)-2-(4-methoxyphenylmethylene)-7,8,9,10-tetrahydrothiazolo-[3',2':1,2]pyrimido[4,5-b]quinoline-3,5-dione; With hydroxylamine hydrochloride; sodium acetate; acetic acid; for 5h; Reflux;

With water; at 20 ℃; Cooling;
DOI:10.1016/j.ejmech.2008.03.022