1021604-68-1

Basic information

• Product Name: C₇₆H₈₀O₈
• Synonyms: C₇₆H₈₀O₈
• CAS NO: 1021604-68-1
• Molecular Weight: 1121.47
• Mol File: 1021604-68-1.mol
• Article Data: 13

Chemical Properties

• CAS DataBase Reference: C₇₆H₈₀O₈(CAS DataBase Reference)
• NIST Chemistry Reference: C₇₆H₈₀O₈(1021604-68-1)
• EPA Substance Registry System: C₇₆H₈₀O₈(1021604-68-1)

Safety Data

• Hazardous Substances Data: 1021604-68-1(Hazardous Substances Data)

Upstream product

• 827-52-1 1-phenyl-1-cyclohexane 
• 27634-89-5 4-cyclohexylbenzaldehyde 
• 108-46-3 recorcinol 

Relevant articles and documents

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD

The present invention provides a composition for resist underlayer film formation comprising a tellurium-containing compound or a tellurium-containing resin.

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM

A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN

A cyclic compound of the present invention has a molecular weight of 500 to 5000, and is represented by the following formula (1):