1402933-03-2

Upstream product

• 5421-53-4 4,4'-Di-tert-butyldiphenyliodonium chloride 
• 1402933-02-1 C₂HF₂O₅S^(1-)*C₂₀H₂₆I⁽¹⁺⁾ 
• 530-62-1 1,1'-carbonyldiimidazole 

Downstream Products

• 1402933-05-4 C₁₃H₁₇F₂O₆S^(1-)*C₂₀H₂₆I⁽¹⁺⁾ 
• 1402933-06-5 C₁₃H₁₇F₂O₆S^(1-)*C₁₄H₂₁OS⁽¹⁺⁾ 
• 1402933-04-3 C₁₃H₁₅F₂O₆S^(1-)*C₂₀H₂₆I⁽¹⁺⁾ 

Relevant academic research and scientific papers

Salt, the composition and production of resist pattern

PROBLEM TO BE SOLVED: To provide a resist composition capable of producing a resist pattern excellent in resolution and shape.SOLUTION: A salt is represented by formula (I). [In the formula, Qand Qeach represent a fluorine atom or a C1-C6 perfluoroalkyl g

PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN

A photoresist composition comprising a resin having an acid-labile group;a salt represented by the formula (I); anda salt represented by the formula (B1).

PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN

A photoresist composition comprising (A) a resin which has an acid-labile group-containing structural unit and a lactone ring-containing structural unit, and(B) a salt represented by formula (I): wherein Q1 and Q2 each independently