1600-29-9 Usage
General Description
N-butylsilane is a chemical compound with the molecular formula C4H12Si. It is a colorless, flammable liquid that is insoluble in water and has a strong, unpleasant odor. N-butylsilane is commonly used as a reagent in organic synthesis, particularly in the production of various compounds containing silicon. It is also used as a building block for the synthesis of more complex molecules, and as a precursor in the production of silicon-based materials. N-butylsilane has potential applications in the production of pharmaceuticals, agrochemicals, and other specialty chemicals, making it an important compound in the field of organic chemistry. Additionally, it is essential for various industrial processes, such as the manufacturing of silicones and adhesives.
Check Digit Verification of cas no
The CAS Registry Mumber 1600-29-9 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 1,6,0 and 0 respectively; the second part has 2 digits, 2 and 9 respectively.
Calculate Digit Verification of CAS Registry Number 1600-29:
(6*1)+(5*6)+(4*0)+(3*0)+(2*2)+(1*9)=49
49 % 10 = 9
So 1600-29-9 is a valid CAS Registry Number.
InChI:InChI=1/C4H12Si/c1-2-3-4-5/h2-4H2,1,5H3
1600-29-9Relevant academic research and scientific papers
Berchier, Fabienne,Pai, Yi-Ming,Weber, William P.,Servis, Kenneth L.
, p. 679 - 680 (1986)
The deuterium isotope effects on the 29Si chemical shifts in several organosilanes and siloxanes have been determined.For silanes, the one-bond effects are approximately -0.2 ppm per deuterium and follow an additivity relationship.The two-bond effect is small.
Reaction of Hydrogen Peroxide with Organosilanes under Chemical Vapour Deposition Conditions
Moore, Darren L.,Taylor, Mark P.,Timms, Peter L.
, p. 2673 - 2678 (2007/10/03)
When a stream of vapour at low pressure which contained a mixture of H2O2 with an organosilane, RSiH3 (R = alkyl or alkenyl), impinged on a silicon wafer, deposition of oxide films of nominal composition RxSiO(2-0.5x), where x 3 or higher alkenyl groups. or higher alkenylgroups. Possible mechanism for the Si-C bond cleavage reaction are discussed, with energetic rearrangement of radical intermediates of type Si(H)(R)(OOH)' being favoured.
