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14475-38-8

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14475-38-8 Usage

Definition

ChEBI: The simplest silanol, consisting of a single silicon atom covalently bouund to three hydrogens and a hydroxy group.

Check Digit Verification of cas no

The CAS Registry Mumber 14475-38-8 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,4,4,7 and 5 respectively; the second part has 2 digits, 3 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 14475-38:
(7*1)+(6*4)+(5*4)+(4*7)+(3*5)+(2*3)+(1*8)=108
108 % 10 = 8
So 14475-38-8 is a valid CAS Registry Number.
InChI:InChI=1/HOSi/c1-2/h1H

14475-38-8SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 20, 2017

Revision Date: Aug 20, 2017

1.Identification

1.1 GHS Product identifier

Product name silanol

1.2 Other means of identification

Product number -
Other names Silanol

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:14475-38-8 SDS

14475-38-8Downstream Products

14475-38-8Relevant articles and documents

Matrix Reactions opf Silan and Oxygen Atoms. Infrared Spectroscopic Evidence for the Silanol, Silanone, and Silanoic and Silicic Acid Molecules

Withnall, Robert,Andrews, Lester

, p. 3261 - 3268 (1985)

Matrices formed by the cocondensation of SiH4 and O3 in argon at 17 K were irradiated by a high-pressure mercury arc.Photoproducts include the silicon-oxygen double bond containing species SiO, H2SiO, H(HO)SiO, and (HO)2SiO.HSiOH was prepared in high yield by the reaction of SiH4 with O atoms from the microwave discharge of O2 in excess argon.In both photolysis and discharge experiments, SiH3OH is proposed as a primary reaction product formed by insertion of O atoms an Si-H bond of SiH4.

Microwave spectrum of HSiO in the X2A' ground electronic state

Izuha, Mitsuaki,Yamamoto, Satoshi,Saito, Shuji

, p. 527 - 535 (2007/10/03)

The rotational spectrum of the HSiO radical has been measured in the millimeter- and submillimeter-wave regions. The radical is produced in a d.c. glow discharge plasma of a gaseous mixture of SiH4 and N2O. Molecular constants includ

Osmium Tetroxide and Its Fragment Ions in the Gas Phase: Reactivity with Hydrocarbons and Small Molecules

Irikura, Karl K.,Beauchamp, J. L.

, p. 75 - 85 (2007/10/02)

Gas-phase ion-molecule reactions of OsOn(1+) (n=0-4) with a number of hydrocarbons and small molecules, including CH4, C2H4, C2H6, C3H8, C4H10, H2, CO, NH3, and SiH4, have been investigated by Fourier transform ion cyclotron resonance spectrometry.Anion chemistry was briefly investigated.Thermochemical quantities derived include D(Os(1+)-O)=100+/-12, D(OsO(1+)-O)=105+/-12, D(OsO2(1+)-O)=105+/-12, D(OsO3(1+)-O)=71+/-12, D(OsO3-O)=78+/-14, D(OsO4(1+)-H)=132+/-3 kcal/mol, D(OsO3(1+)-OH)=101+/-16 kcal/mol, and PA(OsO4)=161+/-2 kcal/mol.Many diverse and novel reactions are observed.Among them are s+2s> cycloaddition with H2, bond metathesis, oxo transfer, and hydrogen atom abstraction.These ions are also extraordinarily active dehydrogenation reagents; the most dramatic example is the sequential, complete dehydrogenation of SiH4 to mono-, di-, and trisilicides.Another intriguing process is the double bond metathesis with NH3, in which one or two oxo ligands are exchanged for imido groups.The number of oxo ligands is found to have a striking effect on the chemistry; mechanisms are discussed for the reactions observed.For example, the relative inertness of OsO3(1+) is attributed to a failure of the Os(+7) center to undergo oxidative addition.OsO2(1+) emerges as a potential model catalyst for the conversion of methane and dioxygen to aldehydes.

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