134-23-6

Basic information

• Product Name: THIOSALICYLIC ACID SODIUM SALT
• Synonyms: THIOSALICYLIC ACID SODIUM SALT;SODIUM THIOSALICYLATE;2-mercaptobenzoic acid sodium salt;sodium 2-mercaptobenzoate;o-Mercaptobenzoic acid sodium salt;Thiosalicylic Acid Sodium Salt Sodium 2-Mercaptobenzoate 2-Mercaptobenzoic Acid Sodium Salt
• CAS NO: 134-23-6
• Molecular Formula: C₇H₅NaO₂S
• Molecular Weight: 176.17
• Mol File: 134-23-6.mol
• Article Data: 2

Chemical Properties

• Boiling Point: 298.6°Cat760mmHg
• Flash Point: 134.4°C
• Appearance: /
• Density: 1.345g/cm³
• Vapor Pressure: 0.000563mmHg at 25°C
• CAS DataBase Reference: THIOSALICYLIC ACID SODIUM SALT(CAS DataBase Reference)
• NIST Chemistry Reference: THIOSALICYLIC ACID SODIUM SALT(134-23-6)
• EPA Substance Registry System: THIOSALICYLIC ACID SODIUM SALT(134-23-6)

Safety Data

• Hazardous Substances Data: 134-23-6(Hazardous Substances Data)

Usage

Uses

complexing agent in lithiation, oxidative coupling of terminal acetylenes to diynes and with alkyllithiums in orthometallation of aromatics

InChI:InChI=1/C7H6O2S.Na/c8-7(9)5-3-1-2-4-6(5)10;/h1-4,10H,(H,8,9);/q;+1/p-1

Upstream product

• 152766-18-2 methyl 2-(acetylthio)benzoate 
• 394-35-4 methyl 2-fluorobenzoate 
• 147-93-3 Thiosalicylic acid 

Downstream Products

• 55212-08-3 o-(Dihydroxy-2,3-propylthio)benzoesaeureethylester 
• 58980-52-2 2-((2-hydroxyethyl)thio)benzoic acid 
• 81471-21-8 3-Benzothienylthiosalicylsaeure 
• 81471-22-9 2-((1H-indol-3-yl)thio)benzoic acid 
• 92461-32-0 2-<(2,3-Dihydro-1,3-dioxo-1H-isoindol-4-yl)thio>benzoic Acid 
• 143427-29-6 C₁₇H₁₆O₄S 
• 83805-56-5 2-(3-Methyl-benzo[f]quinolin-1-ylsulfanyl)-benzoic acid 
• 55212-09-4 3-[2'-(carboxy)phenylthio]propane-1,2-diol 
• 184764-86-1 Au(CNC(CH₃)3)(SC₆H₄C(O)OH) 
• 194536-58-8 Cu₂(O₂CC₆H₄SH)4(C₅H₅N)2 
• 143427-30-9 C₁₉H₂₀O₄S 
• 143427-23-0 C₁₇H₁₆O₄S 
• 110046-42-9 4-<((2'-Carboxyphenyl)sulfonyl)methyl>benzoic acid 
• 110046-35-0 C₁₅H₁₂O₅S 

Relevant articles and documents

Radiation-sensitive resin composition and method for forming pattern

Provided are a radiation-sensitive resin composition capable of exhibiting an adequate level of sensitivity, CDU performance, and LWR performance, and a method for forming a pattern. The radiation-sensitive resin composition includes the onium salt compound represented by formula (1'), a resin including a structural unit having an acid-cleavable group, and a solvent. (Here, EA is a substituted or unsubstituted, ([alpha]+[beta])-valent organic group having 1 to 40 carbon atoms; Z+ is a monovalent radiation-sensitive onium cation; and [alpha] and [beta] are each independently 1 or 2.).