1189-75-9

Basic information

• Product Name: Dimethyl(trimethylsilylmethyl)silane
• Synonyms: (Dimethylsilyl)(trimethylsilyl)methane;[(Dimethylsilyl)methyl]trimethylsilane;2,2,4-Trimethyl-2,4-disilapentane;Dimethyl(trimethylsilylmethyl)silane
• CAS NO: 1189-75-9
• Molecular Formula: C₆H₁₈Si₂
• Molecular Weight: 146.38
• Mol File: 1189-75-9.mol
• Article Data: 5

Chemical Properties

• Melting Point: -123°C
• Boiling Point: 121°C
• Flash Point: -1°C (30°F)
• Appearance: /
• Refractive Index: 1.4158
• CAS DataBase Reference: Dimethyl(trimethylsilylmethyl)silane(CAS DataBase Reference)
• NIST Chemistry Reference: Dimethyl(trimethylsilylmethyl)silane(1189-75-9)
• EPA Substance Registry System: Dimethyl(trimethylsilylmethyl)silane(1189-75-9)

Safety Data

• Hazardous Substances Data: 1189-75-9(Hazardous Substances Data)

Usage

General Description

Dimethyl(trimethylsilylmethyl)silane, also known as TMSMDS or hexamethyldisilane, is a colorless, flammable liquid with a chemical formula of C7H20Si2. It is commonly used as a reagent in organic synthesis reactions, especially in the formation of carbon-silicon bonds. TMSDMS is also utilized as a silylating agent in the modification of organic compounds, as well as a precursor in the production of silicon-based materials. It is important to handle TMSDMS with caution as it is highly flammable and may react violently with water, strong oxidizing agents, and acids. Additionally, exposure to TMSDMS should be limited as it is harmful if inhaled or swallowed, and can cause skin and eye irritation.

Upstream product

• 5181-46-4 chloromethylpentamethyldisilane 
• 2117-28-4 bis(trimethylsilyl)methane 
• 13683-11-9 trimethylsilyl(dimethylchlorosilyl)methane 
• 5357-38-0 bis(chlorodimethylsilyl)methane 
• 4519-04-4 dichloro[(chlorodimethylsilyl)methyl]methylsilane 
• 4519-03-3 bis(methyldichlorosilyl)methane 
• 20932-80-3 1,1,1,4,4,4-hexakis(trimethylsilyl)butin-2 
• 1450-14-2 1,1,1,2,2,2-hexamethyldisilane 

Relevant articles and documents

MERCURY-PHOTOSENSITIZED DECOMPOSITION OF HEXAMETHYLDISILANE.

The kinetics and mechanism of the mercury-photosensitized decomposition of hexamethyldisilane have been studied. It has been confirmed that the initially-formed radical, Me//3SiSi(Me//2)CH//2, undergoes a unimolecular rearrangement; Arrhenius parameters have been measured for this rearrangement. The significance of these Arrhenius parameters in silicon chemistry is discussed by means of thermochemical calculations.

Disilane Cleavage with Selected Alkali and Alkaline Earth Metal Salts

The industry-scale production of methylchloromonosilanes in the Müller–Rochow Direct Process is accompanied by the formation of a residue, the direct process residue (DPR), comprised of disilanes MenSi2Cl6-n (n=1–6). Great research efforts have been devoted to the recycling of these disilanes into monosilanes to allow reintroduction into the siloxane production chain. In this work, disilane cleavage by using alkali and alkaline earth metal salts is reported. The reaction with metal hydrides, in particular lithium hydride (LiH), leads to efficient reduction of chlorine containing disilanes but also induces disproportionation into mono- and oligosilanes. Alkali and alkaline earth chlorides, formed in the course of the reduction, specifically induce disproportionation of highly chlorinated disilanes, whereas highly methylated disilanes (n>3) remain unreacted. Nearly quantitative DPR conversion into monosilanes was achieved by using concentrated HCl/ether solutions in the presence of lithium chloride.

A Facile Synthesis of Tetrakis(trimethylsilyl)butatriene Properties and Cycloadditions

Tetrakis(trimethylsilyl)butatriene was readily prepared by flash vacuum pyrolysis of hexakis(trimethylsilyl)-2-butyne.The physical and chemical properties of the butatriene are described.