110673-14-8

Basic information

• Product Name: 1-Naphthalenesulfonic acid, 3-diazo-3,4-dihydro-4-oxo-, phenyl ester
• CAS NO: 110673-14-8
• Molecular Formula: C16H10N2O4S
• Molecular Weight: 326.332
• Mol File: 110673-14-8.mol
• Article Data: 4

Chemical Properties

• CAS DataBase Reference: 1-Naphthalenesulfonic acid, 3-diazo-3,4-dihydro-4-oxo-, phenyl ester(CAS DataBase Reference)
• NIST Chemistry Reference: 1-Naphthalenesulfonic acid, 3-diazo-3,4-dihydro-4-oxo-, phenyl ester(110673-14-8)
• EPA Substance Registry System: 1-Naphthalenesulfonic acid, 3-diazo-3,4-dihydro-4-oxo-, phenyl ester(110673-14-8)

Safety Data

• Hazardous Substances Data: 110673-14-8(Hazardous Substances Data)

Usage

Properties

Complex chemical compound
Naphthalene sulfonic acid core
Phenyl ester functional group
Used as a diazo compound in various chemical reactions and synthetic processes
Potential applications in the pharmaceutical industry as an intermediate in the synthesis of various drugs
Potential hazardous properties
Reactivity as a diazo compound
Potential effects on human health and the environment

Specific content

1-Naphthalenesulfonic acid, 3-diazo-3,4-dihydro-4-oxo-, phenyl ester is a complex chemical compound.
It has a naphthalene sulfonic acid core.
It has a phenyl ester functional group.
It is used as a diazo compound in various chemical reactions and synthetic processes.
It has potential applications in the pharmaceutical industry as an intermediate in the synthesis of various drugs.
It should be handled with care due to its potential hazardous properties.
Its reactivity as a diazo compound and potential effects on human health and the environment should be considered.

Upstream product

• 36451-09-9 1,2-naphthoquinone-2-diazide-4-sulfonyl chloride 
• 108-95-2 phenol 

Downstream Products

• 124709-21-3 3-sulfo-3H-indene-1-carboxylic acid 
• 127648-82-2 1-(phenoxysulfonyl)-indene-3-carboxylic acid 
• 145074-68-6 3-Oxomethylene-3H-indene-1-sulfonic acid phenyl ester 

Relevant articles and documents

Reduction Processes in the Fast Atom Bombardment Mass Spectrometry of Sulfonyl Esters of Diazonaphthalenones

Orthoquinone diazides, which are widely used in microlithography, have attracted considerable attention, especially in terms of their application in the production of high-contrast resists.Previous electron impact mass spectrometric results have confirmed that the primary fragmentation process of these compounds is the elimination of N2 to form an indenoketene ion.This is analogous to the photodecomposition pathway which makes them effective in the lithographic process.Those results also revealed the occurrence of an alternative process, which involves a two-hydrogen reduction of the intermediate species formed prior to conversion to the ketene.The present study investigates the behaviour of the orthoquinone diazides when there is an abundance of protons available to form the reduction product.Several different types of diazonaphthalenone sulfonyl esters, ranging in complexity from the monosubstituted phenol esters to disubstituted dihydroxybenzophenones, were examined using fast atom bombardment mass spectrometry.Although reduction was the primary process in the hydrogen-rich matrices, the extent of reduction was characteristic of the particular isomer as well as the matrix used.

A SINGLE POT PROCESS FOR THE PREPARATION OF DIAZONAPHTHOQUINONESULFONYL ESTER

The present invention provides a single pot process for the preparation of diazonaphthoquinonesulfonyl ester, a useful organic material for micro electronic and dye industry. This study pertains to the one pot preparation of diazonaphthoquinonesulfonyl esters using the corresponding diazonaphthoquinine sulfonic acid or its sodium salt, diphosgene or triphosgene, variety of hydroxy compounds and tertiary organic base in an organic solvent medium