1126206-28-7

Basic information

• Product Name: triphenylsulfonium 2-(2-chloroacetoxy)-1,1,3,3,3-pentafluoropropane-1-sulfonate
• Synonyms: triphenylsulfonium 2-(2-chloroacetoxy)-1,1,3,3,3-pentafluoropropane-1-sulfonate
• CAS NO: 1126206-28-7
• Molecular Weight: 568.97
• Mol File: 1126206-28-7.mol
• Article Data: 3

Chemical Properties

• CAS DataBase Reference: triphenylsulfonium 2-(2-chloroacetoxy)-1,1,3,3,3-pentafluoropropane-1-sulfonate(CAS DataBase Reference)
• NIST Chemistry Reference: triphenylsulfonium 2-(2-chloroacetoxy)-1,1,3,3,3-pentafluoropropane-1-sulfonate(1126206-28-7)
• EPA Substance Registry System: triphenylsulfonium 2-(2-chloroacetoxy)-1,1,3,3,3-pentafluoropropane-1-sulfonate(1126206-28-7)

Safety Data

• Hazardous Substances Data: 1126206-28-7(Hazardous Substances Data)

Upstream product

• 79-04-9 chloroacetyl chloride 
• 108-10-1 4-methyl-2-pentanone 

Downstream Products

• 1213754-72-3 triphenylsulfonium 1,1,3,3,3-pentafluoro-2-(2-methacryloyloxy-acetoxy)-propane-1-sulfonate 

Relevant articles and documents

POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C1-C10 organic group, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.

Movel photoacid generators, resist compositons, and patterning processes

Photoacid generators generate sulfonic acids of formula (1a) or (1c) upon exposure to high-energy radiation. ????????R1-COOCH(CF3)CF2SO3-H+?????(1a) ????????R1-O-COOCH(CF3)CF2SO3-H+?????(1c) R1 is a C20-C50 hydrocarbon group having a steroid structure. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.