MERCURY-PHOTOSENSITIZED DECOMPOSITION OF HEXAMETHYLDISILANE.

DOI: 10.1002/bbpc.19820860104

Source and publish data:

Berichte der Bunsengesellschaft/Physical Chemistry Chemical Physics p. 13 - 19 (1982)

Update date:2022-08-16

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Authors:

Davidson

Potzinger

Reimann Reimann

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Article abstract of DOI:10.1002/bbpc.19820860104

The kinetics and mechanism of the mercury-photosensitized decomposition of hexamethyldisilane have been studied. It has been confirmed that the initially-formed radical, Me//3SiSi(Me//2)CH//2, undergoes a unimolecular rearrangement; Arrhenius parameters have been measured for this rearrangement. The significance of these Arrhenius parameters in silicon chemistry is discussed by means of thermochemical calculations.

Full text of DOI:10.1002/bbpc.19820860104

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