1408289-77-9

Upstream product

• 1379588-17-6 C₁₇H₂₆O₅ 
• 1379588-19-8 C₁₉H₂₅F₂O₉S^(1-)*C₁₈H₁₅S⁽¹⁺⁾ 
• 1311403-44-7 C₅H₃F₂N₂O₄S^(1-)*C₁₈H₁₅S⁽¹⁺⁾ 

Downstream Products

• 1425490-22-7 C₃₈H₄₉F₂O₁₃S^(1-)*C₁₈H₁₅S⁽¹⁺⁾ 
• 1425490-30-7 C₄₄H₆₁F₂O₁₃S^(1-)*C₁₈H₁₅S⁽¹⁺⁾ 
• 1422452-84-3 C₂₇H₃₅F₂O₁₁S^(1-)*C₁₈H₁₅S⁽¹⁺⁾ 
• 1422452-88-7 C₃₀H₄₁F₂O₁₁S^(1-)*C₁₈H₁₅S⁽¹⁺⁾ 

Relevant academic research and scientific papers

Salt, the composition and production of resist pattern

PROBLEM TO BE SOLVED: To provide a salt to be used for a resist composition that allows production of a resist pattern with excellent pattern collapse resistance.SOLUTION: The salt is expressed by the formula (I). In the formula, Qand Qrepresent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms; Lrepresents a carbonyl group or -CF-; Xrepresents a single bond, a divalent saturated hydrocarbon group having 1 to 14 carbon atoms which may have a substituent, or a group expressed by formula (a-1); c is 0 or 1; and X, X, A, Aand Aeach represent a specified group.

Salt, resist composition and a manufacturing method of a resist pattern

PROBLEM TO BE SOLVED: To solve the problem wherein the mask error factor (MEF) of an obtained resist pattern is not necessarily sufficiently satisfactory, concerning a resist composition containing an acid generating agent which is well-known hitherto.SOLUTION: This salt is represented by formula (I). [In the formula, Rand Reach independently represent a fluorine atom or a 1-6C perfluoroalkyl group. Xrepresents a divalent 1-17C saturated hydrocarbon group, wherein a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom, and -CH- constituting the saturated hydrocarbon group may be substituted with -O- or -CO-. Zrepresents organic counter ion].

SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN

A photoresist composition containing a resin that is hardly soluble or insoluble, but which is soluble in an aqueous alkali solution by action of an acid, and a salt represented by formula (I): wherein Q1, Q2, L1, W1, W2, R1, R2, t1 and t2 are defined in the specification, and Z+ represents an organic cation.

SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN

A salt represented by formula (I): wherein Q1, Q2, L1, W, and Z+ are defined in the specification.