112131-27-8Relevant academic research and scientific papers
Tin trifluoroacetylacetonate [Sn(C5H4O2F3)2] as a precursor of tin dioxide in APCVD process
Popov,Ignatov,Churakov,Simonenko,Simonenko,Ignatova,Sevast’yanov,Kuznetsov
, p. 545 - 553 (2016)
A new method of synthesis of volatile complex, tin trifluoroacetylacetonate [Sn(C5H4O2F3)2], was proposed. The prepared compound was identified by IR spectroscopy, CH analysis, X-ray powder diffraction, and DTA/TGA, the composition was confirmed by MALDI-TOF mass spectrometry, crystal structure was established. Thin films of tin dioxide on silicon were obtained by atmospheric pressure chemical vapor deposition using [Sn(C5H4O2F3)2] as a precursor. The morphology and composition of the films were studied by scanning electron microscopy, EDX elemental analysis, and X-ray powder diffraction. Surface resistance and light transmission in visible and near IR region were studied.
