
Berichte der Bunsengesellschaft/Physical Chemistry Chemical Physics p. 13 - 19 (1982)
Update date:2022-08-16
Topics:
Davidson
Potzinger
Reimann
The kinetics and mechanism of the mercury-photosensitized decomposition of hexamethyldisilane have been studied. It has been confirmed that the initially-formed radical, Me//3SiSi(Me//2)CH//2, undergoes a unimolecular rearrangement; Arrhenius parameters have been measured for this rearrangement. The significance of these Arrhenius parameters in silicon chemistry is discussed by means of thermochemical calculations.
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