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14092-14-9

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14092-14-9 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 14092-14-9 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,4,0,9 and 2 respectively; the second part has 2 digits, 1 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 14092-14:
(7*1)+(6*4)+(5*0)+(4*9)+(3*2)+(2*1)+(1*4)=79
79 % 10 = 9
So 14092-14-9 is a valid CAS Registry Number.

14092-14-9SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 14, 2017

Revision Date: Aug 14, 2017

1.Identification

1.1 GHS Product identifier

Product name Methyl 2-(methylamino)propenyl ketone

1.2 Other means of identification

Product number -
Other names 4-(Methylamino)-3-penten-2-one

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:14092-14-9 SDS

14092-14-9Relevant articles and documents

Bis(β-ketoiminate) dioxo tungsten(VI) complexes as precursors for growth of WOx by aerosol-assisted chemical vapor deposition

Su, Xiaoming,Panariti, Persi,Abboud, Khalil A.,McElwee-White, Lisa

, p. 219 - 227 (2019/06/05)

Bis(β-ketoiminate) dioxo tungsten(VI) complexes WO2L2 (L = acNac, acNacMe, acNacEt) have been synthesized and characterized. The thermal behaviors and possible decomposition mechanisms of these dioxo compounds were studied by TGA, MS and thermolysis. The performance of WO2(acNacMe)2 as an AACVD precursor was evaluated at growth temperatures of 250–550 °C using nitrogen as the carrier gas. The elemental compositions of the as-deposited and sputtered tungsten oxide films were determined by XPS. The morphology and stoichiometry of the as-deposited films were studied by SEM and XRD.

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