15209-49-1

Upstream product

• 104-15-4 toluene-4-sulfonic acid 
• 108-88-3 toluene 
• 624-31-7 4-tolyl iodide 

Downstream Products

• 77134-00-0 (E)-4-methylcinnamyl acetate 
• 123017-90-3 N-(3-methoxyphenyl)-4-methylaniline 
• 448932-53-4 4-methyl-2-(p-tolyloxy)quinoline 
• 620-94-0 di-(p-tolyl)sulfane 
• 1268831-55-5 (S)-2- ((((9H-fluoren-9-yl)methoxy)carbonyl)amino)-3-(2-(p-tolyl)-1H-indol-3-yl)propanoic acid 
• 1706-12-3 4-phenoxytoluene 

Relevant academic research and scientific papers

Arylation with unsymmetrical diaryliodonium salts: A chemoselectivity study

Phenols, anilines, and malonates have been arylated under metal-free conditions with twelve aryl(phenyl)iodonium salts in a systematic chemoselectivity study. A new "anti-ortho effect" has been identified in the arylation of malonates. Several "dummy groups" have been found that give complete chemoselectivity in the transfer of the phenyl moiety, irrespective of the nucleophile. An aryl exchange in the diaryliodonium salts has been observed under certain arylation conditions. DFT calculations have been performed to investigate the reaction mechanism and to elucidate the origins of the observed selectivities. These results are expected to facilitate the design of chiral diaryliodonium salts and the development of catalytic arylation reactions that are based on these sustainable and metal-free reagents. Copyright

One-pot synthesis of diaryliodonium salts using toluenesulfonic acid: A fast entry to electron-rich diaryliodonium tosylates and triflates

A direct synthesis of symmetric and unsymmetric electron-rich diaryliodonium salts is described. The use of MCPBA and toluenesulfonic acid delivers diaryliodonium tosylates in high yields. An in situ anion exchange has also been developed, giving access to the corresponding triflate salts. Georg Thieme Verlag Stuttgart.

Novel anthracene derivative and radiation-sensitive resin composition

A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), wherein R1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.

Novel carbazole derivative and chemically amplified radiation-sensitive resin composition

A carbazole derivative of the following formula (1), wherein R1 and R2 individually represent a hydrogen atom or a monovalent organic group, or R1 and R2 form, together with the carbon atom to which R1 and R2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.