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Silanol, also known as silicic acid, is a chemical compound with the simplest form consisting of a single silicon atom covalently bonded to three hydrogens and a hydroxy group. It is an important intermediate in the synthesis of various silicon-containing compounds and materials.

14475-38-8

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14475-38-8 Usage

Uses

Used in Chemical Synthesis:
Silanol is used as a key intermediate in the chemical synthesis of various silicon-containing compounds and materials. Its unique structure allows it to participate in a wide range of reactions, making it a versatile building block for the development of new materials and products.
Used in Coatings Industry:
Silanol is used as a crosslinking agent in the coatings industry for improving the durability and water resistance of coatings. Its ability to form strong bonds with other molecules contributes to the enhanced performance of the final product.
Used in Adhesives Industry:
In the adhesives industry, silanol is used as a component in the formulation of high-performance adhesives. Its reactivity and ability to form strong bonds make it an essential ingredient for creating strong and durable adhesives.
Used in Electronics Industry:
Silanol is used in the electronics industry for the development of silicon-based materials, such as silicon wafers and other semiconductor components. Its role in the synthesis of these materials is crucial for the performance and efficiency of electronic devices.
Used in Pharmaceutical Industry:
Silanol has potential applications in the pharmaceutical industry, where it can be used as a starting material for the synthesis of silicon-containing drugs and drug delivery systems. Its unique properties may contribute to the development of novel therapeutic agents and drug formulations.
Used in Environmental Applications:
Silanol can be used in environmental applications, such as water treatment and soil remediation, due to its ability to interact with various contaminants and pollutants. Its reactivity and affinity for certain substances make it a promising candidate for the development of new environmental technologies and solutions.

Check Digit Verification of cas no

The CAS Registry Mumber 14475-38-8 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,4,4,7 and 5 respectively; the second part has 2 digits, 3 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 14475-38:
(7*1)+(6*4)+(5*4)+(4*7)+(3*5)+(2*3)+(1*8)=108
108 % 10 = 8
So 14475-38-8 is a valid CAS Registry Number.
InChI:InChI=1/HOSi/c1-2/h1H

14475-38-8SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 20, 2017

Revision Date: Aug 20, 2017

1.Identification

1.1 GHS Product identifier

Product name silanol

1.2 Other means of identification

Product number -
Other names Silanol

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:14475-38-8 SDS

14475-38-8Downstream Products

14475-38-8Relevant academic research and scientific papers

Matrix Reactions opf Silan and Oxygen Atoms. Infrared Spectroscopic Evidence for the Silanol, Silanone, and Silanoic and Silicic Acid Molecules

Withnall, Robert,Andrews, Lester

, p. 3261 - 3268 (1985)

Matrices formed by the cocondensation of SiH4 and O3 in argon at 17 K were irradiated by a high-pressure mercury arc.Photoproducts include the silicon-oxygen double bond containing species SiO, H2SiO, H(HO)SiO, and (HO)2SiO.HSiOH was prepared in high yield by the reaction of SiH4 with O atoms from the microwave discharge of O2 in excess argon.In both photolysis and discharge experiments, SiH3OH is proposed as a primary reaction product formed by insertion of O atoms an Si-H bond of SiH4.

Investigation of the Prototype Silylene Reaction, SiH2 + H 2O (and D2O): Time-Resolved Gas-Phase Kinetic Studies, Isotope Effects, RRKM Calculations, and Quantum Chemical Calculations of the Reaction Energy Surface

Becerra, Rosa,Cannady, J.Pat,Walsh, Robin

, p. 11049 - 11056 (2007/10/03)

Time-resolved kinetic studies of the reaction of silylene, SiH 2, with H2O and with D2O have been carried out in the gas phase at 296 and at 339 K, using laser flash photolysis to generate and monitor SiH2. The reaction was studied over the pressure range 10-200 Torr with SF6 as bath gas. The second-order rate constants obtained were pressure dependent, indicating that the reaction is a third-body assisted association process. Rate constants at 339 K were about half those at 296 K. Isotope effects, kH/kD. were small averaging 1.076 ± 0.080, suggesting no involvement of H- (or D-) atom transfer in the rate determining step. RRKM modeling was undertaken based on a transition state appropriate to formation of the expected zwitterionic donor-acceptor complex, H2Si ... OH2. Because the reaction is close to the low pressure (third order) region, it is difficult to be definitive about the activated complex structure. Various structures were tried, both with and without the incorporation of rotational modes, leading to values for the high-pressure limiting (i.e., true second-order) rate constant in the range 9.5 × 10-11 to 5 × 10-10 cm3 molecule-1 s-1. The RRKM modeling and mechanistic interpretation is supported by ab initio quantum calculations carried out at the G2 and G3 levels. The results are compared and contrasted with the previous studies.

Microwave spectrum of HSiO in the X2A' ground electronic state

Izuha, Mitsuaki,Yamamoto, Satoshi,Saito, Shuji

, p. 527 - 535 (2007/10/03)

The rotational spectrum of the HSiO radical has been measured in the millimeter- and submillimeter-wave regions. The radical is produced in a d.c. glow discharge plasma of a gaseous mixture of SiH4 and N2O. Molecular constants includ

Kinetics of the SiH3 + O2 Reaction Studied by Time-Resolved Mass Spectrometry

Koshi, Mitsuo,Miyoshi, Akira,Matsui, Hiroyuki

, p. 9869 - 9873 (2007/10/02)

The SiH3 + O2 reaction was studied by means of time-resolved mass spectrometric detection of SiH3 with a near-threshold electron impact ionization technique.The rate constant of (1.26 +/- 0.18) x 10-11 cm3 molecule-1 s-1 at T = 293 K was determined from the first-order decay rates of SiH3 produced in ArF (193 nm) laser photolysis of CCl4/SiH4/O2/He or N2O/SiH4/O2/He mixtures.The signal at m/z 47 attributable to SiH3O could be detected as a direct product of the SiH3 + O2 reaction.On the basis of kinetic simulations, the branching ratio for the reaction of SiH3 +O2 -> HSiOOH + H was determined to be 0.6 +/- 0.1.Branching ratios for the other two channels, SiH3 + O2 -> SiH3O + O and SiH2O + OH, were estimated to be 0.16 and 0.24 respectively.

Osmium Tetroxide and Its Fragment Ions in the Gas Phase: Reactivity with Hydrocarbons and Small Molecules

Irikura, Karl K.,Beauchamp, J. L.

, p. 75 - 85 (2007/10/02)

Gas-phase ion-molecule reactions of OsOn(1+) (n=0-4) with a number of hydrocarbons and small molecules, including CH4, C2H4, C2H6, C3H8, C4H10, H2, CO, NH3, and SiH4, have been investigated by Fourier transform ion cyclotron resonance spectrometry.Anion chemistry was briefly investigated.Thermochemical quantities derived include D(Os(1+)-O)=100+/-12, D(OsO(1+)-O)=105+/-12, D(OsO2(1+)-O)=105+/-12, D(OsO3(1+)-O)=71+/-12, D(OsO3-O)=78+/-14, D(OsO4(1+)-H)=132+/-3 kcal/mol, D(OsO3(1+)-OH)=101+/-16 kcal/mol, and PA(OsO4)=161+/-2 kcal/mol.Many diverse and novel reactions are observed.Among them are s+2s> cycloaddition with H2, bond metathesis, oxo transfer, and hydrogen atom abstraction.These ions are also extraordinarily active dehydrogenation reagents; the most dramatic example is the sequential, complete dehydrogenation of SiH4 to mono-, di-, and trisilicides.Another intriguing process is the double bond metathesis with NH3, in which one or two oxo ligands are exchanged for imido groups.The number of oxo ligands is found to have a striking effect on the chemistry; mechanisms are discussed for the reactions observed.For example, the relative inertness of OsO3(1+) is attributed to a failure of the Os(+7) center to undergo oxidative addition.OsO2(1+) emerges as a potential model catalyst for the conversion of methane and dioxygen to aldehydes.

Matrix isolation studies of the reactions of silicon atoms: I. Interaction with water: The infrared spectrum of hydroxysilylene HSiOH

Ismail, Zakya Kafafi,Hauge, Robert H.,Fredin, Leif,Kauffman, James W.,Margrave, John L.

, p. 1617 - 1625 (2007/10/02)

This study focuses on the interactions and reactions of silicon atoms and molecules with water.Initially, a silicon-water adduct is formed , as noticed from the red shift of the ν2 bending modes of H2O, HDO, and D2O.This silicon hydrate complex rearranges spontaneously through hydrogen tunneling to give HSiOH and HSiOD as final products of the reaction of Si with H2O and HDO.Photolysis of Si:OD2 with λ>=400 nm is necessary for the production of the deuterated insertion product DSiOD.All silicon hydroxy-hydrides undergo a photolytic decomposition reaction when strongly irradiated to give silicon monoxide and molecular hydrogen or two hydrogen atoms.Band assignments fro trans-HSiOH, trans- and cis-HSiOD, and DSiOD have been made.It appears that the cis-isomer converts to the more stable trans-isomer when the matrix is heated.The SiOH bond angle has been calculated for a planar structure of Cs symmetry using the Redlich-Teller product rule and the torsional frequencies for HSiOH, HSiOD, and DSiOD.Normal coordinate analyses have been carried out using the measured frequencies for six isotopomers, namely, HSiOH, HSiOD, DSiOD, HSi18OD, and DSi18OD.Thermodynamic properties have also been for this new species.

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